GB709634A - Improvements in organic silicon compounds and their preparation - Google Patents
Improvements in organic silicon compounds and their preparationInfo
- Publication number
- GB709634A GB709634A GB4073/51A GB407351A GB709634A GB 709634 A GB709634 A GB 709634A GB 4073/51 A GB4073/51 A GB 4073/51A GB 407351 A GB407351 A GB 407351A GB 709634 A GB709634 A GB 709634A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicates
- organic nitrogen
- nitrogen base
- silica
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000003377 silicon compounds Chemical class 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 15
- 125000001477 organic nitrogen group Chemical group 0.000 abstract 13
- 150000004760 silicates Chemical class 0.000 abstract 9
- -1 phenyltrimethylammonium silicates Chemical class 0.000 abstract 5
- 239000000377 silicon dioxide Substances 0.000 abstract 5
- 239000000243 solution Substances 0.000 abstract 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract 4
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- ZRALSGWEFCBTJO-UHFFFAOYSA-N anhydrous guanidine Natural products NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 abstract 3
- 125000001424 substituent group Chemical group 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N EtOH Substances CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 abstract 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 abstract 2
- CHJJGSNFBQVOTG-UHFFFAOYSA-N N-methyl-guanidine Natural products CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 abstract 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 2
- 238000001816 cooling Methods 0.000 abstract 2
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 abstract 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 abstract 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract 1
- 239000005977 Ethylene Substances 0.000 abstract 1
- 239000004115 Sodium Silicate Substances 0.000 abstract 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 abstract 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000003973 alkyl amines Chemical group 0.000 abstract 1
- 125000003277 amino group Chemical group 0.000 abstract 1
- 125000004103 aminoalkyl group Chemical group 0.000 abstract 1
- 150000003974 aralkylamines Chemical class 0.000 abstract 1
- 150000004982 aromatic amines Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- YOUGRGFIHBUKRS-UHFFFAOYSA-N benzyl(trimethyl)azanium Chemical compound C[N+](C)(C)CC1=CC=CC=C1 YOUGRGFIHBUKRS-UHFFFAOYSA-N 0.000 abstract 1
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 abstract 1
- KDSGPAZGWJOGTA-UHFFFAOYSA-M dibenzyl(dimethyl)azanium;hydroxide Chemical class [OH-].C=1C=CC=CC=1C[N+](C)(C)CC1=CC=CC=C1 KDSGPAZGWJOGTA-UHFFFAOYSA-M 0.000 abstract 1
- 238000010494 dissociation reaction Methods 0.000 abstract 1
- 230000005593 dissociations Effects 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 239000000499 gel Substances 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 229960005235 piperonyl butoxide Drugs 0.000 abstract 1
- 238000001556 precipitation Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- 239000012047 saturated solution Substances 0.000 abstract 1
- 239000000741 silica gel Chemical class 0.000 abstract 1
- 229910002027 silica gel Chemical class 0.000 abstract 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical class O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 1
- 229910001415 sodium ion Inorganic materials 0.000 abstract 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052911 sodium silicate Inorganic materials 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 229920003002 synthetic resin Polymers 0.000 abstract 1
- 239000000057 synthetic resin Substances 0.000 abstract 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229960001124 trientine Drugs 0.000 abstract 1
- HADKRTWCOYPCPH-UHFFFAOYSA-M trimethylphenylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC=C1 HADKRTWCOYPCPH-UHFFFAOYSA-M 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
The invention comprises organic nitrogen base silicates of the general formula: <FORM:0709634/IV (b)/1> wherein R1 and R2 are independent substituent groups selected from hydrogen and alkyl, hydroxyalkyl, aminoalkyl, amidino, cycloalkyl, aralkyl and aryl groups, R3 being an independent substituent group selected from hydrogen and the aforesaid groups and R4 being an independent substituent group selected from the aforesaid groups other than alkyl or R3 and R4 being both -CH2- groups forming part of a heterocyclic ring structure which includes the nitrogen atom, X is a number varying from 0.5 to 4 and Y is a number varying from 0 to 15, and a process for preparing organic nitrogen base silicates by dissolving a silica which is soluble in aqueous alkalis in a solution containing at least 0.1 per cent of an organic nitrogen base, which base has a dissociation constant of at least 10-5 and recovering the resultant organic nitrogen base silicate. Organic nitrogen base silicates may also be prepared by contacting a sodium silicate solution with a synthetic resin base exchange compound which has previously been contacted with an organic nitrogen base, in the resulting base exchange; the sodium ion in solution is replaced by the organic ammonium ion to form a solution of the corresponding organic nitrogen base silicate. The preferred organic nitrogen base silicates are the tetra-b -ethanol ammonium silicates, phenyltrimethylammonium silicates and guanidine silicates which have respectively the formul : <FORM:0709634/IV (b)/2> <FORM:0709634/IV (b)/3> and <FORM:0709634/IV (b)/4> where X and Y have the significance indicated above. Any organic nitrogen base of the following types may be used to form the organic nitrogen base silicates: primary, secondary and tertiary alkyl amines, alkyl quaternary ammonium bases in which at least one of the alkyl groups is substituted by a hydroxyl or amino group, primary, secondary and tertiary aryl amines, aryl quaternary ammonium bases, heterocyclic amines; amidino amines, cycloalkyl amines and aralkyl amines. The organic nitrogen base silicates may be prepared in water or in an organic solvent, e.g. methyl, ethyl or butyl alcohol or acetone. The silica used in the process may be hydrated, or may be in the form of a silica sol or a silica gel which may be finely divided. Dehydrated amorphous silicas such as diatomaceous earths and dried gels, vitreous silica, and crystalline forms of silica such as quartz, cristobalite or tridymite may also be used. If saturated solutions of the nitrogen bases are used for reaction with the silica, the desired base silicates may be recovered by cooling, or by concentrating the resulting solution before cooling. Precipitation of the base silicates may also be brought about by the addition of a small amount of acid or an organic water miscible solvent, e.g. alcohol or acetone. In the examples, organic nitrogen base silicates are formed by the reaction of a silica with each of the following organic nitrogen bases: phenyltrimethylammonium hydroxide and butoxide, tetra-b -ethanolammonium, benzyltrimethylammonium and dibenzyldimethylammonium hydroxides, guanidine, morpholine, cyclo- and dicyclo-hexylamine, ethylene and diethylene diamine, triethylene tetramine, tetraethylene pentamine and mono-, di- and triethanolamine.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4073/51A GB709634A (en) | 1951-02-20 | 1951-02-20 | Improvements in organic silicon compounds and their preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4073/51A GB709634A (en) | 1951-02-20 | 1951-02-20 | Improvements in organic silicon compounds and their preparation |
Publications (1)
Publication Number | Publication Date |
---|---|
GB709634A true GB709634A (en) | 1954-06-02 |
Family
ID=9770228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4073/51A Expired GB709634A (en) | 1951-02-20 | 1951-02-20 | Improvements in organic silicon compounds and their preparation |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB709634A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3239521A (en) * | 1961-08-15 | 1966-03-08 | Philadelphia Quartz Co | Amorphous quaternary ammonium silicates |
US3326910A (en) * | 1963-08-16 | 1967-06-20 | Philadelphia Quartz Co | Amorphous amine silicates substantially free of alkali metal oxide and process for their preparation |
US3338901A (en) * | 1961-08-15 | 1967-08-29 | Philadelphia Quartz Co | Method for producing amorphous quaternary nitrogen compositions |
US3383386A (en) * | 1960-08-22 | 1968-05-14 | Philadelphia Quartz Co | Process for making alkali metal quaternary ammonium silicates |
WO2013064161A1 (en) * | 2011-11-02 | 2013-05-10 | Mindinvest Holdings Ltd. | Polyguanidine silicate and use thereof |
US9695111B2 (en) | 2015-09-22 | 2017-07-04 | Polymate, Ltd. | Method of producing soluble silicates with organic cations |
-
1951
- 1951-02-20 GB GB4073/51A patent/GB709634A/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3383386A (en) * | 1960-08-22 | 1968-05-14 | Philadelphia Quartz Co | Process for making alkali metal quaternary ammonium silicates |
US3239521A (en) * | 1961-08-15 | 1966-03-08 | Philadelphia Quartz Co | Amorphous quaternary ammonium silicates |
US3338901A (en) * | 1961-08-15 | 1967-08-29 | Philadelphia Quartz Co | Method for producing amorphous quaternary nitrogen compositions |
US3326910A (en) * | 1963-08-16 | 1967-06-20 | Philadelphia Quartz Co | Amorphous amine silicates substantially free of alkali metal oxide and process for their preparation |
WO2013064161A1 (en) * | 2011-11-02 | 2013-05-10 | Mindinvest Holdings Ltd. | Polyguanidine silicate and use thereof |
US9695111B2 (en) | 2015-09-22 | 2017-07-04 | Polymate, Ltd. | Method of producing soluble silicates with organic cations |
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