GB722844A - Photographic diazotype material and photomechanical printing plates - Google Patents
Photographic diazotype material and photomechanical printing platesInfo
- Publication number
- GB722844A GB722844A GB16153/52A GB1615352A GB722844A GB 722844 A GB722844 A GB 722844A GB 16153/52 A GB16153/52 A GB 16153/52A GB 1615352 A GB1615352 A GB 1615352A GB 722844 A GB722844 A GB 722844A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sulphone
- phenanthrol
- phenyl
- diazide
- naphthyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract 4
- 229930192627 Naphthoquinone Natural products 0.000 abstract 3
- 150000002791 naphthoquinones Chemical class 0.000 abstract 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 abstract 3
- VCPVFFIDLIKPLX-UHFFFAOYSA-N 2-diazo-1H-phenanthren-1-ol Chemical compound [N+](=[N-])=C1C(C=2C=CC3=CC=CC=C3C2C=C1)O VCPVFFIDLIKPLX-UHFFFAOYSA-N 0.000 abstract 2
- NGPOABOEXMDQBT-UHFFFAOYSA-N 3-phenanthrol Chemical compound C1=CC=C2C3=CC(O)=CC=C3C=CC2=C1 NGPOABOEXMDQBT-UHFFFAOYSA-N 0.000 abstract 2
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 abstract 2
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 abstract 2
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 abstract 2
- 238000009835 boiling Methods 0.000 abstract 2
- 229950000244 sulfanilic acid Drugs 0.000 abstract 2
- 125000001174 sulfone group Chemical group 0.000 abstract 2
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 abstract 2
- VANIRKXGZSRTMW-UHFFFAOYSA-N (4-hydroxynaphthalen-1-yl)-phenylmethanone Chemical compound C12=CC=CC=C2C(O)=CC=C1C(=O)C1=CC=CC=C1 VANIRKXGZSRTMW-UHFFFAOYSA-N 0.000 abstract 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract 1
- QLIOCENRPBJEPI-UHFFFAOYSA-N 1-chloro-4-nitronaphthalene Chemical compound C1=CC=C2C([N+](=O)[O-])=CC=C(Cl)C2=C1 QLIOCENRPBJEPI-UHFFFAOYSA-N 0.000 abstract 1
- YPWLZGITFNGGKW-UHFFFAOYSA-N 2-phenanthrol Chemical compound C1=CC=C2C3=CC=C(O)C=C3C=CC2=C1 YPWLZGITFNGGKW-UHFFFAOYSA-N 0.000 abstract 1
- CZGCEKJOLUNIFY-UHFFFAOYSA-N 4-Chloronitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(Cl)C=C1 CZGCEKJOLUNIFY-UHFFFAOYSA-N 0.000 abstract 1
- ZRBYTWKSORDFEJ-UHFFFAOYSA-N 4-aminophenanthren-3-ol Chemical compound C1=CC=CC2=C3C(N)=C(O)C=CC3=CC=C21 ZRBYTWKSORDFEJ-UHFFFAOYSA-N 0.000 abstract 1
- OEUVMPYLAZYISY-UHFFFAOYSA-N 4-diazo-3H-phenanthren-1-ol Chemical compound [N+](=[N-])=C1CC=C(C=2C=CC3=CC=CC=C3C12)O OEUVMPYLAZYISY-UHFFFAOYSA-N 0.000 abstract 1
- JFGRNXYZFMCQDA-UHFFFAOYSA-N C1(=CC=CC=C1)S(=O)(=O)C1=CC=CC=C1.N(=O)C1=C(C2=CC=CC=C2C=C1)O Chemical compound C1(=CC=CC=C1)S(=O)(=O)C1=CC=CC=C1.N(=O)C1=C(C2=CC=CC=C2C=C1)O JFGRNXYZFMCQDA-UHFFFAOYSA-N 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 1
- NXIFFOOGIFJTSY-UHFFFAOYSA-N [N+](=O)([O-])C1=C(C=CC2=CC=CC=C12)C1=C(C=CC=C1)SC1=C(C=CC=C1)C1=C(C2=CC=CC=C2C=C1)[N+](=O)[O-] Chemical compound [N+](=O)([O-])C1=C(C=CC2=CC=CC=C12)C1=C(C=CC=C1)SC1=C(C=CC=C1)C1=C(C2=CC=CC=C2C=C1)[N+](=O)[O-] NXIFFOOGIFJTSY-UHFFFAOYSA-N 0.000 abstract 1
- 239000012670 alkaline solution Substances 0.000 abstract 1
- -1 amino compound Chemical class 0.000 abstract 1
- 239000000987 azo dye Substances 0.000 abstract 1
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- 150000008049 diazo compounds Chemical class 0.000 abstract 1
- 239000000543 intermediate Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- JCDWETOKTFWTHA-UHFFFAOYSA-N methylsulfonylbenzene Chemical compound CS(=O)(=O)C1=CC=CC=C1 JCDWETOKTFWTHA-UHFFFAOYSA-N 0.000 abstract 1
