GB1512971A - Radiationsensitive prepolymers and their use for the production of relief structures - Google Patents
Radiationsensitive prepolymers and their use for the production of relief structuresInfo
- Publication number
- GB1512971A GB1512971A GB32362/75A GB3236275A GB1512971A GB 1512971 A GB1512971 A GB 1512971A GB 32362/75 A GB32362/75 A GB 32362/75A GB 3236275 A GB3236275 A GB 3236275A GB 1512971 A GB1512971 A GB 1512971A
- Authority
- GB
- United Kingdom
- Prior art keywords
- radiationsensitive
- prepolymers
- tetracarboxylic acid
- production
- prepared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 abstract 3
- 239000002253 acid Substances 0.000 abstract 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 abstract 2
- BKDVBBSUAGJUBA-UHFFFAOYSA-N bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic acid Chemical compound C1=CC2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O BKDVBBSUAGJUBA-UHFFFAOYSA-N 0.000 abstract 2
- -1 tetracarboxylic acid dianhydride Chemical class 0.000 abstract 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 abstract 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 abstract 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract 1
- 238000010992 reflux Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742437368 DE2437368C3 (de) | 1974-08-02 | Verfahren zur Herstellung von löslichen, hochwärmebeständigen Reliefstrukturen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1512971A true GB1512971A (en) | 1978-06-01 |
Family
ID=5922325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB32362/75A Expired GB1512971A (en) | 1974-08-02 | 1975-08-01 | Radiationsensitive prepolymers and their use for the production of relief structures |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4045223A (enExample) |
| JP (1) | JPS5444453B2 (enExample) |
| AT (1) | AT341792B (enExample) |
| BE (1) | BE831680A (enExample) |
| FR (1) | FR2280926A1 (enExample) |
| GB (1) | GB1512971A (enExample) |
| IT (1) | IT1040122B (enExample) |
| NL (1) | NL181604C (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0269568A3 (en) * | 1986-11-22 | 1989-07-05 | Ciba-Geigy Ag | Polymerisable compositions |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5545748A (en) * | 1978-09-29 | 1980-03-31 | Hitachi Ltd | Photosensitive polymer and its production |
| JPS5545747A (en) * | 1978-09-29 | 1980-03-31 | Hitachi Ltd | Photosensitive polymer and its production |
| DE2933826A1 (de) * | 1979-08-21 | 1981-03-19 | Siemens AG, 1000 Berlin und 8000 München | Polyimid-, polyisoindolochinazolindion-, polyoxazindion- und polychinazolindion-vorstufen sowie deren herstellung |
| US4532332A (en) * | 1981-08-17 | 1985-07-30 | Ciba-Geigy Corporation | N-(hydroxypolyoxaalkylene)phthalimides and succinimides and acrylate esters thereof |
| DE3233912A1 (de) * | 1982-09-13 | 1984-03-15 | Merck Patent Gmbh, 6100 Darmstadt | Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren |
| DE3246403A1 (de) * | 1982-12-15 | 1984-06-20 | Merck Patent Gmbh, 6100 Darmstadt | Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere |
| DE3411660A1 (de) * | 1984-03-29 | 1985-10-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-vorstufen |
| US5077378A (en) * | 1986-10-02 | 1991-12-31 | Hoechst Celanese Corporation | Polyamide containing the hexafluoroisopropylidene group |
| DE3717933A1 (de) * | 1987-05-27 | 1988-12-08 | Hoechst Ag | Photopolymerisierbares gemisch, dieses enthaltendes aufzeichnungsmaterial und verfahren zur herstellung von hochwaermebestaendigen reliefstrukturen |
| DE4217688A1 (de) * | 1992-05-29 | 1993-12-02 | Basf Lacke & Farben | Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen |
| US8052800B2 (en) * | 2008-12-04 | 2011-11-08 | General Electric Company | Method for the removal of an insulative coating using an aqueous solution comprising dimethyl formamide |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3475176A (en) * | 1966-09-06 | 1969-10-28 | Eastman Kodak Co | Azide sensitized photosensitive prepolymer compositions |
| US3650746A (en) * | 1969-06-16 | 1972-03-21 | Grace W R & Co | Dual image formation on separate supports of photocurable composition |
| US3858510A (en) * | 1971-03-11 | 1975-01-07 | Asahi Chemical Ind | Relief structures prepared from photosensitive compositions |
| US3801638A (en) * | 1971-03-12 | 1974-04-02 | Gaf Corp | Triacrylyldiethylenetriamine,method of producing the same,and photopolymerization process and system utilizing the same |
| BE793732A (fr) * | 1972-01-10 | 1973-05-02 | Grace W R & Co | Composition contenant un polyene et un polythiol |
| NL177718C (nl) * | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
| US3847767A (en) * | 1973-03-13 | 1974-11-12 | Grace W R & Co | Method of producing a screen printable photocurable solder resist |
-
1975
- 1975-06-12 AT AT450575A patent/AT341792B/de not_active IP Right Cessation
- 1975-07-24 US US05/598,651 patent/US4045223A/en not_active Expired - Lifetime
- 1975-07-24 BE BE158564A patent/BE831680A/xx not_active IP Right Cessation
- 1975-07-25 IT IT25726/75A patent/IT1040122B/it active
- 1975-07-30 FR FR7523800A patent/FR2280926A1/fr active Granted
- 1975-08-01 JP JP9411875A patent/JPS5444453B2/ja not_active Expired
- 1975-08-01 NL NLAANVRAGE7509213,A patent/NL181604C/xx not_active IP Right Cessation
- 1975-08-01 GB GB32362/75A patent/GB1512971A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0269568A3 (en) * | 1986-11-22 | 1989-07-05 | Ciba-Geigy Ag | Polymerisable compositions |
Also Published As
| Publication number | Publication date |
|---|---|
| NL181604C (nl) | 1987-09-16 |
| AT341792B (de) | 1978-02-27 |
| JPS5444453B2 (enExample) | 1979-12-26 |
| DE2437368B2 (de) | 1977-04-07 |
| JPS5140920A (enExample) | 1976-04-06 |
| FR2280926A1 (fr) | 1976-02-27 |
| ATA450575A (de) | 1977-06-15 |
| FR2280926B1 (enExample) | 1977-12-16 |
| DE2437368A1 (de) | 1976-02-19 |
| NL7509213A (nl) | 1976-02-04 |
| BE831680A (fr) | 1975-11-17 |
| US4045223A (en) | 1977-08-30 |
| IT1040122B (it) | 1979-12-20 |
| NL181604B (nl) | 1987-04-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] |