GB2366078A - Semiconductor device retaining a resist layer as a buffer layer - Google Patents
Semiconductor device retaining a resist layer as a buffer layer Download PDFInfo
- Publication number
- GB2366078A GB2366078A GB0105919A GB0105919A GB2366078A GB 2366078 A GB2366078 A GB 2366078A GB 0105919 A GB0105919 A GB 0105919A GB 0105919 A GB0105919 A GB 0105919A GB 2366078 A GB2366078 A GB 2366078A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- resist
- semiconductor device
- buffer layer
- buffer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 53
- 238000002161 passivation Methods 0.000 claims abstract description 39
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 10
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 15
- 239000002184 metal Substances 0.000 abstract description 15
- 150000001875 compounds Chemical class 0.000 abstract description 8
- 238000004806 packaging method and process Methods 0.000 abstract description 6
- 238000005382 thermal cycling Methods 0.000 abstract description 5
- 150000002500 ions Chemical class 0.000 abstract description 4
- 230000005855 radiation Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 158
- 230000008569 process Effects 0.000 description 16
- 238000001459 lithography Methods 0.000 description 10
- 150000004767 nitrides Chemical class 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 238000009472 formulation Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229940125810 compound 20 Drugs 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- JAXFJECJQZDFJS-XHEPKHHKSA-N gtpl8555 Chemical compound OC(=O)C[C@H](N)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](C(C)C)C(=O)N1CCC[C@@H]1C(=O)N[C@H](B1O[C@@]2(C)[C@H]3C[C@H](C3(C)C)C[C@H]2O1)CCC1=CC=C(F)C=C1 JAXFJECJQZDFJS-XHEPKHHKSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/564—Details not otherwise provided for, e.g. protection against moisture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3171—Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US52158600A | 2000-03-09 | 2000-03-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
GB0105919D0 GB0105919D0 (en) | 2001-04-25 |
GB2366078A true GB2366078A (en) | 2002-02-27 |
Family
ID=24077294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0105919A Withdrawn GB2366078A (en) | 2000-03-09 | 2001-03-09 | Semiconductor device retaining a resist layer as a buffer layer |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2001284499A (ja) |
KR (1) | KR20010088439A (ja) |
GB (1) | GB2366078A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8844826B2 (en) | 2006-07-10 | 2014-09-30 | Nxp B.V. | Integrated circuit transponder, method of producing an integrated circuit and method of producing a transponder |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4328262A (en) * | 1979-07-31 | 1982-05-04 | Fujitsu Limited | Method of manufacturing semiconductor devices having photoresist film as a permanent layer |
EP0122631A2 (en) * | 1983-04-15 | 1984-10-24 | Hitachi, Ltd. | Electronic device having a multi-layer wiring structure |
EP0251347A1 (en) * | 1986-04-23 | 1988-01-07 | Koninklijke Philips Electronics N.V. | Method of covering a device with a first layer of silicon nitride and with a second layer of a polyimide, and device covered by means of the method |
EP0275588A1 (en) * | 1986-12-19 | 1988-07-27 | Koninklijke Philips Electronics N.V. | Method of fabricating a semiconductor device with reduced packaging stress |
US5013689A (en) * | 1985-08-14 | 1991-05-07 | Mitsubishi Denki Kabushiki Kaisha | Method of forming a passivation film |
US5286679A (en) * | 1993-03-18 | 1994-02-15 | Micron Technology, Inc. | Method for attaching a semiconductor die to a leadframe using a patterned adhesive layer |
-
2001
- 2001-03-02 JP JP2001058125A patent/JP2001284499A/ja active Pending
- 2001-03-07 KR KR1020010011699A patent/KR20010088439A/ko not_active Application Discontinuation
- 2001-03-09 GB GB0105919A patent/GB2366078A/en not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4328262A (en) * | 1979-07-31 | 1982-05-04 | Fujitsu Limited | Method of manufacturing semiconductor devices having photoresist film as a permanent layer |
EP0122631A2 (en) * | 1983-04-15 | 1984-10-24 | Hitachi, Ltd. | Electronic device having a multi-layer wiring structure |
US5013689A (en) * | 1985-08-14 | 1991-05-07 | Mitsubishi Denki Kabushiki Kaisha | Method of forming a passivation film |
EP0251347A1 (en) * | 1986-04-23 | 1988-01-07 | Koninklijke Philips Electronics N.V. | Method of covering a device with a first layer of silicon nitride and with a second layer of a polyimide, and device covered by means of the method |
EP0275588A1 (en) * | 1986-12-19 | 1988-07-27 | Koninklijke Philips Electronics N.V. | Method of fabricating a semiconductor device with reduced packaging stress |
US5286679A (en) * | 1993-03-18 | 1994-02-15 | Micron Technology, Inc. | Method for attaching a semiconductor die to a leadframe using a patterned adhesive layer |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8844826B2 (en) | 2006-07-10 | 2014-09-30 | Nxp B.V. | Integrated circuit transponder, method of producing an integrated circuit and method of producing a transponder |
Also Published As
Publication number | Publication date |
---|---|
KR20010088439A (ko) | 2001-09-26 |
GB0105919D0 (en) | 2001-04-25 |
JP2001284499A (ja) | 2001-10-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |