GB2327810B - Manufacturing integrated circuit devices with different gate oxide thicknesses - Google Patents
Manufacturing integrated circuit devices with different gate oxide thicknessesInfo
- Publication number
- GB2327810B GB2327810B GB9715880A GB9715880A GB2327810B GB 2327810 B GB2327810 B GB 2327810B GB 9715880 A GB9715880 A GB 9715880A GB 9715880 A GB9715880 A GB 9715880A GB 2327810 B GB2327810 B GB 2327810B
- Authority
- GB
- United Kingdom
- Prior art keywords
- integrated circuit
- gate oxide
- circuit devices
- different gate
- manufacturing integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/09—Manufacture or treatment with simultaneous manufacture of the peripheral circuit region and memory cells
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9715880A GB2327810B (en) | 1997-02-07 | 1997-07-28 | Manufacturing integrated circuit devices with different gate oxide thicknesses |
JP9215218A JPH1168052A (ja) | 1997-07-28 | 1997-08-08 | 集積回路の製造方法 |
DE19735826A DE19735826A1 (de) | 1997-02-07 | 1997-08-18 | Vorgabe einer Dicke von Gateoxiden durch Implantieren von Stickstoff für integrierte Schaltungen |
FR9710703A FR2767965B1 (fr) | 1997-02-07 | 1997-08-27 | Procede de fabrication d'un dispositif a circuit integre ayant differentes epaisseurs d'oxyde de grille |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2521897A JPH10222885A (ja) | 1997-02-07 | 1997-02-07 | 情報記録再生装置 |
GB9715880A GB2327810B (en) | 1997-02-07 | 1997-07-28 | Manufacturing integrated circuit devices with different gate oxide thicknesses |
DE19735826A DE19735826A1 (de) | 1997-02-07 | 1997-08-18 | Vorgabe einer Dicke von Gateoxiden durch Implantieren von Stickstoff für integrierte Schaltungen |
FR9710703A FR2767965B1 (fr) | 1997-02-07 | 1997-08-27 | Procede de fabrication d'un dispositif a circuit integre ayant differentes epaisseurs d'oxyde de grille |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9715880D0 GB9715880D0 (en) | 1997-10-01 |
GB2327810A GB2327810A (en) | 1999-02-03 |
GB2327810B true GB2327810B (en) | 1999-06-09 |
Family
ID=27438665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9715880A Expired - Fee Related GB2327810B (en) | 1997-02-07 | 1997-07-28 | Manufacturing integrated circuit devices with different gate oxide thicknesses |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE19735826A1 (de) |
FR (1) | FR2767965B1 (de) |
GB (1) | GB2327810B (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6150670A (en) * | 1999-11-30 | 2000-11-21 | International Business Machines Corporation | Process for fabricating a uniform gate oxide of a vertical transistor |
US6362040B1 (en) * | 2000-02-09 | 2002-03-26 | Infineon Technologies Ag | Reduction of orientation dependent oxidation for vertical sidewalls of semiconductor substrates |
DE10052680C2 (de) * | 2000-10-24 | 2002-10-24 | Advanced Micro Devices Inc | Verfahren zum Einstellen einer Form einer auf einem Substrat gebildeten Oxidschicht |
DE10123594B4 (de) * | 2001-05-15 | 2006-04-20 | Infineon Technologies Ag | Integrierte Halbleiterschaltung mit unterschiedlich häufig geschalteten Transistoren |
DE10222764B4 (de) * | 2002-05-15 | 2011-06-01 | Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik | Halbleitervaraktor und damit aufgebauter Oszillator |
DE102004049246A1 (de) * | 2004-10-01 | 2006-04-06 | Atmel Germany Gmbh | Lateraler DMOS-Transistor und Verfahren zu seiner Herstellung |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63205944A (ja) * | 1987-02-23 | 1988-08-25 | Matsushita Electronics Corp | Mos集積回路の製造方法 |
EP0412263A2 (de) * | 1989-08-10 | 1991-02-13 | Kabushiki Kaisha Toshiba | Verfahren zum Herstellen eines kontaktloches in einem integrierten Halbleiterstromkreis |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5330920A (en) * | 1993-06-15 | 1994-07-19 | Digital Equipment Corporation | Method of controlling gate oxide thickness in the fabrication of semiconductor devices |
KR0136935B1 (ko) * | 1994-04-21 | 1998-04-24 | 문정환 | 메모리 소자의 제조방법 |
US5480828A (en) * | 1994-09-30 | 1996-01-02 | Taiwan Semiconductor Manufacturing Corp. Ltd. | Differential gate oxide process by depressing or enhancing oxidation rate for mixed 3/5 V CMOS process |
-
1997
- 1997-07-28 GB GB9715880A patent/GB2327810B/en not_active Expired - Fee Related
- 1997-08-18 DE DE19735826A patent/DE19735826A1/de not_active Ceased
- 1997-08-27 FR FR9710703A patent/FR2767965B1/fr not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63205944A (ja) * | 1987-02-23 | 1988-08-25 | Matsushita Electronics Corp | Mos集積回路の製造方法 |
EP0412263A2 (de) * | 1989-08-10 | 1991-02-13 | Kabushiki Kaisha Toshiba | Verfahren zum Herstellen eines kontaktloches in einem integrierten Halbleiterstromkreis |
Non-Patent Citations (1)
Title |
---|
Patent Abstracts of Japan, Vol 12, No 493, [E-697] & JP 63 205 944 A * |
Also Published As
Publication number | Publication date |
---|---|
GB2327810A (en) | 1999-02-03 |
DE19735826A1 (de) | 1999-03-04 |
GB9715880D0 (en) | 1997-10-01 |
FR2767965B1 (fr) | 2000-01-07 |
FR2767965A1 (fr) | 1999-03-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20040728 |