GB745698A - Improvements in or relating to methods of producing silicon of high purity - Google Patents
Improvements in or relating to methods of producing silicon of high purityInfo
- Publication number
- GB745698A GB745698A GB26446/53A GB2644653A GB745698A GB 745698 A GB745698 A GB 745698A GB 26446/53 A GB26446/53 A GB 26446/53A GB 2644653 A GB2644653 A GB 2644653A GB 745698 A GB745698 A GB 745698A
- Authority
- GB
- United Kingdom
- Prior art keywords
- pure
- silane
- silicon
- silicon tetrachloride
- decomposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/029—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Compounds (AREA)
Abstract
<PICT:0745698/III/1> Pure silicon is prepared by the thermal decomposition of silane (SiH4) by heating to temperatures between the decomposition temperature (about 500 DEG C.) and 800 DEG C. and with molecular concentrations about 0.3 per cent. The silane may be decomposed so as to form a coherent body around a seed of pure silicon. In Fig. 2 pure silane, preheated by heater 28, is drawn through aperture 27 via valve 25 and flow meter 24 into decomposition chamber 12 by a vacuum pump connected to outlet 29. The gas flow is directed on to the silicon seed 16 supported on rod 17 and heated by copper current concentrator 18, itself cooled by water in coil 19, and primary coil 22 which form the tuned circuit of an induction heater (see Group XI). The rod 17 passes through a vacuum seal 31 and is connected to a mechanism 32 which alters its position so as to give optimum crystal growth. Pure silane is prepared from silicon tetrachloride and lithium aluminium hydride. Silicon tetrachloride is refluxed with copper turnings and the arsenic content reduced to less than 0.01 micrograms per mililitre by fractional distillation of the chloride. The silicon tetrachloride is then mixed with pure dry ether or tetrahydrofuran, and reacted with lithium aluminium hydride which has also been refluxed with pure dry ether or tetrahydrofuran. The resulting silane after fractional freezing and distillation may be stored in cylinders or swept straight into the decomposition chamber with an inert gas.
Priority Applications (27)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL225733D NL225733A (en) | 1953-09-25 | ||
BE561650D BE561650A (en) | 1953-09-25 | ||
NL112548D NL112548C (en) | 1953-09-25 | ||
BE532054D BE532054A (en) | 1953-09-25 | ||
FR75903D FR75903E (en) | 1953-09-25 | ||
BE561654D BE561654A (en) | 1953-09-25 | ||
BE565604D BE565604A (en) | 1953-09-25 | ||
GB26446/53A GB745698A (en) | 1953-09-25 | 1953-09-25 | Improvements in or relating to methods of producing silicon of high purity |
DEI9153A DE1042553B (en) | 1953-09-25 | 1954-09-18 | Process for the production of high purity silicon |
FR1108543D FR1108543A (en) | 1953-09-25 | 1954-09-23 | High purity silicon production method |
CH1063854A CH370751A (en) | 1953-09-25 | 1954-09-25 | Process for the production of a coherent body consisting of a highly pure chemical element for semiconductor technology |
FR67266D FR67266E (en) | 1953-09-25 | 1954-09-29 | High purity silicon production method |
FR70026D FR70026E (en) | 1953-09-25 | 1956-08-14 | High purity silicon production method |
GB31424/56A GB829422A (en) | 1953-09-25 | 1956-10-16 | Method and apparatus for producing semi-conductor materials of high purity |
FR749492A FR72742E (en) | 1953-09-25 | 1957-10-15 | High purity silicon production method |
FR72288D FR72288E (en) | 1953-09-25 | 1957-10-15 | High purity silicon production method |
FR749491A FR72741E (en) | 1953-09-25 | 1957-10-15 | High purity silicon production method |
US716652A US2987139A (en) | 1953-09-25 | 1958-02-21 | Manufacture of pure silicon |
DEI14512A DE1065389B (en) | 1953-09-25 | 1958-03-06 | Process for purifying silicon hydride to produce extremely pure silicon for semiconductor use |
FR760198A FR73392E (en) | 1953-09-25 | 1958-03-11 | High purity silicon production method |
CH5687258A CH373741A (en) | 1953-09-25 | 1958-03-12 | Process for purifying silane |
FR769353A FR73946E (en) | 1953-09-25 | 1958-07-02 | High purity silicon production method |
FR771605A FR74454E (en) | 1953-09-25 | 1958-07-31 | High purity silicon production method |
FR783396A FR75047E (en) | 1953-09-25 | 1959-01-06 | High purity silicon production method |
FR790410A FR75654E (en) | 1953-09-25 | 1959-03-24 | High purity silicon production method |
FR794679A FR75905E (en) | 1953-09-25 | 1959-05-14 | High purity silicon production method |
BE663513D BE663513A (en) | 1953-09-25 | 1965-05-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB26446/53A GB745698A (en) | 1953-09-25 | 1953-09-25 | Improvements in or relating to methods of producing silicon of high purity |
Publications (1)
Publication Number | Publication Date |
---|---|
GB745698A true GB745698A (en) | 1956-02-29 |
Family
ID=10243739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB26446/53A Expired GB745698A (en) | 1953-09-25 | 1953-09-25 | Improvements in or relating to methods of producing silicon of high purity |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB745698A (en) |
Cited By (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2888328A (en) * | 1955-08-16 | 1959-05-26 | Int Standard Electric Corp | Methods of producing silicon of high purity |
US2931709A (en) * | 1956-09-17 | 1960-04-05 | Robert S Aries | Decarburizing silicon tetrachloride |
DE1082883B (en) * | 1958-06-25 | 1960-06-09 | Wacker Chemie Gmbh | Process for the production of high purity boron, silicon or germanium or mixtures of these substances |
US2943918A (en) * | 1956-02-11 | 1960-07-05 | Pechiney Prod Chimiques Sa | Process for manufacturing dense, extra pure silicon |
DE1095261B (en) * | 1958-03-21 | 1960-12-22 | Int Standard Electric Corp | Process for the production of semiconductor elements of high purity by thermal decomposition of the hydrides |
US2987139A (en) * | 1953-09-25 | 1961-06-06 | Int Standard Electric Corp | Manufacture of pure silicon |
US2988427A (en) * | 1957-07-17 | 1961-06-13 | Kali Chemie Ag | Method for the purification of hydrides of silicon and germanium group of the periodic system |
US2989378A (en) * | 1956-10-16 | 1961-06-20 | Int Standard Electric Corp | Producing silicon of high purity |
US2993762A (en) * | 1956-10-16 | 1961-07-25 | Int Standard Electric Corp | Methods of producing silicon of high purity |
US2993763A (en) * | 1957-11-14 | 1961-07-25 | Plessey Co Ltd | Manufacturing process for the preparation of flakes of sintered silicon |
US3000768A (en) * | 1959-05-28 | 1961-09-19 | Ibm | Semiconductor device with controlled zone thickness |
US3006734A (en) * | 1957-11-14 | 1961-10-31 | Plessey Co Ltd | Process for preparing pure silicon |
US3011877A (en) * | 1956-06-25 | 1961-12-05 | Siemens Ag | Production of high-purity semiconductor materials for electrical purposes |
US3016289A (en) * | 1957-04-25 | 1962-01-09 | Licentia Gmbh | Process for producing purified silicon halogenide |
