GB2492532A - Method of manufacturing a thin film transistor - Google Patents
Method of manufacturing a thin film transistor Download PDFInfo
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- GB2492532A GB2492532A GB1110834.7A GB201110834A GB2492532A GB 2492532 A GB2492532 A GB 2492532A GB 201110834 A GB201110834 A GB 201110834A GB 2492532 A GB2492532 A GB 2492532A
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32139—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1292—Multistep manufacturing methods using liquid deposition, e.g. printing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
- H01L29/66757—Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
- Thin Film Transistor (AREA)
Abstract
A method of manufacturing a transistor comprising: providing a substrate 1, a layer of semiconductive material 5 supported by the substrate 1, and a layer of electrically conductive material 2 supported by the layer of semiconductive material 5; forming at least one layer of resist material 3 over said layers; forming a depression 4 in a surface of the covering of resist material 3, said depression 4 extending over a first portion 21 of said conductive layer 2, said first portion 21 separating a second portion 22 of the conductive layer 2 from a third portion 23; removing resist material located under said depression 4 so as to form a window 9 exposing said first portion 21 of the electrically conductive layer 2; removing said first portion 21 to expose a connecting portion 51 of the semiconductive layer 5, said connecting portion 51 connecting the second portion 22 to the third portion 33 of the conductive layer 2; depositing dielectric material at least inside the window 9 to form a layer of dielectric material 61,62 over the exposed portion 51 of the semiconductive layer 5; and depositing electrically conductive material to form a layer of electrically conductive material 71,72 over said layer of dielectric material 61,62; the layer of dielectric material 61 electrically isolating the layer of electrically conductive material 71 from the second 22 and third 23 portions of the conductive region; removing resist material at least from around said window 9 so as to expose the second 22 and third 23 portions, such that the second 22 and third 23 portions act as source and drain electrodes and the conductive material 71 acts as a gate electrode. Also disclosed is the transistor formed from this method.
Description
Transistor and its Method of Manufacture
Field of the Invention
The present invention relates to transistors, and in particular, although not exclusively, to thin film transistors.
Background to the Invention
A wide variety of transistors are known. These include field effects transistors, in which the conductivity of a channel or layer of semiconductive material arranged between a source terminal and a drain terminal is controlled by application of a potential to a gate terminal. Thin-film transistors are also known. Thin film transistors (TFTs) are a type of field effect transistor (FET) typically made by depositing a thin film of a semiconductive active layer as well as a dielectric layer and metallic contacts over a supporting substrate. In certain applications, the substrate is glass, for example where the TFT is used in a liquid crystal display. TETs can be made using a wide variety of semiconductive materials. By using transparent semiconductors and transparent electrodes, such as indium tin oxide (ITO), certain TFT devices can be made completely transparent.
In the manufacture of known TFTs, it is necessary to achieve alignment between the gate and source and drain terminals. In the past, lithographic techniques have been used to manufacture TFTs, with, typically, one mask defining the relative positions of source and drain terminals and another mask defining the positions of the gate terminals, for example where an array of a large number of TFTs is being produced. Clearly, a problem with such techniques is achieving the appropriate alignment between the finely patterned masks used at different stages of the manufacturing process. Another problem arises where the substrate has a large area and the array of IFT devices is to be distributed over that large area. Imperfections and distortions in the substrate can result in local misalignments between the source and drain and the gate of one or more TFT devices. In the manufacture of liquid crystal displays, for example, these misalignments can result in faulty pixels, which degrade the display and indeed may render it
unacceptable.
Additional problems associated with the manufacture of thin-film transistors include the following. The minimum size of the device features is limited by the manufacturing techniques, which in turn limits the density of devices which can be formed on a single substrate, for example limiting the resolution of a display incorporating an array of TFTs. The correct operation of the thin film transistors is typically highly sensitive to the quality of the interfaces between the different device layers, such as the interface between the substrate and semiconductor material, the interface between the semiconductor material and the gate dielectric, and the interface between the gate dielectric and the gate electrode itself. These interfaces are degraded, and the performance of the TFT itself is degraded, when there are imperfections in these interfaces, such as when these interfaces become contaminated during the manufacturing process. It is therefore desirable to develop a method of manufacturing thin-film transistors which assists in the formation of clean, defect free interfaces.
Summary of the Invention
Embodiments of the present invention aim to solve, at least partly, one or more of the problems
associated with the prior art.
Particular embodiments aim to provide a method of manufacturing a transistor which facilitates correct alignment between the source, drain, and gate terminals.
Certain embodiments of the invention aim to provide methods of manufacturing transistors which are particularly suited to the manufacture of large-area devices, such as liquid crystal displays incorporating a large number of TFTs.
Certain embodiments aim to provide techniques of manufacturing transistors which are compatible with fast and high volume manufacturing of large-area devices.
Certain embodiments aim to provide transistors, and methods of manufacturing such transistors, having nanoscale features, i.e. features with dimensions in the range i0° to 10am or even smaller.
According to a first aspect of the present invention there is provided a method of manufacturing a transistor, the method comprising: providing a substrate, a region of semiconductive material supported by the substrate, and a region of electrically conductive material supported by the region of semiconductive material; forming at least one layer of resist material over said regions to form a covering of resist material over said regions; forming a depression in a surface of the covering of resist material, said depression extending over a first portion of said region of conductive material, said first portion separating a second portion of the conductive region from a third portion of the conductive region; removing resist material located under said depression so as to form a window, through said covering, exposing said first portion of the electrically conductive region; removing said first portion to expose a connecting portion of the region of semiconductive material, said connecting portion connecting the second portion to the third portion of the conductive region; depositing dielectric material at least inside the window to form a layer of dielectric material over the exposed portion of the region of semiconductive material; depositing electrically conductive material to form a layer of electrically conductive material over said layer of dielectric material, the layer of dielectric material electrically isolating the layer of electrically conductive material from the second and third portions of the conductive region; and removing resist material at least from around said window so as to expose the second and third portions, whereby said second and third portions provide a source terminal and a drain terminal respectively and the layer of electrically conductive material provides a gate terminal to which a potential may be applied to control a conductivity of the connecting portion of the region of semiconductive material connecting the second and third portions.
This method provides the substantial advantage that correct alignment of the source, drain, and gate terminals (and indeed the correct positioning of the semiconductor connecting portion, i.e. the channel, and gate dielectric) is achieved by the single step of forming the depression. In other words, the position of the depression formed in the covering of resist material defines, in a single step, the position of the source terminal, the position of the drain terminal, the position of the semiconductive channel connecting them, and the position of the gate relative to the semiconductor. In this way, alignment problems associated with the prior art are overcome.
It will be appreciated that the region of semiconductive material (which can also be described as an area or layer of semiconductive material) can be formed on the substrate using a wide range of known techniques. Any suitable known technique can therefore be employed to provide the region of semiconductive material in a method in accordance with the first aspect of the invention. Similarly, the region of conductive material (which can also be described as an area or layer of conductive material) can be formed on the semiconductive region using a wide range of known techniques. Any suitable known technique can therefore be employed to provide the region of conductive material in a method in accordance with the first aspect of the invention.
A wide variety of materials may be used for the substrate, which in certain embodiments may be transparent, and in others opaque. In certain embodiments the substrate consists of a single layer or body of substrate material. In certain embodiments the substrate has a multi-component (e.g. multi-layer) structure, comprising a plurality of different substrate materials.
