GB1514290A - Method and apparatus for effecting ion implantation of semiconductor wafers - Google Patents
Method and apparatus for effecting ion implantation of semiconductor wafersInfo
- Publication number
- GB1514290A GB1514290A GB51944/75A GB5194475A GB1514290A GB 1514290 A GB1514290 A GB 1514290A GB 51944/75 A GB51944/75 A GB 51944/75A GB 5194475 A GB5194475 A GB 5194475A GB 1514290 A GB1514290 A GB 1514290A
- Authority
- GB
- United Kingdom
- Prior art keywords
- passage
- implantation
- wafer
- chamber
- ion implantation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 235000012431 wafers Nutrition 0.000 title abstract 5
- 238000005468 ion implantation Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 238000002513 implantation Methods 0.000 abstract 4
- 239000004925 Acrylic resin Substances 0.000 abstract 1
- 229920000178 Acrylic resin Polymers 0.000 abstract 1
- 238000010849 ion bombardment Methods 0.000 abstract 1
- 229920003002 synthetic resin Polymers 0.000 abstract 1
- 239000000057 synthetic resin Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU87143/75A AU500872B2 (en) | 1974-11-30 | 1975-12-01 | Benzo and paphtno pyran-4-one-carboxylic acids |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/549,082 US3951695A (en) | 1975-02-11 | 1975-02-11 | Automatic end station for ion implantation system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1514290A true GB1514290A (en) | 1978-06-14 |
Family
ID=24191584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB51944/75A Expired GB1514290A (en) | 1974-11-30 | 1975-12-18 | Method and apparatus for effecting ion implantation of semiconductor wafers |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3951695A (en:Method) |
| JP (1) | JPS5838932B2 (en:Method) |
| CH (1) | CH607330A5 (en:Method) |
| DE (1) | DE2556456C2 (en:Method) |
| GB (1) | GB1514290A (en:Method) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58140961A (ja) * | 1982-02-17 | 1983-08-20 | Hitachi Ltd | ウエ−ハ搬送装置 |
| US4672210A (en) * | 1985-09-03 | 1987-06-09 | Eaton Corporation | Ion implanter target chamber |
| JPH044518A (ja) * | 1990-04-20 | 1992-01-09 | Yazaki Corp | 誘導防止テープ電線 |
| CN116631916B (zh) * | 2023-07-14 | 2024-01-12 | 深圳快捷芯半导体有限公司 | 一种半导体硅片局部掺杂装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2860251A (en) * | 1953-10-15 | 1958-11-11 | Rauland Corp | Apparatus for manufacturing semi-conductor devices |
| NL276412A (en:Method) * | 1961-03-30 | |||
| US3684904A (en) * | 1969-04-24 | 1972-08-15 | Gennady Vasilievich Galutva | Device for precision displacement of a solid body |
| US3887811A (en) * | 1971-10-08 | 1975-06-03 | Radiant Energy Systems | Electro mechanical alignment apparatus for electron image projection systems |
-
1975
- 1975-02-11 US US05/549,082 patent/US3951695A/en not_active Expired - Lifetime
- 1975-12-15 DE DE2556456A patent/DE2556456C2/de not_active Expired
- 1975-12-17 CH CH1638275A patent/CH607330A5/xx not_active IP Right Cessation
- 1975-12-17 JP JP50149647A patent/JPS5838932B2/ja not_active Expired
- 1975-12-18 GB GB51944/75A patent/GB1514290A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2556456C2 (de) | 1987-04-09 |
| CH607330A5 (en:Method) | 1978-12-15 |
| JPS5194773A (en:Method) | 1976-08-19 |
| DE2556456A1 (de) | 1976-08-19 |
| US3951695A (en) | 1976-04-20 |
| JPS5838932B2 (ja) | 1983-08-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA955511A (en) | Zero degree belted tires, and high "soft stretch" belt-forming tapes therefor | |
| CA995565A (en) | Method of treating monocrystalline wafers | |
| IT1074053B (it) | Sistema per convogliare in modo prestabilito,pezzi,quali wafer semiconduttori | |
| JPS51139002A (en) | Pneumatic tire | |
| JPS5230900A (en) | Process for polymerizing polydiorganosiloxane enddblocked with hydroxyl radical | |
| GB1514290A (en) | Method and apparatus for effecting ion implantation of semiconductor wafers | |
| JPS54153740A (en) | Continuous vacuum treatment apparatus | |
| CA989990A (en) | Low rubber, high-flow and high impact abs plastics, improved rubber toughener for producing same and method of manufacture | |
| CA1016560A (en) | Low leakage vacuum valve and chamber using same | |
| JPS53114875A (en) | Method for preventing elusion of plasticizer from polyvinyl chloride medical material | |
| ES8305627A1 (es) | Procedimiento y aparato para la fabricacion de neumaticos cinturados radiales, | |
| FR2486531B1 (en:Method) | ||
| FR2337022A1 (fr) | Dispositif de traitement de tissus faits de bandelettes | |
| FR2315285A1 (fr) | Dispositif d'aspiration pour le drainage de plaies en cours de traitement et procede de preparation de ce dispositif | |
| JPS5265331A (en) | Flow rate proportion controlling apparatus | |
| JPS54150333A (en) | Continuously sputtering apparatus | |
| JPS551815A (en) | Ultraviolet irradiator for variously worked articles of ultraviolet-curing resin | |
| JPS57151163A (en) | Disk conveyor ion implantation | |
| FR2156511A1 (en) | Semiconductor doping - process - by ion bombardment of dopant coating on semiconductor wafer | |
| JPS521227A (en) | Piston correction device | |
| JPS5673470A (en) | Manufacture of semiconductor device | |
| JPS52132675A (en) | Vapor-phase growth method of thin film | |
| JPS51115185A (en) | Automatic packaging and automatic vacuum packaging machine | |
| FR2303564A1 (fr) | Nouvelle ventouse medicale | |
| JPS56148823A (en) | Production of planer type semiconductor device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |