GB2136213A - Method for producing a thin film resistor - Google Patents

Method for producing a thin film resistor Download PDF

Info

Publication number
GB2136213A
GB2136213A GB08400677A GB8400677A GB2136213A GB 2136213 A GB2136213 A GB 2136213A GB 08400677 A GB08400677 A GB 08400677A GB 8400677 A GB8400677 A GB 8400677A GB 2136213 A GB2136213 A GB 2136213A
Authority
GB
United Kingdom
Prior art keywords
resistance
resistor
cover layer
thin film
covered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB08400677A
Other languages
English (en)
Other versions
GB8400677D0 (en
Inventor
Hermann Birnbreier
Helmut Haas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BBC BROWN BOVERI and CIE
BBC Brown Boveri AG Germany
Original Assignee
BBC BROWN BOVERI and CIE
Brown Boveri und Cie AG Germany
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BBC BROWN BOVERI and CIE, Brown Boveri und Cie AG Germany filed Critical BBC BROWN BOVERI and CIE
Publication of GB8400677D0 publication Critical patent/GB8400677D0/en
Publication of GB2136213A publication Critical patent/GB2136213A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H01C17/08—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/02—Apparatus or processes specially adapted for manufacturing resistors adapted for manufacturing resistors with envelope or housing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/26—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by converting resistive material
    • H01C17/265—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by converting resistive material by chemical or thermal treatment, e.g. oxydation, reduction, annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
GB08400677A 1983-01-20 1984-01-11 Method for producing a thin film resistor Withdrawn GB2136213A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833301665 DE3301665A1 (de) 1983-01-20 1983-01-20 Verfahren zur herstellung eines duennfilmwiderstandes

Publications (2)

Publication Number Publication Date
GB8400677D0 GB8400677D0 (en) 1984-02-15
GB2136213A true GB2136213A (en) 1984-09-12

Family

ID=6188649

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08400677A Withdrawn GB2136213A (en) 1983-01-20 1984-01-11 Method for producing a thin film resistor

Country Status (5)

Country Link
US (1) US4530852A (enExample)
JP (1) JPS59138310A (enExample)
DE (1) DE3301665A1 (enExample)
FR (1) FR2539912A1 (enExample)
GB (1) GB2136213A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62159453A (ja) * 1986-01-07 1987-07-15 Nec Corp 抵抗体の製造方法
EP0704889A3 (de) * 1994-09-29 1998-10-21 Siemens Aktiengesellschaft Leistungshalbleiterbauelement mit monolithisch integriertem Messwiderstand und Verfahren zu dessen Herstellung
DE19945914C1 (de) * 1999-09-24 2001-08-30 Siemens Ag Verfahren zur Erzeugung von präzisen Lötflächen auf einem Schaltungsträger, insbesondere Dünnfilm-Substrat

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1249317A (en) * 1968-11-19 1971-10-13 Mullard Ltd Semiconductor devices

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2610606A (en) * 1946-09-26 1952-09-16 Polytechnic Inst Brooklyn Apparatus for the formation of metallic films by thermal evaporation
DE1089861B (de) * 1957-11-12 1960-09-29 Int Resistance Co Metallschichtwiderstand mit aufgedampfter Widerstandsschicht aus einer Nickel-Chrom-Legierung
US4021277A (en) * 1972-12-07 1977-05-03 Sprague Electric Company Method of forming thin film resistor
DE2356419C3 (de) * 1973-11-12 1979-01-25 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von Widerstandsschichten aus Aluminium-Tantal-Legierungen durch Kathodenzerstäubung
JPS5123693A (en) * 1974-08-21 1976-02-25 Tatsuta Densen Kk Teikoyokinzokuhimakuno netsushori
US4019168A (en) * 1975-08-21 1977-04-19 Airco, Inc. Bilayer thin film resistor and method for manufacture
JPS52132397A (en) * 1976-04-30 1977-11-07 Nippon Chemical Ind Thinnfilm resistor whose resistive temperature coefficient has been improved
JPS52135095A (en) * 1976-05-06 1977-11-11 Nippon Chemical Ind Thinnfilm resistor whose resistive temperature coeficent has been made small
FR2351478A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Procede de realisation de resistances en couches minces passivees et resistances obtenues par ce procede
US4194174A (en) * 1978-06-19 1980-03-18 Microwave Semiconductor Corp. Method for fabricating ballasted finger electrode
DE2939236A1 (de) * 1979-09-27 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung duenner widerstandsschichten hoher langzeitstabilitaet

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1249317A (en) * 1968-11-19 1971-10-13 Mullard Ltd Semiconductor devices

Also Published As

Publication number Publication date
JPS59138310A (ja) 1984-08-08
GB8400677D0 (en) 1984-02-15
DE3301665A1 (de) 1984-07-26
FR2539912A1 (fr) 1984-07-27
US4530852A (en) 1985-07-23
FR2539912B3 (enExample) 1985-05-17

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)