In certain embodiments the substrate comprises at least one material (e.g. in the form of a layer of that material) selected from a list comprising: glass (rigid or flexible); polymer (e.g. polyethylene naphthalate or polyethylene terephthalate); polymeric foil; paper; insulator coated metal (e.g. coated stainless-steel); cellulose; polymethyl methacrylate; polycarbonate, polyvinylalcohol; polyvinyl acetate; polyvinyl pyrrolidone; polyvinylphenol; polyvinyl chloride; polystyrene; polyethylene naphthalate; polyethylene terephthalate; polyamide (e.g. Nylon); poly(hydroxyether); polyurethane; polycarbonate; polysulfone; polyarylate; acrylonitrile butadiene styrene, 1 -Methoxy-2-propyl acetate (SU-8), polyhydroxybenzyl silsesquioxane (HSQ), polyimide, Benzocyclobutene (BCB), A1203, SiOXNY, Si02, SiaN4. UV-curable resin; Nanoimprint resist; photoresist.
In certain embodiments the substrate may be a multi-component system in which the first conductive layer has embedded conductive structures within one or more of the components.
The multi-component system may include a release layer, releasable by methods such as UV, thermal, laser or physical peeling, which enables one or more of the components to be detached from the other components. Such detachment may be used to expose or enable easier exposure of the embedded conductive structures connected to the first conductive layer.
In certain embodiments the substrate may comprise one or more embedded/incorporated features and/or devices. For example, the substrate may comprise a plurality of conductive tracks to provide connections to, and interconnections between, one or more transistors formed on the substrate.
A wide variety of techniques may also be used to form the at least one layer of resist material, and a variety of resist materials may be employed in different embodiments of the invention.
These methods of forming the at least one layer of resist material include coating (spin, dip, blade, bar, spray, slot-die) or extrusion. Suitable resist materials include poly hydroxybutyrate, polymethyl methacrylate, polyvinylalcohol, polyvinyl acetate, polyvinyl pyrrolidone, polyvinylphenol, polyvinyl chloride, polystyrene, polyamide (e.g. Nylon), poly(hydroxyether), polyurethane, polycarbonate, polysulfone, polyarylate, acrylonitrile butadiene styrene, polyimide, benzocyclobutene (BCB), photoresist, 1 -Methoxy-2-propyl acetate (SU- 8),polyhydroxybenzyl silsesquioxane (HSQ), fluorinated polymers e.g. PTFE, uv curable liquid resin (such as those described in US6284072),silicone, silioxane, parylene. Commercial imprint resists are available through companies such as Microchem/Microresist, Shipley and Nanolithosolution Inc. S A variety of techniques may be employed for forming the depression in a surface (e.g. a nominal upper surface) of the covering of resist material. One suitable technique is to employ a mask to define the location of the depression, and then to remove material to form a depression.
Another technique which is used in certain embodiments of the invention is to form the depression using an imprint tool, which may also be referred to as an imprint stamp or shim.
This imprint tool typically will have an imprint feature protruding from a base surface, the imprint tool being positioned with respect to the covering of resist material so that the imprint feature is correctly located over the first portion. The depression may be formed by pressing the imprint tool against the covering after the covering has been formed. Alternatively, in other embodiments the depression may be formed by imprinting the resist material at the same time as the covering, or at least an upper layer of it, is formed.
In certain embodiments the covering comprises just a single layer of resist material. However, in alternative embodiments the covering comprises a plurality of layers. In certain embodiments, the covering comprises a first layer of a first resist material, and a second layer of a second, different resist material, formed over the first layer. In certain embodiments, the first resist material is a lift-off resist material, such as Microchem LOR or AR-ULP underlayer polymer (Nanolithosolution Inc). In certain embodiments, the second resist material is an imprintable resist material. Thus, in certain embodiments, the depression can be formed in a surface of a second layer of imprintable resist material at the same time that the second layer is formed. For example, the second resist material may be a UV curable polymer and the imprint tool or mask may be transparent to UV such that the resist material can be cured while the imprint mask is in contact with it, thereby defining the depression.
The removing of the first portion of conductive material can be achieved using a variety of techniques. These techniques include ablation (e,g, laser) and etching (chemical, dry, reactive-ion, plasma).
A wide variety of semiconductive materials may be used in embodiments of the invention, including for example: metal oxides such as zinc oxide, tin oxide, cuprous oxide; inorganic semiconductor such as amorphous, microcrystalline or nanocrystalline silicon; binary metal oxides such as lithium zinc oxide, zinc tin oxide, indium tin oxide, indium zinc oxide; ternary metal oxides such as GalnZnO; metal oxynitrides e.g. ZnON; organic or polymer semiconductors.
The depositing of dielectric material can be performed using a variety of techniques, including: vapour deposition (physical e.g. sputter; chemical e.g. PECVD); vacuum deposition (e.g. thermal or e-beam evaporation); coating e.g. spray, spin, slot, die; printing e.g. jet; pulsed-laser deposition (PLD); atomic-layer deposition (ALD).
It will be appreciated that, in certain embodiments of the invention, the deposition techniques result in dielectric material being deposited additionally outside the window, that is on top of the covering of resist material in which the window is defined. It will also be appreciated that dielectric material deposited outside the window, on top of the covering of resist material, is removed in the later step of the method when resist material, round the window, is removed.
Dielectric materials suitable for use in embodiments of the invention include the following: polymethyl methacrylate, polybutyl methacrylate, polyethyl methacrylate, polyvinyl acetate, polyvinyl pyrrolidone, polyvinylphenol, polyvinylchloride, polystyrene, polyethylene, polyvinyl alcohol, polycarbonate, parylene; inorganic insulator such as silica, silicon nitride, metal oxide (e.g. A1203, Hf02, Ti02, Ta205,Y205, Zr02), metal phosphates (e.g. Al2PO), metal sulphates/sulfites (e.g. HfSO), metal oxynitrides (e.g. AlON), metal nitride (AIN), silicone, silioxane, SiNX The depositing of electrically conductive material can be achieved using a variety of techniques, including: vapour deposition (physical e.g. sputter; chemical e.g. PECVD); vacuum deposition (e.g. thermal or e-beam evaporation); coating e.g. spray, spin, slot, die; printing e.g. jet; pulsed-laser deposition (PLD); atomic-layer deposition (ALD).
A wide range of materials can be used as the electrically conductive material, including for example: metal (e.g. Au, Ag, Ti, Al, Cr, Ni, Cu, Ta, W, Pt, Mo etc.), transparent conductive oxide (e.g. ITO, AZO, IZO), carbon black, carbon nanotubes, conducting polymer (e.g. polyaniline, PEDOT:PSS) Again, in certain embodiments of the invention this deposition of electrically conductive material will also result in conductive material being deposited on top of dielectric material itself overlaying resist material, outside the window. Thus, the method in certain embodiments results in a multi-layer structure being built up directly on the connecting portion of semiconductor material (the channel) inside the window, and a corresponding multi-layer structure being built up on top of the covering of resist material outside the window. The multilayer structure built up on the covering of resist is typically completely removed at a later stage, leaving just the multi-layer structure that was formed in the window to form part of the eventual transistor.
The resist in certain embodiments can be selected so as to discourage or repel growth of one or more thin-films, i.e. of dielectric or conductive material, on the resist during the deposition process. The resist in certain embodiments can additionally be chemically modified to change its surface properties, for example with a fluorinated silane or other fluorinated coating, or formulated so as to make the surface substantially hydrophobic or hydrophilic or lyophobic. An alternative chemical treatment as described in EP1124791 or US7034129, the contents of which are incorporated by reference herein, may also be applied to change the surface hydrophobicity. Additional surface treatment such as UV, plasma, ozone, corona discharge or piranha etch may also be applied. The choice will depend on the materials to be deposited and the selectivity ot the deposited layer to the surface treatment.
The removing of resist material at least from around the window can be achieved using a variety of techniques, including: development with lift-off remover (e.g. Microchem nanoremover PG), solvent (e.g. organic, aqueous), ozone (e.g. ozonated water); planarization and milling (e.g. ion)/grinding (e.g. chemical, physical)/etching (e.g. dry, wet, reactive-ion); or a combination of one or more of the previous techniques.
In embodiments where the covering of resist material comprises just lift-off resist material, or a bottom layer of lift-off resist material, this removing step can also be referred to as a lift-off step.
In certain embodiments, the method may further comprise undercutting (i.e. forming at least one undercut in) the covering of resist material around the window before said depositing of dielectric material so as to expose a part of an upper surface of the second portion adjacent the connecting portion of semiconductor and expose a part of an upper surface of the third portion adjacent the connecting portion.
This provides the advantage that the deposition of the dielectric material inside the window can be arranged such that the dielectric layer covering the semiconductive channel partially overlaps or overlies those parts of the second and third portions of conductive material, and so provides better electrical insulation/isolation between the gate terminal (subsequently formed on the dielectric later) and the channel and source and drain terminals than could be achieved if edges of the dielectric layer coincided with the edges of the source and drain regions.
In certain embodiments, the undercutting around the window is achieved by selecting first and second layers of resist material having different properties, and then preferentially removing material of the underlying layer. For example, the different resist materials may be selected so as to have different etch rates for a given etching material or process, the etching rate of the lower layer being greater than that of the upper layer or layers.
In addition to employing undercutting, the window may also generally be widened before the dielectric material is deposited, so as to expose even greater areas of the source and drain regions. This widening may be performed at the same time as the undercutting, after the undercutting, or, in certain embodiments, as an alternative to undercutting. By exposing even greater portions of the second and third regions (i.e. the source and drain regions) the dielectric layer can be formed in a manner so as to provide better isolation to those regions.
It will be appreciated that a substantial advantage of employing undercutting in certain embodiments of the invention is that, as the dielectric and conductive layers are sequentially deposited (i.e. built up) inside the window, the associated build up of dielectric and conductive material on the overhanging lip or rim of the window may result in the areas of the layers becoming progressively smaller inside the window region. This helps to ensure that the gate material does not form a short to the source and/or drain regions, and furthermore ensures that the layer of dielectric material completely insulates the gate layer from the semiconductive layer.
The formation of the undercut or undercuts also helps to maintain a break between the layers of materials deposited inside the window and the corresponding layers of materials deposited on top of the covering of resist material surrounding the window. In turn, this facilitates the final removal or lift-off step, whereby the unwanted' dielectric and conductive material is removed, leaving just the desired multi-layer structure arranged with respect to the source and drain terminals.
Another aspect of the invention provides a method of forming an electrical circuit comprising a plurality of transistors, the method comprising: forming each said transistor on a common substrate using a method in accordance with the above-mentioned first aspect; and forming interconnections between these transistors.
Another aspect of the invention provides a transistor manufactured using a method in accordance with any aspect of the invention. Another aspect of the invention provides an electrical circuit manufactured using a method embodying the invention.
Further aspects of the invention provide: an electronic circuit or logic gate comprising at least one transistor embodying the invention; a programmable transistor array comprising a plurality of transistors, each manufactured by a method embodying the invention, and having been formed on a common substrate; and a programmable logic array comprising a plurality of logic gates, each logic gate comprising at least one respective transistor manufactured by a method embodying the invention, and wherein the respective transistors are formed on a common substrate.
In certain embodiments, the array further comprises a covering of dielectric material formed over the plurality of transistors formed on the common substrate.
In certain embodiments, the array further comprises a plurality of windows formed in the covering of dielectric material to expose a plurality of terminals of the plurality of transistors so as to enable selected interconnections to be made between the exposed terminals.
Another aspect provides an electronic circuit comprising an array in accordance with one of the above-mentioned aspects, and a plurality of electrical tracks arranged to provide interconnections between selected transistor terminals.
Another aspect provides a method of forming an electronic circuit, the method comprising manufacturing an array of a plurality of transistors on a common substrate using a method in accordance with any other aspect, forming a covering of dielectric material over the array of transistors, forming a plurality of windows in the covering of dielectric material, each window exposing at least a portion of a terminal of a respective transistor, and selectively forming interconnections between said exposed portions of terminals. In certain embodiments, the selective formation of interconnections comprises printing conductive material. Another aspect provides an electronic circuit manufactured using this method.
Another aspect of the invention provides a regular array of transistors or logic gates which can be programmed to create a particular electrical circuit, such that the fabrication of the regular array is the same for each circuit but different functionalities can be chosen through programming. The programming can be achieved by designing a mask, such as a photomask, to selectively open up certain terminals (source, drain, gate, voltage rail, etc.) to create a particular circuit. Alternatively, a standard mask may be used, such as an imprint tool with regular features or a photomask, which opens-up all the possible terminals available for programming. The circuit can then be selected by depositing conductive material, e.g. by jet-printing of conductive ink such as nanoparticulate silver, into the desired terminals to create the functional circuit required. An alternative method uses laser-writing or maskless lithography to create windows in a resist material and in-filling the windows with conductive material. In this case the resist may be used as a lift-off mask to remove unwanted conductive material or a solution-based infill may equally be employed.
A further method provides via-holes over the terminals areas, either by selective drilling (e.g. micro, laser) of the desired vias for the circuit or by opening-up every available programmable terminal. In the first case conductive material may be used to fill-in the vias (e.g. evaporation, solvent deposition, sputter-coating) which may be connected together by printing, e.g. jet, gravure, etc. In the second case the vias may be created by a regular imprint tool or photomask or by drilling (e.g. micro, laser). All the vias may be filled with conductive material using solution deposition, vacuum, vapour deposition, coating or electroplating/electroless plating up from the conductive material on the terminal. Chemical vapour deposition is also possible, for example Cupraselect'TM, a commercial material available from Air Products, may be used to selectively deposit copper onto conductive areas leaving insulating areas uncoated. This may equally be employed to fill-in via-holes. Again, the via-holes may be used to program or select a circuit for a particular application using printing methods such as gravure, jet or flexo, amongst others.
Alternatively a multi-level imprint such as described in GB915250.5 may be used to create a standard array of potential interconnections between terminals of the regular transistor or logic array. The imprinted structure may then be filled with conductive material to create all possible interconnections. The final step of programming may be to disconnect undesired interconnections for example using fuse-burning or laser-ablation of undesired interconnection wires. Other programming and interconnection methods are described in GB920563.4, and GB915250.5, the contents of each of which are incorporated by reference herein.
Another aspect of the invention provides a transistor comprising: a substrate; a region of semiconductive material supported by the substrate; a source terminal and a drain terminal, each said terminal being supported by the region of semiconductive material, and the source and drain terminal being connected by a connecting portion of the region of semiconductive material; a layer of dielectric material deposited so as to cover at least a portion of said connecting portion; and a layer of electrically conductive material deposited so as to cover at least a portion of the layer of dielectric material, the layer of dielectric material electrically isolating the layer of conductive material from the source and drain terminals, and the layer of electrically conductive material providing a gate terminal to which a potential may be applied to control a conductivity of the connecting portion of the region of semiconductive material connecting the source and drain terminals.