- SEXOVMIIVBKGGM-UHFFFAOYSA-N naphthalene-1-thiol Chemical compound C1=CC=C2C(S)=CC=CC2=C1 SEXOVMIIVBKGGM-UHFFFAOYSA-N 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- NVBFHJWHLNUMCV-UHFFFAOYSA-N sulfamide Chemical compound NS(N)(=O)=O NVBFHJWHLNUMCV-UHFFFAOYSA-N 0.000 abstract 1
- 235000011149 sulphuric acid Nutrition 0.000 abstract 1
- 239000001117 sulphuric acid Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE308289X | 1951-06-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB722844A true GB722844A (en) | 1955-02-02 |
Family
ID=6121669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB16153/52A Expired GB722844A (en) | 1951-06-30 | 1952-06-26 | Photographic diazotype material and photomechanical printing plates |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3046113A (en, 2012) |
| BE (1) | BE512485A (en, 2012) |
| CH (2) | CH308290A (en, 2012) |
| FR (1) | FR1063227A (en, 2012) |
| GB (1) | GB722844A (en, 2012) |
| NL (2) | NL77573C (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3494767A (en) * | 1966-02-28 | 1970-02-10 | Agfa Gevaert Nv | Copying material for use in the photochemical preparation of printing plates |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL170716B (nl) * | 1951-06-30 | Agfa Gevaert Nv | Werkwijze voor de vervaardiging van polymeerfoelie door extrusie. | |
| US3046112A (en) * | 1951-06-30 | 1962-07-24 | Azoplate Corp | Quinone diazide printing plates |
| US3515554A (en) * | 1966-07-25 | 1970-06-02 | Philips Corp | Diazo type paper and new high speed diazo reproduction process |
| ZA6801224B (en, 2012) * | 1967-03-08 | |||
| US3984250A (en) * | 1970-02-12 | 1976-10-05 | Eastman Kodak Company | Light-sensitive diazoketone and azide compositions and photographic elements |
| US3661582A (en) * | 1970-03-23 | 1972-05-09 | Western Electric Co | Additives to positive photoresists which increase the sensitivity thereof |
| US4640884A (en) * | 1985-03-29 | 1987-02-03 | Polychrome Corp. | Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group |
| CA1281578C (en) * | 1985-07-18 | 1991-03-19 | Susan A. Ferguson | High contrast photoresist developer with enhanced sensitivity |
| US4871644A (en) * | 1986-10-01 | 1989-10-03 | Ciba-Geigy Corporation | Photoresist compositions with a bis-benzotriazole |
| JPH01142721A (ja) * | 1987-11-30 | 1989-06-05 | Fujitsu Ltd | ポジ型感光性パターン形成材料およびパターン形成方法 |
| GB9407511D0 (en) * | 1994-04-15 | 1994-06-08 | Smithkline Beecham Corp | Compounds |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE510151A (en, 2012) * | 1949-07-23 | |||
| US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
| NL170716B (nl) * | 1951-06-30 | Agfa Gevaert Nv | Werkwijze voor de vervaardiging van polymeerfoelie door extrusie. |
-
0
- NL NLAANVRAGE7016542,A patent/NL170716B/xx unknown
- BE BE512485D patent/BE512485A/xx unknown
- NL NL77573D patent/NL77573C/xx active
-
1952
- 1952-06-26 GB GB16153/52A patent/GB722844A/en not_active Expired
- 1952-06-27 FR FR1063227D patent/FR1063227A/fr not_active Expired
- 1952-06-30 CH CH308290D patent/CH308290A/de unknown
- 1952-06-30 CH CH308289D patent/CH308289A/de unknown
-
1957
- 1957-07-18 US US672565A patent/US3046113A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3494767A (en) * | 1966-02-28 | 1970-02-10 | Agfa Gevaert Nv | Copying material for use in the photochemical preparation of printing plates |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1063227A (fr) | 1954-04-30 |
| CH308289A (de) | 1955-07-15 |
| BE512485A (en, 2012) | |
| CH308290A (de) | 1955-07-15 |
| NL77573C (en, 2012) | |
| US3046113A (en) | 1962-07-24 |
| NL170716B (nl) |
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