BE831680A - Procede de preparation de structures en couches - Google Patents

Procede de preparation de structures en couches

Info

Publication number
BE831680A
BE831680A BE158564A BE158564A BE831680A BE 831680 A BE831680 A BE 831680A BE 158564 A BE158564 A BE 158564A BE 158564 A BE158564 A BE 158564A BE 831680 A BE831680 A BE 831680A
Authority
BE
Belgium
Prior art keywords
layered structures
preparing layered
preparing
structures
layered
Prior art date
Application number
BE158564A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742437368 external-priority patent/DE2437368C3/de
Application filed filed Critical
Publication of BE831680A publication Critical patent/BE831680A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/12—Unsaturated polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BE158564A 1974-08-02 1975-07-24 Procede de preparation de structures en couches BE831680A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742437368 DE2437368C3 (de) 1974-08-02 Verfahren zur Herstellung von löslichen, hochwärmebeständigen Reliefstrukturen

Publications (1)

Publication Number Publication Date
BE831680A true BE831680A (fr) 1975-11-17

Family

ID=5922325

Family Applications (1)

Application Number Title Priority Date Filing Date
BE158564A BE831680A (fr) 1974-08-02 1975-07-24 Procede de preparation de structures en couches

Country Status (8)

Country Link
US (1) US4045223A (fr)
JP (1) JPS5444453B2 (fr)
AT (1) AT341792B (fr)
BE (1) BE831680A (fr)
FR (1) FR2280926A1 (fr)
GB (1) GB1512971A (fr)
IT (1) IT1040122B (fr)
NL (1) NL181604C (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5545748A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Photosensitive polymer and its production
JPS5545747A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Photosensitive polymer and its production
DE2933826A1 (de) * 1979-08-21 1981-03-19 Siemens AG, 1000 Berlin und 8000 München Polyimid-, polyisoindolochinazolindion-, polyoxazindion- und polychinazolindion-vorstufen sowie deren herstellung
US4532332A (en) * 1981-08-17 1985-07-30 Ciba-Geigy Corporation N-(hydroxypolyoxaalkylene)phthalimides and succinimides and acrylate esters thereof
JPS5937969U (ja) * 1982-08-27 1984-03-10 サンデン株式会社 熱交換器
DE3233912A1 (de) * 1982-09-13 1984-03-15 Merck Patent Gmbh, 6100 Darmstadt Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren
DE3246403A1 (de) * 1982-12-15 1984-06-20 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere
DE3411660A1 (de) * 1984-03-29 1985-10-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-vorstufen
US5077378A (en) * 1986-10-02 1991-12-31 Hoechst Celanese Corporation Polyamide containing the hexafluoroisopropylidene group
GB8628003D0 (en) * 1986-11-22 1986-12-31 Ciba Geigy Ag Polymerisable compounds
DE3717933A1 (de) * 1987-05-27 1988-12-08 Hoechst Ag Photopolymerisierbares gemisch, dieses enthaltendes aufzeichnungsmaterial und verfahren zur herstellung von hochwaermebestaendigen reliefstrukturen
DE4217688A1 (de) * 1992-05-29 1993-12-02 Basf Lacke & Farben Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen
US8052800B2 (en) * 2008-12-04 2011-11-08 General Electric Company Method for the removal of an insulative coating using an aqueous solution comprising dimethyl formamide

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475176A (en) * 1966-09-06 1969-10-28 Eastman Kodak Co Azide sensitized photosensitive prepolymer compositions
US3650746A (en) * 1969-06-16 1972-03-21 Grace W R & Co Dual image formation on separate supports of photocurable composition
US3858510A (en) * 1971-03-11 1975-01-07 Asahi Chemical Ind Relief structures prepared from photosensitive compositions
US3801638A (en) * 1971-03-12 1974-04-02 Gaf Corp Triacrylyldiethylenetriamine,method of producing the same,and photopolymerization process and system utilizing the same
BE793732A (fr) * 1972-01-10 1973-05-02 Grace W R & Co Composition contenant un polyene et un polythiol
NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.
US3847767A (en) * 1973-03-13 1974-11-12 Grace W R & Co Method of producing a screen printable photocurable solder resist

Also Published As

Publication number Publication date
JPS5444453B2 (fr) 1979-12-26
AT341792B (de) 1978-02-27
NL7509213A (nl) 1976-02-04
FR2280926A1 (fr) 1976-02-27
GB1512971A (en) 1978-06-01
NL181604B (nl) 1987-04-16
NL181604C (nl) 1987-09-16
JPS5140920A (fr) 1976-04-06
IT1040122B (it) 1979-12-20
FR2280926B1 (fr) 1977-12-16
US4045223A (en) 1977-08-30
ATA450575A (de) 1977-06-15
DE2437368B2 (de) 1977-04-07
DE2437368A1 (de) 1976-02-19

Similar Documents

Publication Publication Date Title
BE833620A (fr) Procede de preparation de microspheres de perlite
BE836949A (fr) Procede de preparation de bis-acetals de p-benzoquinones
BE831680A (fr) Procede de preparation de structures en couches
FR2277832A1 (fr) Procede de preparation de composes thiazolazo
BE829355A (fr) Procede de preparation de polysocyanates
BE831844A (fr) Procede de preparation de polyisocyanates modifies
BE831648A (fr) Procede de preparation de noenomycine
BE824067A (fr) Procede de preparation de polyurethanes cationiques
BE813169A (fr) Procede de preparation des 3-fluorocephalosporines
FR2282429A1 (fr) Procede de preparation de 7b-acylamino-7a-alcoxycephalosporines
BE824612A (fr) Procede de preparation de 3-aminophenols
FR2281351A1 (fr) Procede de preparation de diaminonaphtalenes
FR2281593A1 (fr) Procede de preparation de couches dorsales de glissement antistatiques
FR2280375A1 (fr) Procede de preparation de penicilines
FR2289536A1 (fr) Procede de preparation de c
BE824573A (fr) Procede de preparation de la trimethylbenzoquinone
BE825768A (fr) Procede de preparation de dithiodianilines
BE828230A (fr) Procede de preparation de trimethyl-p-benzoquinone
FR2281380A1 (fr) Procede de preparation de melanges polymeriques
FR2301510A1 (fr) Procede de preparation de dihalovinylcyclopropanecarboxylates
FR2293420A1 (fr) Procede de preparation de 4-hydroxy-3-methoxy-phenylacetonitrile
BE831028A (fr) Procede de preparation de 2-alkylsulfinyl-6-nitro-benzothiazoles
FR2291171A1 (fr) Procede de preparation de 1,5-dimethylcyclooctene
FR2279727A1 (fr) Procede de preparation de beta-bromalcoyl- et de beta-bromalcenylsulfones
BE827623A (fr) Procede de preparation de beta-hydroxyaminoacides

Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: SIEMENS A.G.

Effective date: 19920731