US3019087A (en) * | 1958-09-29 | 1962-01-30 | Merck & Co Inc | Purification of silane |
US3023087A (en) * | 1957-09-07 | 1962-02-27 | Wacker Chemie Gmbh | Process for the production of extremely pure silicon |
US3029135A (en) * | 1958-05-16 | 1962-04-10 | Int Standard Electric Corp | Purification of gases used in the production of silicon |
US3030189A (en) * | 1958-05-19 | 1962-04-17 | Siemens Ag | Methods of producing substances of highest purity, particularly electric semiconductors |
DE1128412B (en) * | 1959-12-17 | 1962-04-26 | Metallgesellschaft Ag | Process for the production of hyperpure silicon by the thermal decomposition of gaseous silicon compounds |
US3051557A (en) * | 1958-03-12 | 1962-08-28 | Int Standard Electric Corp | Manufacture of pure silicon |
US3053631A (en) * | 1956-08-04 | 1962-09-11 | Int Standard Electric Corp | Methods of producing silicon of high purity |
US3055741A (en) * | 1960-12-22 | 1962-09-25 | Sylvania Electric Prod | Method for producing silicon |
US3069244A (en) * | 1959-07-17 | 1962-12-18 | Int Standard Electric Corp | Production of silicon |
US3078150A (en) * | 1958-05-14 | 1963-02-19 | Int Standard Electric Corp | Production of semi-conductor materials |
US3092462A (en) * | 1960-01-28 | 1963-06-04 | Philips Corp | Method for the manufacture of rods of meltable material |
US3095279A (en) * | 1960-04-07 | 1963-06-25 | Tung Sol Electric Inc | Apparatus for producing pure silicon |
US3126248A (en) * | 1964-03-24 | Process for producing purified | ||
US3128154A (en) * | 1958-12-19 | 1964-04-07 | Eagle Picher Co | Process for producing crystalline silicon over a substrate and removal therefrom |
US3177100A (en) * | 1963-09-09 | 1965-04-06 | Rca Corp | Depositing epitaxial layer of silicon from a vapor mixture of sih4 and h3 |
US3192072A (en) * | 1960-12-08 | 1965-06-29 | Slemens & Halske Ag | Method of pulling a dendritic crystal from a vapor atmosphere |
DE1216842B (en) * | 1960-09-30 | 1966-05-18 | Karl Ernst Hoffmann | Process for the production of the purest silicon and germanium |
EP0112385A1 (en) * | 1982-06-22 | 1984-07-04 | Harry Levin | Apparatus and process for making solar grade silicon. |
EP1400490A1 (en) * | 2002-09-17 | 2004-03-24 | Degussa AG | Deposition of a solid by thermal decomposition of a gaseous substance in a bowl reactor |
US8414863B2 (en) | 2006-07-25 | 2013-04-09 | Spawnt Private S.A.R.L. | Hydrogen and energy generation by thermal conversion of silanes |
-
1953
- 1953-09-25 GB GB26446/53A patent/GB745698A/en not_active Expired
Cited By (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3126248A (en) * | 1964-03-24 | Process for producing purified | ||
US2987139A (en) * | 1953-09-25 | 1961-06-06 | Int Standard Electric Corp | Manufacture of pure silicon |
US2888328A (en) * | 1955-08-16 | 1959-05-26 | Int Standard Electric Corp | Methods of producing silicon of high purity |
US2943918A (en) * | 1956-02-11 | 1960-07-05 | Pechiney Prod Chimiques Sa | Process for manufacturing dense, extra pure silicon |
US3011877A (en) * | 1956-06-25 | 1961-12-05 | Siemens Ag | Production of high-purity semiconductor materials for electrical purposes |
US3053631A (en) * | 1956-08-04 | 1962-09-11 | Int Standard Electric Corp | Methods of producing silicon of high purity |
US2931709A (en) * | 1956-09-17 | 1960-04-05 | Robert S Aries | Decarburizing silicon tetrachloride |
US2993762A (en) * | 1956-10-16 | 1961-07-25 | Int Standard Electric Corp | Methods of producing silicon of high purity |
US2989378A (en) * | 1956-10-16 | 1961-06-20 | Int Standard Electric Corp | Producing silicon of high purity |
US3016289A (en) * | 1957-04-25 | 1962-01-09 | Licentia Gmbh | Process for producing purified silicon halogenide |
US2988427A (en) * | 1957-07-17 | 1961-06-13 | Kali Chemie Ag | Method for the purification of hydrides of silicon and germanium group of the periodic system |
US3023087A (en) * | 1957-09-07 | 1962-02-27 | Wacker Chemie Gmbh | Process for the production of extremely pure silicon |
US2993763A (en) * | 1957-11-14 | 1961-07-25 | Plessey Co Ltd | Manufacturing process for the preparation of flakes of sintered silicon |
US3006734A (en) * | 1957-11-14 | 1961-10-31 | Plessey Co Ltd | Process for preparing pure silicon |
US3051557A (en) * | 1958-03-12 | 1962-08-28 | Int Standard Electric Corp | Manufacture of pure silicon |
DE1095261B (en) * | 1958-03-21 | 1960-12-22 | Int Standard Electric Corp | Process for the production of semiconductor elements of high purity by thermal decomposition of the hydrides |
US3078150A (en) * | 1958-05-14 | 1963-02-19 | Int Standard Electric Corp | Production of semi-conductor materials |
US3029135A (en) * | 1958-05-16 | 1962-04-10 | Int Standard Electric Corp | Purification of gases used in the production of silicon |
US3030189A (en) * | 1958-05-19 | 1962-04-17 | Siemens Ag | Methods of producing substances of highest purity, particularly electric semiconductors |
DE1082883B (en) * | 1958-06-25 | 1960-06-09 | Wacker Chemie Gmbh | Process for the production of high purity boron, silicon or germanium or mixtures of these substances |
US3019087A (en) * | 1958-09-29 | 1962-01-30 | Merck & Co Inc | Purification of silane |
US3128154A (en) * | 1958-12-19 | 1964-04-07 | Eagle Picher Co | Process for producing crystalline silicon over a substrate and removal therefrom |
US3000768A (en) * | 1959-05-28 | 1961-09-19 | Ibm | Semiconductor device with controlled zone thickness |
US3069244A (en) * | 1959-07-17 | 1962-12-18 | Int Standard Electric Corp | Production of silicon |
DE1128412B (en) * | 1959-12-17 | 1962-04-26 | Metallgesellschaft Ag | Process for the production of hyperpure silicon by the thermal decomposition of gaseous silicon compounds |
US3092462A (en) * | 1960-01-28 | 1963-06-04 | Philips Corp | Method for the manufacture of rods of meltable material |
US3095279A (en) * | 1960-04-07 | 1963-06-25 | Tung Sol Electric Inc | Apparatus for producing pure silicon |
DE1216842B (en) * | 1960-09-30 | 1966-05-18 | Karl Ernst Hoffmann | Process for the production of the purest silicon and germanium |
US3192072A (en) * | 1960-12-08 | 1965-06-29 | Slemens & Halske Ag | Method of pulling a dendritic crystal from a vapor atmosphere |
US3055741A (en) * | 1960-12-22 | 1962-09-25 | Sylvania Electric Prod | Method for producing silicon |
US3177100A (en) * | 1963-09-09 | 1965-04-06 | Rca Corp | Depositing epitaxial layer of silicon from a vapor mixture of sih4 and h3 |
EP0112385A1 (en) * | 1982-06-22 | 1984-07-04 | Harry Levin | Apparatus and process for making solar grade silicon. |
EP0112385A4 (en) * | 1982-06-22 | 1984-11-20 | Harry Levin | Apparatus and process for making solar grade silicon. |
EP1400490A1 (en) * | 2002-09-17 | 2004-03-24 | Degussa AG | Deposition of a solid by thermal decomposition of a gaseous substance in a bowl reactor |
US8414863B2 (en) | 2006-07-25 | 2013-04-09 | Spawnt Private S.A.R.L. | Hydrogen and energy generation by thermal conversion of silanes |
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