GB1514697A - Testing semiconductor wafers - Google Patents
Testing semiconductor wafersInfo
- Publication number
- GB1514697A GB1514697A GB782177A GB782177A GB1514697A GB 1514697 A GB1514697 A GB 1514697A GB 782177 A GB782177 A GB 782177A GB 782177 A GB782177 A GB 782177A GB 1514697 A GB1514697 A GB 1514697A
- Authority
- GB
- United Kingdom
- Prior art keywords
- wafer
- semi
- defects
- acid
- pits
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2607—Circuits therefor
- G01R31/2637—Circuits therefor for testing other individual devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Weting (AREA)
Abstract
1514697 Semi-conductor devices INTERNATIONAL BUSINESS MACHINES CORP 24 Feb 1977 [15 March 1976] 07821/77 Heading H1K An intermediate step during the manufacture of semi-conductor devices comprises testing a semi-conductor wafer 1 including a surfaceadjacent N-type region 15, for defects, by contacting the region 15 with a weak H.F. acid solution 6 and applying a potential between the acid 6 and the wafer 1 to form a depletion region below the surface of the wafer 1, within which defects 16 lead to the formation of etched pits 17 in the surface and without the surface as a whole being etched, and the pits 17 being examined optically to determine whether their location and density is such as to justify proceeding with subsequent manufacturing steps. The concentration of the acid in the solution is less than 15% by volume. The wafer 1 may be Si and it may include bipolar transistors. The applied potential is sufficiently low that the depletion region extends only to the base-collector junction so that defects below that junction, which are inconsequential, do not give rise to etched pits.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US66723276A | 1976-03-15 | 1976-03-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1514697A true GB1514697A (en) | 1978-06-21 |
Family
ID=24677379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB782177A Expired GB1514697A (en) | 1976-03-15 | 1977-02-24 | Testing semiconductor wafers |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS52111373A (en) |
CA (1) | CA1069221A (en) |
DE (1) | DE2707372C2 (en) |
FR (1) | FR2344847A1 (en) |
GB (1) | GB1514697A (en) |
IT (1) | IT1118013B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5010294A (en) * | 1989-05-31 | 1991-04-23 | Siemens Aktiengesellschaft | Method for topically-resolved determination of the diffusion length of minority charge carriers in a semiconductor crystal body with the assistance of an electrolytic cell |
US5130643A (en) * | 1989-05-31 | 1992-07-14 | Siemens Aktiengesellschaft | Method for determining the recombination rate of minority carriers at boundary surfaces between semiconductors and other substances |
US5209833A (en) * | 1989-05-31 | 1993-05-11 | Siemens Aktiengesellschaft | Method and apparatus for large-area electrical contacting of a semiconductor crystal body with the assistance of electrolytes |
DE4328083A1 (en) * | 1993-08-20 | 1994-03-31 | Ignaz Eisele | Microscopic measuring of surface topography and potential distribution - laterally displacing field effect structure relative to scanned surface |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2532760A1 (en) * | 1982-09-08 | 1984-03-09 | Comp Generale Electricite | METHOD AND DEVICE FOR OBTAINING PHYSICAL CHARACTERISTICS OF A SEMICONDUCTOR MATERIAL |
JPS6066920A (en) * | 1983-09-22 | 1985-04-17 | 北興化工機株式会社 | Conveyable silage vessel |
JP4916249B2 (en) * | 2006-08-10 | 2012-04-11 | 新電元工業株式会社 | Inspection method of semiconductor substrate |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3655540A (en) * | 1970-06-22 | 1972-04-11 | Bell Telephone Labor Inc | Method of making semiconductor device components |
US3902979A (en) * | 1974-06-24 | 1975-09-02 | Westinghouse Electric Corp | Insulator substrate with a thin mono-crystalline semiconductive layer and method of fabrication |
-
1977
- 1977-01-18 FR FR7702072A patent/FR2344847A1/en active Granted
- 1977-02-21 DE DE19772707372 patent/DE2707372C2/en not_active Expired
- 1977-02-24 GB GB782177A patent/GB1514697A/en not_active Expired
- 1977-02-25 JP JP1940477A patent/JPS52111373A/en active Granted
- 1977-02-25 IT IT2066677A patent/IT1118013B/en active
- 1977-02-28 CA CA272,839A patent/CA1069221A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5010294A (en) * | 1989-05-31 | 1991-04-23 | Siemens Aktiengesellschaft | Method for topically-resolved determination of the diffusion length of minority charge carriers in a semiconductor crystal body with the assistance of an electrolytic cell |
US5130643A (en) * | 1989-05-31 | 1992-07-14 | Siemens Aktiengesellschaft | Method for determining the recombination rate of minority carriers at boundary surfaces between semiconductors and other substances |
US5209833A (en) * | 1989-05-31 | 1993-05-11 | Siemens Aktiengesellschaft | Method and apparatus for large-area electrical contacting of a semiconductor crystal body with the assistance of electrolytes |
DE4328083A1 (en) * | 1993-08-20 | 1994-03-31 | Ignaz Eisele | Microscopic measuring of surface topography and potential distribution - laterally displacing field effect structure relative to scanned surface |
Also Published As
Publication number | Publication date |
---|---|
FR2344847A1 (en) | 1977-10-14 |
DE2707372C2 (en) | 1985-08-22 |
JPS52111373A (en) | 1977-09-19 |
IT1118013B (en) | 1986-02-24 |
FR2344847B1 (en) | 1979-09-28 |
CA1069221A (en) | 1980-01-01 |
DE2707372A1 (en) | 1977-09-22 |
JPS5320380B2 (en) | 1978-06-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |