GB2141131B - Method of forming resist pattern - Google Patents

Method of forming resist pattern

Info

Publication number
GB2141131B
GB2141131B GB8411412A GB8411412A GB2141131B GB 2141131 B GB2141131 B GB 2141131B GB 8411412 A GB8411412 A GB 8411412A GB 8411412 A GB8411412 A GB 8411412A GB 2141131 B GB2141131 B GB 2141131B
Authority
GB
United Kingdom
Prior art keywords
resist pattern
forming resist
forming
pattern
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8411412A
Other languages
English (en)
Other versions
GB2141131A (en
GB8411412D0 (en
Inventor
Toshihiko Yasui
Tetsuo Matsumoto
Akihiko Akaike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Publication of GB8411412D0 publication Critical patent/GB8411412D0/en
Publication of GB2141131A publication Critical patent/GB2141131A/en
Application granted granted Critical
Publication of GB2141131B publication Critical patent/GB2141131B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
GB8411412A 1983-05-06 1984-05-03 Method of forming resist pattern Expired GB2141131B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58078241A JPS59204036A (ja) 1983-05-06 1983-05-06 レジストパタ−ンの形成法

Publications (3)

Publication Number Publication Date
GB8411412D0 GB8411412D0 (en) 1984-06-06
GB2141131A GB2141131A (en) 1984-12-12
GB2141131B true GB2141131B (en) 1987-02-25

Family

ID=13656523

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8411412A Expired GB2141131B (en) 1983-05-06 1984-05-03 Method of forming resist pattern

Country Status (3)

Country Link
US (1) US4536468A (enExample)
JP (1) JPS59204036A (enExample)
GB (1) GB2141131B (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
US4942000A (en) * 1986-07-30 1990-07-17 Penoyer John A Contactless knurling process for winding of high modulus thermoplastic films
US4952482A (en) * 1987-08-03 1990-08-28 Hoechst Calanese Corporation Method of imaging oxygen resistant radiation polymerizable composition and element containing a photopolymer composition
US5026626A (en) * 1987-08-03 1991-06-25 Barton Oliver A Oxygen resistant radiation-polymerizable composition and element containing a photopolymer composition
US4943513A (en) * 1988-10-07 1990-07-24 Morton Thiokol, Inc. Photoimageable composition with reduced cold flow due to salt-bridging by metal ions and dry film formed therefrom
IT1230156B (it) * 1989-06-16 1991-10-14 Oece Ind Chimiche Spa Prodotti vernicianti fotopolimerizzabili.
US5066331A (en) * 1989-12-21 1991-11-19 Westvaco Corporation Water-soluble rosin polyamide resins
GB2241915A (en) * 1990-03-17 1991-09-18 Scapa Group Plc Production of perforate structures.
JP2614676B2 (ja) * 1991-05-10 1997-05-28 化学技術振興事業団 薄膜製造方法と薄膜デバイス
US5318651A (en) * 1991-11-27 1994-06-07 Nec Corporation Method of bonding circuit boards
DE4413242A1 (de) * 1994-04-16 1995-10-19 Basf Lacke & Farben Verfahren zur Herstellung von Gegenständen mit dreidimensionaler Oberflächenstruktur und nach diesem Verfahren hergestellte Gegenstände
US5792097A (en) * 1996-09-27 1998-08-11 Becton Dickinson And Company Iontophoretic electrodes and surface active agents
JP4497633B2 (ja) * 1999-03-15 2010-07-07 キヤノン株式会社 撥液体層の形成方法及び液体吐出ヘッドの製造方法
GB9918117D0 (en) * 1999-08-03 1999-10-06 Acma Ltd Organometallic compositions and polyisocyanate compostitions containing them
CA2458167A1 (en) * 2001-08-07 2003-02-20 Sun Chemical Corporation Lithographic energy curable inks
GB0324947D0 (en) * 2003-10-25 2003-11-26 Avecia Ltd Process
JP4738013B2 (ja) * 2005-02-16 2011-08-03 富士フイルム株式会社 インクジェット記録用インク及びこれを用いた平版印刷版の作製方法
US7470500B2 (en) * 2005-07-19 2008-12-30 Az Electronic Materials Usa Corp. Organic bottom antireflective polymer compositions
US20080250977A1 (en) * 2007-04-16 2008-10-16 Andrew Mason Oxime free anti-skinning combination
US20080277522A1 (en) * 2007-05-10 2008-11-13 3M Innovative Properties Company Polymeric film winding systems and methods utilizing ink spacing
US20080277523A1 (en) * 2007-05-10 2008-11-13 3M Innovative Properties Company System and method for winding polymeric films, such as low modulus, polyolefin films
JP5489616B2 (ja) * 2009-09-28 2014-05-14 富士フイルム株式会社 インク組成物及び印刷物成型体の製造方法
US20140097002A1 (en) * 2012-10-05 2014-04-10 Tyco Electronics Amp Gmbh Electrical components and methods and systems of manufacturing electrical components
JP6323456B2 (ja) * 2013-09-11 2018-05-16 Jsr株式会社 多層レジストプロセス用無機膜形成組成物及びパターン形成方法
CN110753555A (zh) 2017-04-19 2020-02-04 得克萨斯州大学系统董事会 表达工程化抗原受体的免疫细胞
EP3486290A1 (en) 2017-11-21 2019-05-22 Allnex Belgium, S.A. Adhesion promoting compounds for apolar substrates
EP3755349A4 (en) 2018-02-21 2021-11-17 Board of Regents, The University of Texas System PROCESS FOR ACTIVATION AND EXPANSION OF NATURAL KILLER CELLS AND THEIR USES
CN114806266B (zh) * 2022-04-06 2023-09-12 佛山市西伦化工有限公司 一种抗黄变油墨专用树脂组合物及其制备方法
JP2025518568A (ja) * 2022-09-30 2025-06-17 サン ケミカル ビー．ブイ． アルミニウム添加剤を含有するｌｅｄ硬化型オフセットインキ

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3876432A (en) * 1972-09-11 1975-04-08 Sun Chemical Corp Fatty ester modified epoxy resin photopolymerizable compositions
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
US4306012A (en) * 1979-12-05 1981-12-15 Hercules Incorporated Process of radiation and heat treatment of printing medium
JPS573875A (en) * 1980-06-11 1982-01-09 Tamura Kaken Kk Photopolymerizable ink composition

Also Published As

Publication number Publication date
US4536468A (en) 1985-08-20
GB2141131A (en) 1984-12-12
JPH05427B2 (enExample) 1993-01-05
JPS59204036A (ja) 1984-11-19
GB8411412D0 (en) 1984-06-06

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19930503