GB806251A - Improvements in or relating to the manufacture of semi-conductor devices - Google Patents

Improvements in or relating to the manufacture of semi-conductor devices

Info

Publication number
GB806251A
GB806251A GB1949156A GB1949156A GB806251A GB 806251 A GB806251 A GB 806251A GB 1949156 A GB1949156 A GB 1949156A GB 1949156 A GB1949156 A GB 1949156A GB 806251 A GB806251 A GB 806251A
Authority
GB
United Kingdom
Prior art keywords
alloying
semi
contact
conductor
passing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1949156A
Inventor
Abraham Isaac Mlavsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co PLC
Original Assignee
General Electric Co PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co PLC filed Critical General Electric Co PLC
Priority to GB1949156A priority Critical patent/GB806251A/en
Priority to FR1176073D priority patent/FR1176073A/en
Publication of GB806251A publication Critical patent/GB806251A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

806,251. Semi-conductor devices. GENERAL ELECTRIC CO. Ltd. May 30, 1957 [June 22, 1956, No. 19491/56. Class 37. In a method of alloying a significant impurity containing material to a semi-conductor body, the alloying is initiated by first heating the body and material in contact to a temperature above the eutectic point of the material and semi-conductor material but insufficient to cause alloying, and then passing a pulse of electric current between the material and the body to cause local melting at the contact area. A PN junction rectifier is made by the steps of electroplating an ohmic contact on one face of a wafer of P-type silicon, placing the wafer in a furnace with its other face in contact with the end of a gold wire doped with 1 per cent of antimony and with lead wires touching the gold wire and plated electrode respectively, heating the assembly to 360 ‹ C. while passing dry argon through the furnace, passing a' current pulse between the lead wires to initiate alloying by local melting, raising the temperature to establish a suitable degree of alloy penetration, and finally cooling to room temperature to form a recrystallized N-type region overlain by a gold contact. After etching, washing and drying the device is encapsulated in a hermetically sealed container. In an alternative method, especially useful where two alloy contacts of different materials are to be made to a single semi-conductor body the molten material formed by the current pulse is immediately resolidified and the alloying completed at a later stage by remelting.
GB1949156A 1956-06-22 1956-06-22 Improvements in or relating to the manufacture of semi-conductor devices Expired GB806251A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1949156A GB806251A (en) 1956-06-22 1956-06-22 Improvements in or relating to the manufacture of semi-conductor devices
FR1176073D FR1176073A (en) 1956-06-22 1957-06-17 Semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1949156A GB806251A (en) 1956-06-22 1956-06-22 Improvements in or relating to the manufacture of semi-conductor devices

Publications (1)

Publication Number Publication Date
GB806251A true GB806251A (en) 1958-12-23

Family

ID=10130244

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1949156A Expired GB806251A (en) 1956-06-22 1956-06-22 Improvements in or relating to the manufacture of semi-conductor devices

Country Status (2)

Country Link
FR (1) FR1176073A (en)
GB (1) GB806251A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110148581A (en) * 2018-02-10 2019-08-20 姜富帅 A kind of metal-semiconductor metallization process and method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110148581A (en) * 2018-02-10 2019-08-20 姜富帅 A kind of metal-semiconductor metallization process and method
CN110148581B (en) * 2018-02-10 2022-05-17 姜富帅 Metallization process and method of metal-semiconductor

Also Published As

Publication number Publication date
FR1176073A (en) 1959-04-03

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