BE831680A - Procede de preparation de structures en couches - Google Patents
Procede de preparation de structures en couchesInfo
- Publication number
- BE831680A BE831680A BE158564A BE158564A BE831680A BE 831680 A BE831680 A BE 831680A BE 158564 A BE158564 A BE 158564A BE 158564 A BE158564 A BE 158564A BE 831680 A BE831680 A BE 831680A
- Authority
- BE
- Belgium
- Prior art keywords
- layered structures
- preparing layered
- preparing
- structures
- layered
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19742437368 DE2437368C3 (de) | 1974-08-02 | Verfahren zur Herstellung von löslichen, hochwärmebeständigen Reliefstrukturen |
Publications (1)
Publication Number | Publication Date |
---|---|
BE831680A true BE831680A (fr) | 1975-11-17 |
Family
ID=5922325
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE158564A BE831680A (fr) | 1974-08-02 | 1975-07-24 | Procede de preparation de structures en couches |
Country Status (8)
Country | Link |
---|---|
US (1) | US4045223A (fr) |
JP (1) | JPS5444453B2 (fr) |
AT (1) | AT341792B (fr) |
BE (1) | BE831680A (fr) |
FR (1) | FR2280926A1 (fr) |
GB (1) | GB1512971A (fr) |
IT (1) | IT1040122B (fr) |
NL (1) | NL181604C (fr) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5545748A (en) * | 1978-09-29 | 1980-03-31 | Hitachi Ltd | Photosensitive polymer and its production |
JPS5545747A (en) * | 1978-09-29 | 1980-03-31 | Hitachi Ltd | Photosensitive polymer and its production |
DE2933826A1 (de) * | 1979-08-21 | 1981-03-19 | Siemens AG, 1000 Berlin und 8000 München | Polyimid-, polyisoindolochinazolindion-, polyoxazindion- und polychinazolindion-vorstufen sowie deren herstellung |
US4532332A (en) * | 1981-08-17 | 1985-07-30 | Ciba-Geigy Corporation | N-(hydroxypolyoxaalkylene)phthalimides and succinimides and acrylate esters thereof |
JPS5937969U (ja) * | 1982-08-27 | 1984-03-10 | サンデン株式会社 | 熱交換器 |
DE3233912A1 (de) * | 1982-09-13 | 1984-03-15 | Merck Patent Gmbh, 6100 Darmstadt | Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren |
DE3246403A1 (de) * | 1982-12-15 | 1984-06-20 | Merck Patent Gmbh, 6100 Darmstadt | Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere |
DE3411660A1 (de) * | 1984-03-29 | 1985-10-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-vorstufen |
US5077378A (en) * | 1986-10-02 | 1991-12-31 | Hoechst Celanese Corporation | Polyamide containing the hexafluoroisopropylidene group |
GB8628003D0 (en) * | 1986-11-22 | 1986-12-31 | Ciba Geigy Ag | Polymerisable compounds |
DE3717933A1 (de) * | 1987-05-27 | 1988-12-08 | Hoechst Ag | Photopolymerisierbares gemisch, dieses enthaltendes aufzeichnungsmaterial und verfahren zur herstellung von hochwaermebestaendigen reliefstrukturen |
DE4217688A1 (de) * | 1992-05-29 | 1993-12-02 | Basf Lacke & Farben | Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen |
US8052800B2 (en) * | 2008-12-04 | 2011-11-08 | General Electric Company | Method for the removal of an insulative coating using an aqueous solution comprising dimethyl formamide |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3475176A (en) * | 1966-09-06 | 1969-10-28 | Eastman Kodak Co | Azide sensitized photosensitive prepolymer compositions |
US3650746A (en) * | 1969-06-16 | 1972-03-21 | Grace W R & Co | Dual image formation on separate supports of photocurable composition |
US3858510A (en) * | 1971-03-11 | 1975-01-07 | Asahi Chemical Ind | Relief structures prepared from photosensitive compositions |
US3801638A (en) * | 1971-03-12 | 1974-04-02 | Gaf Corp | Triacrylyldiethylenetriamine,method of producing the same,and photopolymerization process and system utilizing the same |
BE793732A (fr) * | 1972-01-10 | 1973-05-02 | Grace W R & Co | Composition contenant un polyene et un polythiol |
NL177718C (nl) * | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
US3847767A (en) * | 1973-03-13 | 1974-11-12 | Grace W R & Co | Method of producing a screen printable photocurable solder resist |
-
1975
- 1975-06-12 AT AT450575A patent/AT341792B/de not_active IP Right Cessation
- 1975-07-24 BE BE158564A patent/BE831680A/fr not_active IP Right Cessation
- 1975-07-24 US US05/598,651 patent/US4045223A/en not_active Expired - Lifetime
- 1975-07-25 IT IT25726/75A patent/IT1040122B/it active
- 1975-07-30 FR FR7523800A patent/FR2280926A1/fr active Granted
- 1975-08-01 GB GB32362/75A patent/GB1512971A/en not_active Expired
- 1975-08-01 NL NLAANVRAGE7509213,A patent/NL181604C/xx not_active IP Right Cessation
- 1975-08-01 JP JP9411875A patent/JPS5444453B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5444453B2 (fr) | 1979-12-26 |
AT341792B (de) | 1978-02-27 |
NL7509213A (nl) | 1976-02-04 |
FR2280926A1 (fr) | 1976-02-27 |
GB1512971A (en) | 1978-06-01 |
NL181604B (nl) | 1987-04-16 |
NL181604C (nl) | 1987-09-16 |
JPS5140920A (fr) | 1976-04-06 |
IT1040122B (it) | 1979-12-20 |
FR2280926B1 (fr) | 1977-12-16 |
US4045223A (en) | 1977-08-30 |
ATA450575A (de) | 1977-06-15 |
DE2437368B2 (de) | 1977-04-07 |
DE2437368A1 (de) | 1976-02-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: SIEMENS A.G. Effective date: 19920731 |