It will be appreciated that further advantages provided by embodiments of the invention include the following. Certain embodiments of the invention provide methods which are capable of producing transistors (i.e. switching devices) having nanoscale dimensions, and devices (e.g. logic gates) and circuits incorporating such nanoscale transistors. Certain embodiments are able to provide manufacturing methods which themselves provide a pathway to smaller device features beyond photolithographic techniques. Certain embodiments provide methods in which a sequence or series of the method steps to manufacture transistors may be performed without breaking vacuum, thereby providing the advantage that the cleanliness and integrity of interfaces between different materials is maintained. For example, it magnetron coating may be used to successively deposit layers of aluminium oxide (dielectric) and indium tin oxide (gate electrode).
Brief Description of the Drawings
Embodiments of the invention will now be described with reference to the accompanying drawings, of which: Fig. 1 is a schematic representation of steps in a method of manufacturing a transistor embodying the present invention; Fig. 2 is a schematic representation of steps in another method embodying the invention and for manufacturing a transistor; Fig. 3 is a schematic representation of steps in another method of manufacturing a transistor embodying the invention; Fig. 4 is a schematic representation of steps in a method of manufacturing a gate or circuit in accordance with an embodiment of the invention; Fig. 5 illustrates a circuit (itself embodying the invention) and processes to fabricate a circuit in a method embodying the invention; Fig. 6 illustrates another circuit (itself embodying the invention) and processes to fabricate a circuit in another method embodying the invention; Fig. 7 is a schematic representation of steps in a method of manufacturing an electrical circuit in accordance with an embodiment of the invention; Fig. B illustrates steps in a method of manufacturing an electronic circuit embodying the invention, in which selected interconnections are formed between a plurality of transistors, each transistor embodying the invention, and having been formed by a method also embodying the invention; and Fig. 9 illustrates steps in the manufacture of a thin-film transistor array in which all available programmable terminals are opened-up with via-holes, filled with conductive material, and a certain circuit is then selected by printing.
Detailed Description of Embodiments of the Invention Referring now to Fig. 1, this illustrates stages or steps in a first method embodying the invention for manufacturing a transistor, which may be referred to as a thin film transistor. The method comprises a step of providing a substrate 1, a region of semiconductive (i.e. semiconductor) material 5 supported by the substrate, and a region of electrically conductive material 2 supported by the semiconductor 5. The resultant arrangement is shown in Fig. 1A. Here, the region 5 can also be described as a layer of semiconductive material, or a pad. In this embodiment, the region 5 does not cover the entire upper surface of the substrate 1, but just a selected portion of it. It will be appreciated that, although Fig. 1 shows the formation of just a single transistor including source and drain regions formed from a single pad or region 5, in alternative embodiments an array of a plurality of transistors may be formed on a common substrate 1, each transistor being formed to incorporate source and drain regions from a respective one of a plurality of pads. It will also be appreciated that the semiconductive region 5 and conductive region 2 shown in Fig. 1A may be formed on the substrate surface using a variety of techniques known in the art.
After providing the semiconductive and conductive regions 5 and 2 on the substrate 1, a covering 3 of resist material is formed over the regions 5 and 2, to encapsulate them, and a depression 4 is formed in a surface 34 of the covering 3. In this first embodiment, the depression 4 is formed at the same time as the covering 3 of resist material is formed, and the resist material of the covering 3 is a UV curable polymer. The depression 4 has been formed by using an imprint tool 400, having an imprint feature 401 raised above a base surface 402. The resist covering 3 has been formed with the imprint tool 400 positioned with respect to the substrate and semiconductive and conductive regions 5, 2 and the resist material 3 has then been cured by application of UV light through the imprint tool or mask 400 (which is transparent to UV). The imprint tool 400 has then been separated from the structure, as shown in Fig. lB.
The depression 4 extends over a first portion 21 of the conductive region 2, and this first portion 21 separates a second portion 22 from a third portion 23 of the region 2. The second portion 22 will form the source of the transistor, and the third portion 23 will form the drain.
After forming the resist covering 3 and depression 4, resist material located under the depression 4 is then removed by a suitable technique (e.g. etching) to form a window 9 through the covering 3 and which exposes the first portion 21 of the region 2. The resultant arrangement is shown in Fig. 1C. Next, this first portion 21 of conductive material is also removed, such that the window 9 now extends through the covering 3 and the conductive region or pad 2, to a surface of the semiconductor layerS as shown in Fig. 1D. Thus, a portion 51 of the semiconductor layer is exposed, this exposed portion 51 connecting the source and drain regions 22, 23. Thus, the window 9 defines a gap between the source and drain, above the connecting semiconductor channel 51.
Next, dielectric material is deposited over the structure shown in Fig. 1D, to produce the structure shown in Fig. 1 E. This dielectric material has formed a layer of dielectric material 61 (a gate dielectric layer) inside the window 9 and which covers the connecting portion 51. The deposited dielectric material has also formed layers or coatings/coverings 62 on top of the resist material around the window.
Next, electrically conductive material is deposited on the structure shown in Fig. 1 F, to produce the structure of Fig. 1 F. This deposited electrically conductive material forms a layer of electrically conductive material 71 on top of the semiconductor 51 and dielectric 61 layers inside the window 9, and again forms corresponding layers 72 of conductive material on top of the layers 62 overlaying the resist covering around the window. Thus, both inside the window 9 and on top of the resist covering around the window, a two-layer structure or stack is formed, comprising a bottom layer of dielectric, and a top layer of conductive material.
Next, the remaining resist material of the coveling 3 is removed from the substrate by a suitable technique. By removing the resist material around the window 9, the surrounding layers 62 and 72 are also lifted off the structure, to leave the structure shown in Fig. 1G. As will be appreciated! this structure comprises a transistor having a source, drain, and connecting conductive channel 51 supported on a surface of the substrate 1. A gate terminal 71 is separated from the semiconductor layer 51 by a gate dielectric 61, and application of a potential to the gate is able to control conductivity of the semiconductive channel 51 between the source and drain.
In this first embodiment, the thickness of the layer of semiconductive material 51 is substantially equal to the thickness of the source and drain terminals 22, 23, although it will be appreciated that in other embodiments the relative thicknesses may be different, for example the semiconductive layer 51 may be thicker than, or thinner than the source and drain regions.
Referring now to Fig. 2, this shows another method embodying the invention, for manufacturing a field effect transistor. In this second embodiment, regions or pads 5 and 2 of semiconductive and electrically conductive material are again formed on a substrate 1. For simplicity, Fig. 2 only shows the portion of substrate 1 underneath the semiconductive 5 and conductive 2 regions, and it will be appreciated that in certain embodiments the semiconductive and conductive regions 5, 2 will not cover the entire substrate 1, instead covering just a portion of it.
In this second embodiment, a covering 3 of resist material is again formed over the regions 5 and 2, but this time the covering 3 comprises a first layer 31 of lift-off resist material formed directly over the conductive region 2, and a second layer 32 of imprintable resist material formed over the first layer 31. Thus, the resist covering 3 comprises layers of different resist materials, having different properties.
In this second embodiment, after forming the resist covering 3, a depression 4 is formed in an upper surface 34 of the top layer 32 of imprintable resist material. In alternative embodiments, the depression 4 may be formed at the same time as forming the upper layer 32 of resist material. For example, in certain embodiments the semiconductor region 5 and conductive region 2 may together be one of a plurality of multi-layer pads deposited onto the substrate 1 at selected positions using a first mask. Over that structure, a layer of lift-off resist material can be formed by spin-coating. Then, an imprint tool, which can be regarded as a second mask, can be aligned with respect to the pads 5, 2 and the second layer 32 of resist material, incorporating the depression or depressions 4 can be formed with the second mask in position over the pads.
As described above, the material for the upper layer 32 of resist can be UV curable material.
Still referring to Fig. 2, this illustrates stages or steps in a method embodying the invention for manufacturing a transistor, which may be referred to as a thin film transistor. The method comprises a step of providing a region of electrically conductive material 2 and a region of semiconductor material 5 (optionally supported by a substrate 1 (not shown)).
Layer 2 may have been formed, for example, by doping the upper portion of a region of the semiconductor material 5, for example using plasma treatment, thermal, pulsed-lamp or laser annealing, or deposition of a strongly polar material (e.g. self-assembled monolayer) capable of modulating carrier density within the film.
After providing the conductive region 2 on the region of semiconductor material 5, a covering of lift-off resist material 31 and UV curable polymer 32 is deposited over the entire substrate. A window 9 is created through patterning of the layers 31 and 32, such as UV imprint, followed by removal of the residual material so as to expose the top-surface of region 21 of conductive layer 2, and optionally portions of the top surface of the substrate (e.g. surrounding the device). The resultant arrangement is shown in Fig. 2A.
Fig 2B shows a further stage where the exposed area 21 of conductive material 2 is completely removed so as to create separate regions of conductive material 22 and 23, which will later become the source and drain regions of the thin-film transistor.
Fig 2C shows a further stage where the window 9 is widened, for example by oxygen plasma, removing portions of lift-off resist 31 and UV curable polymer 32. In this case the lift-off resist is widened more quickly than the UV curable polymer 32, creating a lip or undercut structure.
Next, dielectric material and conductive mateiial is deposited over the structure shown in Fig. 2C, to produce the structure shown in Fig. 2D. The dielectric material has formed a layer of dielectric material 61 inside the window 9 which mechanically, but not electrically, connects the first conductive region 22 to the second conductive portion 23. The deposited dielectric material has also formed layers or coatings/coverings 62 on top of the resist material around the window.
The conductive material has formed a layer of conductive material 71 inside the window 9 and sits on top of the dielectric material 61. The deposited conductive material has also formed layers or coatings/coverings 72 on top of the resist material around the window 9.
Next the lift-off resist 31 is removed using solvent developer, in the same process removing the remaining UV curable polymer 32 and regions of dielectric material 62 and conductive material 72. The resulting structure is a thin-film transistor as shown in Fig 2E. Fig 2F shows a top-view of the thin-film transistor structure. Optional supporting substrate 1 is also labelled. In this device the semiconductive channel between the source and drain is provided in the layer of semiconductive material 5. The source and drain terminals 22 and 23 are positioned above the semiconductive layer 5, the gate dielectric 61 separates the source and drain in their plane, and extends above that plane, and the gate terminal 71 sits above the planes of both the channel and the source and drain terminals.
Referring now to Fig. 3, this illustrates stages or steps in another method embodying the invention for manufacturing a transistor, which may be referred to as a thin film transistor. The method comprises a step of providing a region of electrically conductive material 2, a region of semiconductor material Sand layer of dielectric material 8, optionally supported by a substrate 1 (not shown).
After providing the conductive region 2 on the region of semiconductor material 5 and layer of dielectric material 8, a covering of lift-off resist material 31 and UV curable polymer 32 is deposited over the entire substrate. A window 9 is created through patterning of the layers 31 and 32, such as UV imprint, followed by removal of the residual material so as to expose region 21 of conductive layer 2 and optionally the top surface of the substrate 1. The resultant arrangement is shown in Fig. 3A.
Fig 3B shows a further stage where the exposed area 21 of conductive material 2 is completely removed so as to create separate regions of conductive material 22 and 23, which will later become the source and drain regions of the thin-film transistor.
Fig 3C shows a further stage where exposed portions of the lift-off resist 31 are removed using a developer, leaving UV curable polymer 32 and thus the width of window 9 unaffected. Similar to figure 2C a lip or undercut structure has been created.
Next, dielectric material and conductive material are deposited over the structure shown in Fig. 3C,to produce the structure shown in Fig. 3D. The dielectric material has formed a layer of dielectric material 61 inside the window 9 which connects the first conductive region 22 to the second conductive portion 23. The deposited dielectric material has also formed layers or coatings/coverings 62 on top of the resist material around the window. The conductive material has formed a layer of conductive material 71 inside the window 9 and sits exactly aligned to the previously deposited dielectric material 61. The deposited conductive material has also formed layers or coatings/coverings 72 on top of the resist material around the window 9.
Next the lift-off resist 31 is removed using solvent developer, in the same process removing the remaining UV curable polymer 32 and regions of dielectric material 62 and conductive material 12. The resulting structure is a thin-film transistor as shown in Fig 3E. Fig 3F shows a top-view of the thin-film transistor structure.
Referring now to Fig 4 this illustrates stages or steps in another method embodying the invention for manufacturing a gate or circuit, which may be referred to as a thin film gate or circuit. The method comprises a step of providing regions of electrically conductive material 2 and 220, a region of semiconductor material 5 and a layer of dielectric material 8, optionally supported by a substrate 1 (not shown).
A layer of lift-off resist 31 and a layer of UV curable polymer 32 have been deposited over conductive region 2. The layers 31 and 32 have been patterned with an imprint tool 400 as shown in Fig 4e. The imprint tool 400 (which is transparent to UV) has imprint features 401 and 403 raised at different heights above a base surface 402. The lift-off resist covering 31 and UV curable polymer 32 have been patterned (by urging imprint tool 400, exposing to UV light and removing imprint tool 400) to create different height features relating to 401 and 403.
Fig 4a shows a section of the structure relating to imprint tool height 403. Layers 31 and 32 has been etched by oxygen plasma so as to removed to expose the top-surface 21 of conductive layer 2 and create window 9.
Fig 4b shows a further step where exposed conductive material 21 has been completely removed.
Fig 4c shows a further step where a layer of dielectric material 61 has been deposited within the window 9. The deposition process is such that this only occurs within the window 9. For example, this can be deposited by solution filling the lowest point in the trench 9. Alternatively, a selective deposition process such as atomic layer deposition may have been used. In this instance the resist materials 31 and 32 would have properties which repel adhesion of the dielectric, e.g. very hydrophobic, perfluorinated materials. They may have been treated with a surface coating to provide this property.
Fig 4d shows a further step in the process where the lift-off resist 31 has been undercut using solvent developer.
Fig 4f shows a further section of the structure relating to the patterns created by both imprint tool heights 403 and 401. The structure reflects the situation after the imprint tool 400 has been removed and the resist layers 31 and 32 etched by oxygen plasma so as to expose sections 221 and 231 of the regions of conductive material 220 and 230. Unexposed regions 220 and 230 of conductive material have a layer of lift-off resist 31 deposited directly above them. In this instance the height 401 of imprint tool 400 is such that there is no remaining UV curable polymer 32 remaining above regions of conductive material 220 and 230.
Fig 4g shows a further stage where the exposed sections 221 and 231 have been completely removed.
Fig 4h shows a further stage where dielectric material 61 has been deposited but does not coat either lift-off resist material 31 or UV curable polymer material 32.
Fig 4i shows a further stage where lift-off resist material 31 has been undercut using a solvent developer. In this case the undercut process has completely removed the lift-off resist material 31 over conductive regions 220 and 230.
Fig 4j shows a further stage where a conductive material has been deposited over the structure creating regions 71 and 72. Region 71 provides a conductive pathway between conductive regions 220 and 230. Region 72 covers UV curable polymer 32.
