GB2578236A - Broadband achromatic flat optical components by dispersion-engineered dielectric metasurfaces - Google Patents
Broadband achromatic flat optical components by dispersion-engineered dielectric metasurfaces Download PDFInfo
- Publication number
- GB2578236A GB2578236A GB1918652.7A GB201918652A GB2578236A GB 2578236 A GB2578236 A GB 2578236A GB 201918652 A GB201918652 A GB 201918652A GB 2578236 A GB2578236 A GB 2578236A
- Authority
- GB
- United Kingdom
- Prior art keywords
- meta
- units
- phase
- optical
- metasurface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract 14
- 238000000034 method Methods 0.000 claims abstract 8
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract 7
- 239000000758 substrate Substances 0.000 claims 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 4
- 229910002601 GaN Inorganic materials 0.000 claims 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 239000003989 dielectric material Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 239000004408 titanium dioxide Substances 0.000 claims 2
- 230000004075 alteration Effects 0.000 claims 1
- 238000000276 deep-ultraviolet lithography Methods 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- 238000000609 electron-beam lithography Methods 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
- G02B27/4211—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant correcting chromatic aberrations
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1842—Gratings for image generation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
- G02B5/1871—Transmissive phase gratings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
- G02B2207/101—Nanooptics
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
- Lenses (AREA)
- Aerials With Secondary Devices (AREA)
Abstract
Techniques for creating a replacement for optical elements with diffractive planar components based on metasurfaces are provided. In one example, a substantially flat optical component for lensing incoming electromagnetic radiation having at least one wavelength and a first phase into outgoing electromagnetic radiation having a second phase is provided.
Claims (20)
1. A substantially flat optical component for lensing incoming electromagnetic radiation having at least one wavelength and a first phase into outgoing electromagnetic radiation having a second phase, comprising: a substrate; and at least one metasurface, coupled to the substrate, comprising a plurality of optical meta-units to change at least the first phase to the second phase; wherein each optical meta-unit of the plurality of optical meta-units is positioned at a distance that is less than the wavelength from at least a different optical meta- unit.
2. The system of claim 1, wherein each of the plurality of meta-units comprises a meta-unit having a shape to diffractively scatter the electromagnetic radiation.
3. The system of claim 2, wherein the shape comprises an archetype shape having one or more varying geometrical parameters.
4. The system of claim 2, wherein each of the plurality of meta-units is configured to provide a range of optical phase offset and phase dispersion for a broadband achromatic metasurface lens.
5. The system of claim 2, wherein each of the plurality of meta-units is configured to provide a range of scattering amplitude for a broadband achromatic metasurface lens.
6. The system of claim 1, wherein each of the plurality of meta-units comprises a dielectric material.
7. The system of claim 6, wherein the dielectric material is selected from the group consisting of silicon, silicon nitride, gallium nitride, and titanium dioxide.
8. The system of claim 1, wherein the at least one metasurface comprises two or more metasurfaces.
9. The system of claim 8, wherein the two or more metasurfaces are adapted to correct for monochromatic aberrations.
10. The system of claim 1, wherein the at least one metasurface comprises a first and a second layer.
11. The system of claim 10, wherein the first layer comprises a first geometry and a first material, and the second layer comprises a second geometry and/or a second material.
12. The system of claim 1, wherein the at least one metasurface is characterized by a varying thickness.
13. A method of making a substantially flat optical component for lensing incoming electromagnetic radiation having at least one wavelength and a first phase into outgoing electromagnetic radiation having a second phase, comprising: positioning a substrate; and forming at least one metasurface on the substrate comprising a plurality of optical meta-units to change at least the first phase to the second phase; wherein each optical meta-unit of the plurality of optical meta-units is positioned at a distance that is less than the wavelength from at least a different optical meta- unit.
14. The method of claim 13, wherein the forming comprises forming a substrate layer and a patterned film layer thereon having a thickness between 100 and 100,000 nm.
15. The method of claim 14, wherein the patterning is selected from the group consisting of using electron-beam lithography, photolithography, deep ultra-violet lithography, and imprint lithography.
16. The method of claim 13, wherein the forming comprises stacking two or more patterned film layers.
17. The method of claim 13, wherein the meta-units is selected from the group consisting of silicon, silicon nitride, gallium nitride, or titanium dioxide.
18. The method of claim 13, wherein the forming further comprises partially embedding the meta-units in the substrate.
19. The method of claim 13, wherein the meta-units comprise meta-units having varying shapes along at least a height direction.
20. The method of claim 13, wherein the meta-units vary in height.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762510670P | 2017-05-24 | 2017-05-24 | |
PCT/US2018/034460 WO2018218063A1 (en) | 2017-05-24 | 2018-05-24 | Broadband achromatic flat optical components by dispersion-engineered dielectric metasurfaces |
Publications (3)
Publication Number | Publication Date |
---|---|
GB201918652D0 GB201918652D0 (en) | 2020-01-29 |
GB2578236A true GB2578236A (en) | 2020-04-22 |
GB2578236B GB2578236B (en) | 2022-11-09 |
Family
ID=64397096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1918652.7A Active GB2578236B (en) | 2017-05-24 | 2018-05-24 | Broadband achromatic flat optical components by dispersion-engineered dielectric metasurfaces |
Country Status (9)
Country | Link |
---|---|
US (1) | US11906698B2 (en) |
EP (1) | EP3631533A4 (en) |
JP (1) | JP2020522009A (en) |
KR (1) | KR20200008630A (en) |
CN (2) | CN111316138B (en) |
CA (1) | CA3064764A1 (en) |
DE (1) | DE112018002670T5 (en) |
GB (1) | GB2578236B (en) |
WO (1) | WO2018218063A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11579456B2 (en) | 2017-08-31 | 2023-02-14 | Metalenz, Inc. | Transmissive metasurface lens integration |
US11906698B2 (en) | 2017-05-24 | 2024-02-20 | The Trustees Of Columbia University In The City Of New York | Broadband achromatic flat optical components by dispersion-engineered dielectric metasurfaces |
US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
US11978752B2 (en) | 2019-07-26 | 2024-05-07 | Metalenz, Inc. | Aperture-metasurface and hybrid refractive-metasurface imaging systems |
Families Citing this family (20)
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US9995930B2 (en) | 2015-04-08 | 2018-06-12 | Samsung Electronics Co., Ltd. | Focusing device comprising a plurality of scatterers and beam scanner and scope device |
US11994671B2 (en) | 2015-04-08 | 2024-05-28 | Samsung Electronics Co., Ltd. | Focusing device comprising a plurality of scatterers and beam scanner and scope device |
WO2018204856A1 (en) * | 2017-05-04 | 2018-11-08 | President And Fellows Of Harvard College | Meta-lens doublet for aberration correction |
US11089197B1 (en) | 2020-01-27 | 2021-08-10 | Aptiv Technologies Limited | Camera with phased metalens |
US12072511B2 (en) | 2020-02-07 | 2024-08-27 | Samsung Electronics Co., Ltd. | Meta-lens, image capturing lens including the meta-lens, image capturing device including the image capturing lens, and electronic apparatus including the image capturing device |
CN111158070B (en) * | 2020-02-25 | 2021-09-28 | 南京大学 | Double-layer achromatic lens based on all-dielectric super-surface |
CN111624688B (en) * | 2020-05-07 | 2021-09-28 | 中山大学 | Optical fiber micro endoscopic probe based on cascade super surface |
CN113703080B (en) * | 2020-05-22 | 2023-07-28 | 深圳迈塔兰斯科技有限公司 | Superlens and optical system with superlens |
US11933939B2 (en) * | 2020-06-24 | 2024-03-19 | The Regents Of The University Of Michigan | Metalens with artificial focus pattern |
CN111856622B (en) * | 2020-07-15 | 2022-03-04 | 华南师范大学 | Method for realizing wide-band achromatic superlens based on cross-type structure |
EP3968059A1 (en) | 2020-09-11 | 2022-03-16 | Samsung Electronics Co., Ltd. | Meta lens assembly and electronic device including the same |
US11057115B1 (en) * | 2020-09-30 | 2021-07-06 | Visera Technologies Company Limited | Optical communication device |
US11089188B1 (en) * | 2020-11-02 | 2021-08-10 | Aptiv Technologies Limited | Phased metalens for adjusting a focus of an image |
KR20220102040A (en) | 2021-01-12 | 2022-07-19 | 삼성전자주식회사 | Meta lens and electronic apparatus including the same |
WO2022183094A1 (en) * | 2021-02-26 | 2022-09-01 | Imagia Llc | Optical metalens systems |
CN115166876B (en) * | 2021-04-02 | 2024-04-26 | 深圳迈塔兰斯科技有限公司 | Near infrared superlens and light guide optical system for intracranial tumor thermotherapy |
CN113851573B (en) * | 2021-09-23 | 2023-09-01 | 深圳迈塔兰斯科技有限公司 | Super surface for improving light-taking efficiency of LED |
CN114460726B (en) * | 2022-01-30 | 2022-12-02 | 华中科技大学 | Achromatic optical zoom system based on double-layer medium super surface |
US11933940B1 (en) | 2022-09-14 | 2024-03-19 | Imagia, Inc. | Materials for metalenses, through-waveguide reflective metasurface couplers, and other metasurfaces |
US20240241380A1 (en) * | 2023-01-18 | 2024-07-18 | Chiun Mai Communication Systems, Inc. | Metalens array and display device having same |
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US20160306079A1 (en) * | 2015-04-14 | 2016-10-20 | California Institute Of Technology | Multi-wavelength optical dielectric metasurfaces |
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US11906698B2 (en) | 2024-02-20 |
EP3631533A4 (en) | 2021-03-24 |
WO2018218063A1 (en) | 2018-11-29 |
GB2578236B (en) | 2022-11-09 |
DE112018002670T5 (en) | 2020-03-05 |
JP2020522009A (en) | 2020-07-27 |
US20200096672A1 (en) | 2020-03-26 |
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CN111316138A (en) | 2020-06-19 |
KR20200008630A (en) | 2020-01-28 |
GB201918652D0 (en) | 2020-01-29 |
CN111316138B (en) | 2022-05-17 |
CA3064764A1 (en) | 2018-11-29 |
CN115047548A (en) | 2022-09-13 |
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