GB1517266A - Method of compensating for the voltage coefficient of ion-implanted or diffused resistors - Google Patents

Method of compensating for the voltage coefficient of ion-implanted or diffused resistors

Info

Publication number
GB1517266A
GB1517266A GB17024/77A GB1702477A GB1517266A GB 1517266 A GB1517266 A GB 1517266A GB 17024/77 A GB17024/77 A GB 17024/77A GB 1702477 A GB1702477 A GB 1702477A GB 1517266 A GB1517266 A GB 1517266A
Authority
GB
United Kingdom
Prior art keywords
region
resistor
terminal
isolated
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB17024/77A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1517266A publication Critical patent/GB1517266A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/40—Resistors
    • H10D1/43—Resistors having PN junctions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/326—Application of electric currents or fields, e.g. for electroforming
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/209—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only resistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Analogue/Digital Conversion (AREA)
GB17024/77A 1976-05-13 1977-04-25 Method of compensating for the voltage coefficient of ion-implanted or diffused resistors Expired GB1517266A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7615001A FR2351505A1 (fr) 1976-05-13 1976-05-13 Procede de correction du coefficient en tension de resistances semi-conductrices, implantees ou diffusees

Publications (1)

Publication Number Publication Date
GB1517266A true GB1517266A (en) 1978-07-12

Family

ID=9173307

Family Applications (1)

Application Number Title Priority Date Filing Date
GB17024/77A Expired GB1517266A (en) 1976-05-13 1977-04-25 Method of compensating for the voltage coefficient of ion-implanted or diffused resistors

Country Status (5)

Country Link
JP (1) JPS52137988A (enrdf_load_stackoverflow)
DE (1) DE2720653A1 (enrdf_load_stackoverflow)
FR (1) FR2351505A1 (enrdf_load_stackoverflow)
GB (1) GB1517266A (enrdf_load_stackoverflow)
IT (1) IT1115304B (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017919A1 (en) * 1979-04-16 1980-10-29 Fujitsu Limited Diffused resistor
US4466013A (en) * 1982-08-25 1984-08-14 U.S. Philips Corporation Tapped integrated resistor
US5111068A (en) * 1987-03-31 1992-05-05 Kabushiki Kaisha Toshiba Diffusion resistor circuit
US8384157B2 (en) 2006-05-10 2013-02-26 International Rectifier Corporation High ohmic integrated resistor with improved linearity
US8723294B2 (en) 2010-10-20 2014-05-13 Asahi Kasei Microdevices Corporation Resistance element and inverting buffer circuit

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4229753A (en) * 1977-08-18 1980-10-21 International Business Machines Corporation Voltage compensation of temperature coefficient of resistance in an integrated circuit resistor
SE7900379L (sv) * 1978-01-25 1979-07-26 Western Electric Co Halvledare-integrerad-krets
JPS5516489A (en) * 1978-07-24 1980-02-05 Nippon Telegr & Teleph Corp <Ntt> Semiconductor resistance device
DE3009042A1 (de) * 1979-03-19 1980-10-02 Trw Inc Halbleiterwiderstand
DE3276513D1 (en) * 1982-11-26 1987-07-09 Ibm Self-biased resistor structure and application to interface circuits realization
DE3376045D1 (en) * 1983-10-19 1988-04-21 Itt Ind Gmbh Deutsche Monolithic integrated circuit with at least one integrated resistor
JPH0423355A (ja) * 1990-05-15 1992-01-27 Hitachi Ltd 半導体装置
DE4329639A1 (de) * 1993-09-02 1995-03-09 Telefunken Microelectron Schaltungsanordnung mit gesteuerten Pinch-Widerständen
DE10135169B4 (de) * 2001-07-19 2004-02-19 Robert Bosch Gmbh Widerstandsanordnung und Strommesser
JP6269936B2 (ja) * 2013-12-26 2018-01-31 横河電機株式会社 集積回路

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3270258A (en) * 1963-07-05 1966-08-30 Int Rectifier Corp Field effect transistor
JPS515759A (ja) * 1974-07-03 1976-01-17 Hitachi Ltd Sokoki
JPS515277A (enrdf_load_stackoverflow) * 1974-07-04 1976-01-16 Tatsuo Okazaki
DE2435606C3 (de) * 1974-07-24 1979-03-01 Siemens Ag, 1000 Berlin Und 8000 Muenchen Reihenschaltung aus Feldeffekttransistoren zur Realisierung eines hxxochohmigen linearen Widerstandes

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017919A1 (en) * 1979-04-16 1980-10-29 Fujitsu Limited Diffused resistor
US4466013A (en) * 1982-08-25 1984-08-14 U.S. Philips Corporation Tapped integrated resistor
US5111068A (en) * 1987-03-31 1992-05-05 Kabushiki Kaisha Toshiba Diffusion resistor circuit
US8384157B2 (en) 2006-05-10 2013-02-26 International Rectifier Corporation High ohmic integrated resistor with improved linearity
US8723294B2 (en) 2010-10-20 2014-05-13 Asahi Kasei Microdevices Corporation Resistance element and inverting buffer circuit

Also Published As

Publication number Publication date
DE2720653C2 (enrdf_load_stackoverflow) 1989-03-16
FR2351505B1 (enrdf_load_stackoverflow) 1979-10-12
IT1115304B (it) 1986-02-03
JPS52137988A (en) 1977-11-17
DE2720653A1 (de) 1977-12-01
FR2351505A1 (fr) 1977-12-09
JPS575059B2 (enrdf_load_stackoverflow) 1982-01-28

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19930425