Fig 4k shows a further stage where lift-off resist 31 is completely removed by solvent developer.
In the same process remaining UV curable polymer material 32 is removed and conductive region 72.
Fig 41 shows the full structures bringing together the structures described in figs 4a-4d and figs 4f-4k. A thin-film transistor Ti has been formed consisting of semiconductor layer 5 (not shown) below conductive layers 22 and 23, corresponding respectively to source and drain terminals, gate dielectric layer 61 (not shown) and gate conductive layer 71. Layer 71 extends beyond the transistor Ti to terminals 220 and 230, which could be a voltage rail or drain terminal of a further device. The structure shows the potential to create thin-film gates or circuits by this method.
Referring now to Fig 5 this illustrates a circuit and processes to fabricate such a circuit in methods embodying the invention. Fig 5a shows an imprint tool 400 with features of different heights 401, 402 and 403. Fig 5b shows a top-view of the same imprint tool 400. Fig Sc shows a top-view of a substrate 1 supporting pre-patterned semiconductive and conductive regions 5 and 2 (5 is not shown), which will form part of two discrete electronic devices Ti and T2. Fig 5d shows a side-view of substrate 1 supporting regions of semiconductive material 5 and conductive material 2. Fig Se shows a stage in the process where a resist stack 3 has been deposited onto substrate 1. Resist stack 3 consists of lift-off resist covering 31 and UV curable polymer 32. Resist stack 3 has been patterned by urging imprint tool 400, exposing to UV light and removing imprint tool 400 to create different height features relating to 401, 402 and 403. In the section of substrate 1 shown in Fig Se a window 93 has been created after removal of residual resist stack 3 from imprint features (matching height 402 on imprint tool 400) so as to expose the top surface of conductive region 2.
Referring now to Fig Sf this shows a different section of the substrate 1 after imprinting with imprint tool 400 and removal of residual resist stack 3. The window 91 shown in this section of substrate 1 does not contain any conductive material 2 or semiconductive material 5. Resist stack 3 has been removed from window 91 during the process so as to expose the top surface of substrate 1. Window 92 has been additionally formed over 12 from imprint features height 401 and 402, followed by removal of residual resist stack 3 from within the trenches formed by the imprint tool 400. This leaves raised features 35 consisting of lift-off resist covering 31 and UV curable polymer 32. Window 93 has been formed over Ti from imprint features height 402.
Fig 5g shows a top-view of substrate 1 with a covering of resist stack 3 (only UV curable resist 32 is shown). Window 9 covers the entire area over Ti and T2, in which the imprint tool has been applied. Window 91 covers the area between Ti and 12. Window 92 covers the area of Ti, containing raised features 35 and exposed areas of conductive material 2.
Fig 5h shows a further stage in the process where the exposed area of conductive material 2 within window 93 has been removed, so as to reveal the top-surface of semiconductive material 5.
Fig Si shows a further stage in the process where the exposed area of conductive material 2 within window 92 has been removed, so as to reveal the top-surface of semiconductive material 5.
Fig Sj shows a top-view of the removal of conductive material from windows 92 and 93.
Fig 5k shows a further stage in the process where lift-off resist material 31 has been laterally etched to create an undercut. Fig SI shows a further stage where dielectric material 6 has been deposited over the substrate, cleating device dielectric region 61 within window 93. Fig 5m shows the same process to deposit dielectric material 6 within windows 91 and 92, creating dielectric regions 62 in window 92. Fig Sn shows the top-view of the structure covering Ti and T2 with dielectric material 6.
Fig 5o shows a further stage in the process where lift-off resist material 31 has been further laterally etched (solvent process). In Fig 5p the effect of this process is shown, with the removal of lift-off resist 31 from window 92 in the same process removing regions of dielectric material 62, to leave patterned areas 22 of conductive material 2. Fig Sq shows a top-view of the substrate after conductive regions 22 have been exposed.
Fig Sr shows a further stage in the process where a layer of conductive material 7 has been deposited onto the substrate, creating device conductive region 71 within window 93. In Fig 5s the same process has provided a conductive region 72 which connects to conductive region 22.
Fig 5t shows a top-view of the configuration after deposition of conductive layer 7.
Fig Su shows a further stage in the process where resist stack 3 has been removed by solvent exposure of lift-off resist 31. In the same process regions of dielectric material 6 and conductive material 7 have been removed so as to leave device Ti. In Fig 5v the structure after removal of resist stack 3 is shown. Device T2 has been completed in window 92. The conductive layer 7 connects device T2 to Ti (the pathway was not previously shown as resist stack 3 was in front of this connection on the side-view). Fig 5w shows the final top-view of the connection between devices Ti and T2.
Referring now to Fig 6 this illustrates a circuit and processes to fabricate such a circuit in methods embodying the invention. Fig 6a shows an imprint tool 400 with features of different heights 401, 402 and 403. Fig 6b shows a top-view of the same imprint tool 400. Fig 6c shows a top-view of a substrate 1 supporting pre-patterned semiconductive and conductive regions 5 and 2 (5 is not shown), which will form part of two discrete electronic devices Ti and T2.
Fig 6d shows a side-view of substrate 1 supporting regions of semiconductive material 5 and conductive material 2. Fig 6e shows a stage in the process where a resist stack 3 has been deposited onto substrate 1. Resist stack 3 consists of lift-off resist covering 31 and UV curable polymer 32. Resist stack 3 has been patterned by urging imprint tool 400, exposing to UV light and removing imprint tool 400 to create different height features relating to 401, 402 and 403. In the section of substrate 1 shown in Fig 6e a window 93 has been created after removal of residual resist stack 3 from imprint features (matching height 402 on imprint tool 400) so as to expose the top surface of conductive region 2.
Referring now to Fig 6f this shows a different section of the substrate 1 after imprinting with imprint tool 400 and removal of residual resist stack 3. The window 91 shown in this section of substrate 1 does not contain any conductive material 2 or semiconductive material 5. Resist stack 3 has been mostly removed from window 91 during the process so as to expose the top surface of substrate 1. Window 92 has been additionally formed over T2 from imprint features height 402, followed by removal of residual resist stack 3 from within the trenches formed by the imprint tool 400. Window 93 has been formed over Ti from imprint features height 402.
Fig 6g shows a top-view of substrate 1 with a covering of resist stack 3. Window 9 covers the entire area over Ti and 12, in which the imprint tool has been applied. Window 91 covers the area between Ti and T2. Window 92 covers the area of Ti where the top-surface of lift-off resist layer3i has been exposed.
Fig 6h shows a further stage in the process where the exposed area of conductive material 2 within window 93 has been removed, so as to reveal the top-surface of semiconductive material 5. Fig 6i shows the same further stage in the process as Fig 6h which has no apparent effect in this section of the substrate 1. Fig 6] shows a top-view of the removal of conductive material from window 93.
Fig 6k shows a further stage in the process where lift-off resist material 31 has been laterally etched to create an undercut. Fig 61 shows a further stage where dielectric material 6 has been deposited over the substrate, creating device dielectric region 61 within window 93. Fig 6m shows the same process to deposit dielectric material 6 within window 91. In window 92, however, the properties of lift-off resist material 31 are such as to completely prevent deposition of layer 6 within this window. Fig 6n shows the top-view of the structure covering 11 and T2 with dielectric material 6 covering the entire substrate except for window 92.
Fig So shows a further stage in the process where lift-off resist material 31 has been further laterally etched (solvent process). In Fig 6p the effect of this process is shown, with the removal of lift-off resist 31 from window 92 exposing conductive material 2 and creating conductive region 22. Fig 21q shows a top-view of the substrate after conductive regions 22 have been exposed.
