GB769702A - Improvements in or relating to semiconductor devices - Google Patents

Improvements in or relating to semiconductor devices

Info

Publication number
GB769702A
GB769702A GB7887/54A GB788754A GB769702A GB 769702 A GB769702 A GB 769702A GB 7887/54 A GB7887/54 A GB 7887/54A GB 788754 A GB788754 A GB 788754A GB 769702 A GB769702 A GB 769702A
Authority
GB
United Kingdom
Prior art keywords
probe
semi
conductor
copper
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7887/54A
Other languages
English (en)
Inventor
James William Granville
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NAT RES DEV
National Research Development Corp UK
Original Assignee
NAT RES DEV
National Research Development Corp UK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to BE536485D priority Critical patent/BE536485A/xx
Application filed by NAT RES DEV, National Research Development Corp UK filed Critical NAT RES DEV
Priority to GB7887/54A priority patent/GB769702A/en
Priority to DEN10355A priority patent/DE1043513B/de
Priority to FR1125496D priority patent/FR1125496A/fr
Publication of GB769702A publication Critical patent/GB769702A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302—Non-deposition formation processes
    • H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6306—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials
    • H10P14/6308—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors
    • H10P14/6309—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors of silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302—Non-deposition formation processes
    • H10P14/6324—Formation by anodic treatments, e.g. anodic oxidation

Landscapes

  • Weting (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
GB7887/54A 1954-03-18 1954-03-18 Improvements in or relating to semiconductor devices Expired GB769702A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
BE536485D BE536485A (enExample) 1954-03-18
GB7887/54A GB769702A (en) 1954-03-18 1954-03-18 Improvements in or relating to semiconductor devices
DEN10355A DE1043513B (de) 1954-03-18 1955-03-16 Verfahren zur Herstellung von Halbleiteranordnungen mit Behandlung der Halbleiteroberflaeche und aufgesetzter Nadelelektrode
FR1125496D FR1125496A (fr) 1954-03-18 1955-03-18 Redresseur à cristal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7887/54A GB769702A (en) 1954-03-18 1954-03-18 Improvements in or relating to semiconductor devices

Publications (1)

Publication Number Publication Date
GB769702A true GB769702A (en) 1957-03-13

Family

ID=9841708

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7887/54A Expired GB769702A (en) 1954-03-18 1954-03-18 Improvements in or relating to semiconductor devices

Country Status (4)

Country Link
BE (1) BE536485A (enExample)
DE (1) DE1043513B (enExample)
FR (1) FR1125496A (enExample)
GB (1) GB769702A (enExample)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE467885A (enExample) * 1943-08-11
US2469569A (en) * 1945-03-02 1949-05-10 Bell Telephone Labor Inc Point contact negative resistance devices
NL129688C (enExample) * 1945-04-28

Also Published As

Publication number Publication date
BE536485A (enExample)
FR1125496A (fr) 1956-10-31
DE1043513B (de) 1958-11-13

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