GB1517796A - Method for treating resist films to form relief patterns - Google Patents
Method for treating resist films to form relief patternsInfo
- Publication number
- GB1517796A GB1517796A GB37060/75A GB3706075A GB1517796A GB 1517796 A GB1517796 A GB 1517796A GB 37060/75 A GB37060/75 A GB 37060/75A GB 3706075 A GB3706075 A GB 3706075A GB 1517796 A GB1517796 A GB 1517796A
- Authority
- GB
- United Kingdom
- Prior art keywords
- resist
- sept
- resist films
- water
- relief patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- RVUFIAZZLHJNJS-UHFFFAOYSA-N 5-[4-benzoyl-3-(6-diazonio-5-oxidonaphthalen-1-yl)sulfonyloxyphenoxy]sulfonyl-2-diazonionaphthalen-1-olate Chemical compound C1=CC=C2C([O-])=C([N+]#N)C=CC2=C1S(=O)(=O)OC(C=C1OS(=O)(=O)C=2C3=CC=C(C([O-])=C3C=CC=2)[N+]#N)=CC=C1C(=O)C1=CC=CC=C1 RVUFIAZZLHJNJS-UHFFFAOYSA-N 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- -1 naphthoquinone (1,2-) diazide sulphonic acid ester Chemical class 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/506,445 US3961100A (en) | 1974-09-16 | 1974-09-16 | Method for developing electron beam sensitive resist films |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1517796A true GB1517796A (en) | 1978-07-12 |
Family
ID=24014622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB37060/75A Expired GB1517796A (en) | 1974-09-16 | 1975-09-09 | Method for treating resist films to form relief patterns |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3961100A (https=) |
| JP (1) | JPS5158103A (https=) |
| CA (1) | CA1033472A (https=) |
| DE (1) | DE2539690A1 (https=) |
| FR (1) | FR2284908A1 (https=) |
| GB (1) | GB1517796A (https=) |
| NL (1) | NL7510830A (https=) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1120763A (en) * | 1977-11-23 | 1982-03-30 | James A. Carothers | Enhancement of resist development |
| US4359520A (en) * | 1977-11-23 | 1982-11-16 | International Business Machines Corporation | Enhancement of resist development |
| US4212935A (en) * | 1978-02-24 | 1980-07-15 | International Business Machines Corporation | Method of modifying the development profile of photoresists |
| US4584962A (en) * | 1979-04-30 | 1986-04-29 | Ndm Corporation | Medical electrodes and dispensing conditioner therefor |
| US4590089A (en) * | 1979-04-30 | 1986-05-20 | Ndm Corporation | Medical electrodes and dispensing conditioner therefor |
| US4347302A (en) * | 1980-06-06 | 1982-08-31 | Alexander Gotman | Process for applying a thin coating in liquid form and subsequently drying it |
| US4670372A (en) * | 1984-10-15 | 1987-06-02 | Petrarch Systems, Inc. | Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant |
| US4613561A (en) * | 1984-10-17 | 1986-09-23 | James Marvin Lewis | Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution |
| US4931380A (en) * | 1985-07-18 | 1990-06-05 | Microsi, Inc. | Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist |
| US4710449A (en) * | 1986-01-29 | 1987-12-01 | Petrarch Systems, Inc. | High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants |
| JP2723986B2 (ja) * | 1989-08-02 | 1998-03-09 | 株式会社日立製作所 | 光ディスク原盤の作製方法 |
| US5436114A (en) * | 1989-12-06 | 1995-07-25 | Hitachi, Ltd. | Method of optical lithography with super resolution and projection printing apparatus |
| US6372414B1 (en) * | 1999-03-12 | 2002-04-16 | Clariant Finance (Bvi) Limited | Lift-off process for patterning fine metal lines |
| JP5008280B2 (ja) * | 2004-11-10 | 2012-08-22 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置および基板処理方法 |
| JP5154007B2 (ja) * | 2004-12-06 | 2013-02-27 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置 |
| JP4926433B2 (ja) | 2004-12-06 | 2012-05-09 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置および基板処理方法 |
| JP4794232B2 (ja) * | 2004-12-06 | 2011-10-19 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置 |
| JP4761907B2 (ja) * | 2005-09-28 | 2011-08-31 | 株式会社Sokudo | 基板処理装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2911299A (en) * | 1952-07-22 | 1959-11-03 | Kalvar Corp | System of photographic reproduction |
| BE620660A (https=) * | 1961-07-28 | |||
| US3707373A (en) * | 1969-03-17 | 1972-12-26 | Eastman Kodak Co | Lithographic plate developers |
| US3639185A (en) * | 1969-06-30 | 1972-02-01 | Ibm | Novel etchant and process for etching thin metal films |
| US3649393A (en) * | 1970-06-12 | 1972-03-14 | Ibm | Variable depth etching of film layers using variable exposures of photoresists |
| US3841874A (en) * | 1971-03-15 | 1974-10-15 | Xidex Corp | Method for improving the photographic characteristics of vesicular photographic materials |
| DE2125110C3 (de) * | 1971-05-21 | 1979-11-22 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung von Hologrammen |
| CA945511A (en) * | 1971-11-26 | 1974-04-16 | Ervin I. Szabo | Method of forming foundry moulds |
| US3779774A (en) * | 1972-05-09 | 1973-12-18 | Xidex Corp | Silicone surfactants for vesicular films |
-
1974
- 1974-09-16 US US05/506,445 patent/US3961100A/en not_active Expired - Lifetime
-
1975
- 1975-07-23 CA CA232,122A patent/CA1033472A/en not_active Expired
- 1975-09-06 DE DE19752539690 patent/DE2539690A1/de active Pending
- 1975-09-09 GB GB37060/75A patent/GB1517796A/en not_active Expired
- 1975-09-12 FR FR7528038A patent/FR2284908A1/fr active Granted
- 1975-09-15 NL NL7510830A patent/NL7510830A/xx not_active Application Discontinuation
- 1975-09-16 JP JP50112487A patent/JPS5158103A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2539690A1 (de) | 1976-03-25 |
| FR2284908A1 (fr) | 1976-04-09 |
| JPS5158103A (https=) | 1976-05-21 |
| US3961100A (en) | 1976-06-01 |
| NL7510830A (nl) | 1976-03-18 |
| CA1033472A (en) | 1978-06-20 |
| FR2284908B1 (https=) | 1979-07-20 |
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| GB1297171A (https=) | ||
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| GB1293722A (en) | Photoresist process | |
| ATE47631T1 (de) | Verfahren zum herstellen von photoresiststrukturen. | |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| CSNS | Application of which complete specification have been accepted and published, but patent is not sealed |