Fig 6r shows a further stage in the process where a layer of conductive material 7 has been deposited onto the substrate, creating device conductive region 71 within window 93. In Fig 6s the same process has provided a conductive region 72 which connects to conductive region 22.
Fig 6t shows a top-view of the configuration after deposition of conductive layer 7.
Fig 6u shows a further stage in the process where resist stack 3 has been removed by solvent exposure of lift-off resist 31. In the same process regions of dielectric material 6 and conductive material 7 have been removed so as to leave device Ti. In Fig 6v the structure after removal of resist stack 3 is shown. Device T2 has been completed in window 92. The conductive layer 7 connects device T2 to Ti (the pathway was not previously shown as resist stack 3 was in front of this connection on the side-view). Fig 6w shows the final top-view of the connection between devices Ti and T2.
Referring now to fig. 7, this shows part of another method embodying the invention in which an electrical connection is made between the gate terminal 71 of a transistor manufactured using an embodiment of the invention, and another portion of conductive material 24 supported by the substrate. It will be appreciated that this portion 24 of conductive material may be a terminal of another device formed on the substrate, it may be a conductive pad for making further electrical connections, it may be a ground rail, supply voltage rail, or any other conductive pad or track for incorporation in an electronic device or circuit. Also, although the portion 24 in this example is formed directly on the substrate, in alternative embodiments it may be supported by an underlying layer or layers, e.g. of semiconductive material, of dielectric material, or a multilayer structure comprising a plurality of different layer materials. Also, the portion 24 in certain embodiments may itself be a portion of semiconductive material, to which electrical connection is required. Referring to Fig. 8A, a thin-film transistor embodying the invention has been formed, comprising source and drain terminals 22, 23 connected by a semiconductive channel or layer 51, with a gate terminal 71 arranged over the semiconductive layer 51 and separated from it by a gate dielectric layer 61. In this embodiment, the gate dielectric overlaps surfaces (the upper surfaces in the orientation of the figure) of the source and drain regions 22 and 23, and the gate covers a portion, but not all, of the upper surface of the gate dielectric 61. A covering of dielectric material 8 has been formed over the transistor structure and the further conductive region 24, this dielectric covering 8 also having a depression 40 formed in its upper surface. In this example, the depression 40 does not have uniform depth. Instead, it comprises a first depression portion 41 having a first depth and arranged over the gate terminal 71, a second depression portion 42 having a second, deeper depth, and arranged over the further conductive portion 24. The depression 40 also comprises a third depression portion 43, having a shallower depth, and connecting the first and second depression portions 41, 42. As will be appreciated, the depression 40 in Fig. 8A may be produced using a variety of techniques, for example by imprinting using a multi-level imprint tool. After producing the structure shown in Fig. 8A, a suitable technique is used, e.g. etching, to remove dielectric material so as to develop the first depression portion 41 into a first hole 91 which extends through the dielectric layer 8 to the gate 71. The second depression 42 has been developed into a second hole 92 which extends through the layer 8 to the upper surface of the further conductive portion 24. The third depression portion 43 has also been developed so that it provides a channel, groove, recess or other such feature 93 laterally (i.e. generally in a direction parallel to the substrate surface 1) connecting the first hole 91 to the second hole 92. Next, the holes 91 and 92 and the channel 93 are tilled with electrically conductive material so as to form an interconnect 94 connecting the gate 71 to the further conductive region 24.
Referring now to Fig. 8, this shows a regular array of thin-film transistors which have been fabricated in a method embodying the invention. Figure 8A shows a top-view of an array of thin-film transistors comprising a trilayer of semiconductor, dielectric and conductive material 71 (only layer 71 is shown), with individual source areas 22 and shared ground areas 23. It will be appreciated that a layer of semiconductor material lies under all of the conductive portions/terminals shown on the figure (i.e. semiconductor material lies directly beneath source and drain terminals 22 and 23, and extends between the source and drain terminals to provide channels, each channel being located under a respective gate terminal 71, isolated from the gate 71 by a respective gate dielectric 61 (not shown)). Fig 8B shows a further step where a resist layer 31 has been deposited onto the substrate (not shown). Fig 8C shows a further step where areas of resist layer 31 has been removed creating windows 9, such as by imprinting, laser-ablation, so as to expose areas of layer 71, substrate and source terminals 22. Fig 8D shows a further step in which two of the exposed areas 9 have been filled-in with conductive material 100, e.g. by jet-printing of conductive ink, so as to select a particular circuit. Thus, a plurality of windows have been formed through the layer of resist material 31 which previously encapsulated the plurality of transistors/switching devices, and selected windows are then filled, at least partly (in other words a deposition of conductive material is made inside the windows) with conductive material to form selected interconnections between the devices. This can be regarded as programming or configuring an electronic circuit by forming selective interconnections between pre-formed transistors.
Referring now to Fig 9, this shows the same regular array of thin-film transistors as in Fig 8A which are being programmed. Fig 9A has a layer of resist material 31 deposited onto the transistor array with via-holes 9 positioned over each terminal position in this case fabricated by laser-drilling. Fig 9B shows a further step where the via-holes 9 have been filled with conductive material 1000 such as silver using inkjet printing. Fig 9C shows a final step where certain (i.e. selected) vias have been connected together with conductive material, e.g. by jet-printing of conductive ink, to form selected interconnects 100 and so program or select a particular circuit.
It will be appreciated that an alternative to the step of filling-in each via-hole described in Fig 9B is to use digital printing with conductive ink to in-fill and interconnect particular via-holes to select a desired functional circuit. The resist material 31 in this instance acts as a dielectric material for the interconnections.
It will be appreciated that the above-described methods may be used to manufacture one or a plurality of transistors on a common substrate, and contacts to and interconnections between these transistors may be formed using suitable techniques, for example by imprinting or photolithographic techniques employing a third mask for example.
Throughout the description and claims of this specification, the words comprise" and "contain' and variations of the words, for example "comprising" and "comprises", means "including but not limited to", and is not intended to (and does not) exclude other moieties, additives, components, integers or steps.
Throughout the description and claims of this specification, the singular encompasses the plural unless the context otherwise requires. In particular, where the indefinite article is used, the specification is to be understood as contemplating plurality as well as singularity, unless the context requires otherwise.
Features, integers, characteristics, compounds, chemical moieties or groups described in conjunction with a particular aspect, embodiment or example of the invention are to be understood to be applicable to any other aspect, embodiment or example described herein unless incompatible therewith.
It will be also be appreciated that, throughout the description and claims of this specification, language in the general form of "X for Y" (where Y is some action, activity or step and X is some means for carrying out that action, activity or step) encompasses means X adapted or arranged specifically, but not exclusively, to do Y.
Claims (1)
- <claim-text>CLAIMS1. A method of manufacturing a transistor, the method comprising: providing a substrate, a region of semiconductive material supported by the substrate, and a region of electrically conductive material supported by the region of semiconductive material; forming at least one layer of resist material over said regions to form a covering of resist material over said regions; forming a depression in a surface of the covering of resist material, said depression extending over a first portion of said region of conductive material, said first portion separating a second portion of the conductive region from a third portion of the conductive region; removing resist material located under said depression so as to form a window, through said covering, exposing said first portion of the electrically conductive region; removing said first portion to expose a connecting portion of the region of semiconductive material, said connecting poition connecting the second portion to the third portion of the conductive region; depositing dielectric material at least inside the window to form a layer of dielectric material over the exposed portion of the region of semiconductive material; depositing electrically conductive material to form a layer of electrically conductive material over said layer of dielectric material, the layer of dielectric material electrically isolating the layer of electrically conductive material from the second and third portions of the conductive region; and removing resist material at least from around said window so as to expose the second and third portions, whereby said second and third portions provide a source terminal and a drain terminal respectively and the layer of electrically conductive material provides a gate terminal to which a potential may be applied to control a conductivity of the connecting portion of the region of semiconductive material connecting the second and third portions.</claim-text> <claim-text>2. A method in accordance with claim 1, wherein said forming at least one layer comprises forming a first layer of a first resist material over said regions, and forming a second layer of a second resist material over the first layer.</claim-text> <claim-text>3. A method in accordance with claim 2, wherein said first resist material is a lift-off resist material.</claim-text> <claim-text>4. A method in accordance with claim 2 or claim 3, wherein said second resist material is an imprintable resist material.</claim-text> <claim-text>5. A method in accordance with any preceding claim, wherein forming said depression comprises forming said depression by imprinting using an imprinting tool.</claim-text> <claim-text>6. A method in accordance with claim 5, as dependent upon claim 4, wherein said surface is a surface of the second layer of resist material.</claim-text> <claim-text>7. A method in accordance with claim 6, wherein forming said depression is performed at the same time as forming the second layer.</claim-text> <claim-text>8. A method in accordance with claim 6, wherein forming said depression is performed after forming the second layer.</claim-text> <claim-text>9. A method in accordance with any preceding claim! further comprising undercutting the covering of resist material around the window before said depositing of dielectric material so as to expose a part of an upper surface of the second portion adjacent the connecting portion and expose a part of an upper surface of the third portion adjacent the connecting portion.</claim-text> <claim-text>10. A method in accordance with claim 9, wherein said depositing of dielectric material is arranged such that the layer of dielectric material at least partly covers said parts.</claim-text> <claim-text>11. A method in accordance with any one of claims 9 to 10, as depending from claim 2, wherein said undercutting comprises forming at least one undercut in the first layer.</claim-text> <claim-text>12. A method in accordance with any one of claims 9 to 11, further comprising removing resist material to widen said window after said undercutting but before said depositing of dielectric material.</claim-text> <claim-text>13. A method in accordance with any one of claims 9 to 12, further comprising removing resist material to widen said window at the same time as said undercutting.</claim-text> <claim-text>14. A transistor manufactured using a method in accordance with any one of claims 1 to 13.</claim-text> <claim-text>15. An electronic circuit or logic gate comprising at least one transistor in accordance with claim 14.</claim-text> <claim-text>16. An electrical circuit manufactured using a method in accordance with any one of claims ito 13.</claim-text> <claim-text>17. A programmable transistor array comprising a plurality of transistors! each in accordance with claim 14, and having been formed on a common substrate.</claim-text> <claim-text>18. A programmable logic array comprising a plurality of logic gates, each logic gate comprising at least one respective transistor in accordance with claim 14, and wherein the respective transistors are formed on a common substrate.</claim-text> <claim-text>19. An array in accordance with claim 17 or claim 18, further comprising a covering of dielectric material formed over the plurality of transistors formed on the common substrate.</claim-text> <claim-text>20. An array in accordance with claim 19, further comprising a plurality of windows formed in the covering of dielectric material to expose a plurality of terminals of the plurality of transistors so as to enable selected interconnections to be made between the exposed terminals.</claim-text> <claim-text>21. An electronic circuit comprising an array in accordance with any one of claims 17 to 20, and a plurality of electrical tracks arranged to provide interconnections between selected transistor terminals.</claim-text> <claim-text>22. A method of forming an electronic circuit, the method comprising manufacturing an array of a plurality of transistors on a common substrate using a method in accordance with any one of claims 1 to 13, forming a covering of dielectric material over the array of transistors, forming a plurality of windows in the covering of dielectric material, each window exposing at least a portion of a terminal of a respective transistor, and selectively forming interconnections between said exposed portions of terminals.</claim-text> <claim-text>23. A method in accordance with claim 22, wherein said selectively forming interconnections comprises printing conductive material.24. An electronic circuit manufactured using a method in accordance with claim 23.</claim-text> <claim-text>24. A transistor comprising: a substrate; a region of semiconductive material supported by the substrate; a source terminal and a drain terminal, each said terminal being supported by the region of semiconductive material, and the source and drain terminal being connected by a connecting portion of the region of semiconductive material; a layer of dielectric material deposited so as to cover at least a portion of said connecting portion; and a layer of electrically conductive material deposited so as to cover at least a portion of the layer of dielectric material, the layer of dielectric material electrically isolating the layer of conductive material from the source and drain terminals, and the layer of electrically conductive material providing a gate terminal to which a potential may be applied to control a conductivity of the connecting portion of the region of semiconductive material connecting the source and drain terminals.</claim-text> <claim-text>25. A method, transistor, logic gate, array or circuit substantially as hereinbefore described with reference to the accompanying drawings.</claim-text>
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1110834.7A GB2492532B (en) | 2011-06-27 | 2011-06-27 | Transistor and its method of manufacture |
| GB1505215.2A GB2522565B (en) | 2011-06-27 | 2012-05-01 | Transistor and its method of manufacture |
| GB1207599.0A GB2492442B (en) | 2011-06-27 | 2012-05-01 | Transistor and its method of manufacture |
| EP12730616.5A EP2724373B8 (en) | 2011-06-27 | 2012-06-22 | Transistor and its method of manufacture |
| US14/129,630 US9425193B2 (en) | 2011-06-27 | 2012-06-22 | Methods of manufacturing transistors including forming a depression in a surface of a covering of resist material |
| PCT/GB2012/051465 WO2013001282A2 (en) | 2011-06-27 | 2012-06-22 | Transistor and its method of manufacture |
| US15/236,057 US10672765B2 (en) | 2011-06-27 | 2016-08-12 | Methods of manufacturing transistors including forming a depression in a surface of a covering of resist material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1110834.7A GB2492532B (en) | 2011-06-27 | 2011-06-27 | Transistor and its method of manufacture |
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| Publication Number | Publication Date |
|---|---|
| GB201110834D0 GB201110834D0 (en) | 2011-08-10 |
| GB2492532A true GB2492532A (en) | 2013-01-09 |
| GB2492532B GB2492532B (en) | 2015-06-03 |
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| GB1110834.7A Active GB2492532B (en) | 2011-06-27 | 2011-06-27 | Transistor and its method of manufacture |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9996173B2 (en) | 2013-02-12 | 2018-06-12 | Illinois Tool Works, Inc. | Front panel overlay incorporating a logic circuit |
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| GB2421115A (en) * | 2004-12-09 | 2006-06-14 | Seiko Epson Corp | A self-aligning patterning method for use in the manufacture of a plurality of thin film transistors |
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| JPS60167372A (en) * | 1984-02-09 | 1985-08-30 | Seiko Epson Corp | Manufacture of thin-film transistor |
| EP0684643A1 (en) * | 1994-05-24 | 1995-11-29 | Koninklijke Philips Electronics N.V. | Method of manufacturing semiconductor devices in an active layer on an support substrate |
| WO1996036072A2 (en) * | 1995-05-10 | 1996-11-14 | Philips Electronics N.V. | Method of manufacturing a device, by which method a substrate with semiconductor element and conductor tracks is glued to a support body with metallization |
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| Publication number | Publication date |
|---|---|
| GB201110834D0 (en) | 2011-08-10 |
| GB2492532B (en) | 2015-06-03 |
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