GB830392A - Improvements in or relating to cathodic sputtering - Google Patents

Improvements in or relating to cathodic sputtering

Info

Publication number
GB830392A
GB830392A GB1546656A GB1546656A GB830392A GB 830392 A GB830392 A GB 830392A GB 1546656 A GB1546656 A GB 1546656A GB 1546656 A GB1546656 A GB 1546656A GB 830392 A GB830392 A GB 830392A
Authority
GB
United Kingdom
Prior art keywords
electrodes
electrode
sputtering
cadmium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1546656A
Inventor
Leslie Arthur Holland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards High Vacuum Ltd
Original Assignee
Edwards High Vacuum Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards High Vacuum Ltd filed Critical Edwards High Vacuum Ltd
Priority to GB1546656A priority Critical patent/GB830392A/en
Priority to DEE14137A priority patent/DE1181519B/en
Publication of GB830392A publication Critical patent/GB830392A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Abstract

A method of depositing by cathode sputtering a film which consists of an alloy or of a mixture of substances, comprises supporting a shaped electrode of each of the substances in a sputtering chamber in angularly spaced relation one with another and with respect to the axis of rotation of a rotating work table upon which the workpiece is supported, the electrodes being also axially spaced from the table, and connecting each electrode to a source of high voltage current, thereby to produce a glow discharge from each electrode and deposit an alloyed or composite film of the substances upon the workpiece. The current source may be (1) D.C., the electrodes being connected in parallel to the negative terminal thereof, (2) single-phase A.C., there being two dissimilar electrodes connected to each side thereof, or (3) three-phase A.C., there being three electrodes each connected to one of the terminals thereof. If a larger number of electrodes is used with an A.C. source, the system should be made symmetrical so as to give the same electrical characteristics on each half cycle. The electrodes are preferably sector-shaped with the included angle adjacent to the axis of rotation. Specifically disclosed are the production of (1) a brass film using a copper electrode and a zinc electrode, (2) a film containing tin oxide + antinmony by sputtering from tin and antimony electrodes in an oxygen atmosphere, (3) a resistor coating of gold + bismuth oxide on glass or ceramic by sputtering from gold and bismuth electrodes in air, and (4) a film containing cadmium and cadmium oxide by sputtering from a pure cadmium electrode and an oxidized cadmium electrode in argon. Sputtering may also be performed in atmospheres containing nitrogen, sulphur or halides. Specification 830,391 is referred to.
GB1546656A 1956-05-17 1956-05-17 Improvements in or relating to cathodic sputtering Expired GB830392A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1546656A GB830392A (en) 1956-05-17 1956-05-17 Improvements in or relating to cathodic sputtering
DEE14137A DE1181519B (en) 1956-05-17 1957-05-16 Process to deposit a coating of two or more substances on a workpiece by means of cathode atomization, as well as device for carrying out the process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1546656A GB830392A (en) 1956-05-17 1956-05-17 Improvements in or relating to cathodic sputtering

Publications (1)

Publication Number Publication Date
GB830392A true GB830392A (en) 1960-03-16

Family

ID=10059623

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1546656A Expired GB830392A (en) 1956-05-17 1956-05-17 Improvements in or relating to cathodic sputtering

Country Status (2)

Country Link
DE (1) DE1181519B (en)
GB (1) GB830392A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3235476A (en) * 1960-04-18 1966-02-15 Gen Motors Corp Method of producing ohmic contacts on semiconductors
US3418229A (en) * 1965-06-30 1968-12-24 Weston Instruments Inc Method of forming films of compounds having at least two anions by cathode sputtering
US3420763A (en) * 1966-05-06 1969-01-07 Bell Telephone Labor Inc Cathodic sputtering of films of stoichiometric zinc oxide
US3477936A (en) * 1967-06-29 1969-11-11 Ppg Industries Inc Sputtering of metals in an atmosphere of fluorine and oxygen
US4060471A (en) * 1975-05-19 1977-11-29 Rca Corporation Composite sputtering method
US4279726A (en) * 1980-06-23 1981-07-21 Gte Laboratories Incorporated Process for making electroluminescent films and devices
US4545881A (en) * 1977-05-19 1985-10-08 Canon Kabushiki Kaisha Method for producing electro-thermal transducer
EP1046727A2 (en) * 1999-04-23 2000-10-25 Nippon Sheet Glass Co. Ltd. Method of film deposition on substrate surface and substrate produced by the method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3616401A (en) * 1966-06-30 1971-10-26 Texas Instruments Inc Sputtered multilayer ohmic molygold contacts for semiconductor devices

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE675731C (en) * 1935-10-06 1939-05-17 Bernhard Berghaus Process for the production of homogeneous layers or bodies from metals on a base body by cathode sputtering, thermal evaporation or thermal decomposition of metal compounds

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3235476A (en) * 1960-04-18 1966-02-15 Gen Motors Corp Method of producing ohmic contacts on semiconductors
US3418229A (en) * 1965-06-30 1968-12-24 Weston Instruments Inc Method of forming films of compounds having at least two anions by cathode sputtering
US3420763A (en) * 1966-05-06 1969-01-07 Bell Telephone Labor Inc Cathodic sputtering of films of stoichiometric zinc oxide
US3477936A (en) * 1967-06-29 1969-11-11 Ppg Industries Inc Sputtering of metals in an atmosphere of fluorine and oxygen
US4060471A (en) * 1975-05-19 1977-11-29 Rca Corporation Composite sputtering method
US4545881A (en) * 1977-05-19 1985-10-08 Canon Kabushiki Kaisha Method for producing electro-thermal transducer
US4279726A (en) * 1980-06-23 1981-07-21 Gte Laboratories Incorporated Process for making electroluminescent films and devices
EP1046727A2 (en) * 1999-04-23 2000-10-25 Nippon Sheet Glass Co. Ltd. Method of film deposition on substrate surface and substrate produced by the method
EP1046727A3 (en) * 1999-04-23 2003-11-26 Nippon Sheet Glass Co. Ltd. Method of film deposition on substrate surface and substrate produced by the method

Also Published As

Publication number Publication date
DE1181519B (en) 1964-11-12

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