GB1480705A - Process for developing a photosensitive resin plate after exposure - Google Patents

Process for developing a photosensitive resin plate after exposure

Info

Publication number
GB1480705A
GB1480705A GB878975A GB878975A GB1480705A GB 1480705 A GB1480705 A GB 1480705A GB 878975 A GB878975 A GB 878975A GB 878975 A GB878975 A GB 878975A GB 1480705 A GB1480705 A GB 1480705A
Authority
GB
United Kingdom
Prior art keywords
photo
sensitive resin
march
developing
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB878975A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of GB1480705A publication Critical patent/GB1480705A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB878975A 1974-03-04 1975-03-03 Process for developing a photosensitive resin plate after exposure Expired GB1480705A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2554474A JPS5637543B2 (es) 1974-03-04 1974-03-04

Publications (1)

Publication Number Publication Date
GB1480705A true GB1480705A (en) 1977-07-20

Family

ID=12168916

Family Applications (1)

Application Number Title Priority Date Filing Date
GB878975A Expired GB1480705A (en) 1974-03-04 1975-03-03 Process for developing a photosensitive resin plate after exposure

Country Status (7)

Country Link
JP (1) JPS5637543B2 (es)
DE (1) DE2508856A1 (es)
FR (1) FR2263535B1 (es)
GB (1) GB1480705A (es)
IT (1) IT1030259B (es)
NL (1) NL7502561A (es)
SU (1) SU565638A3 (es)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5032643B2 (es) * 1971-10-04 1975-10-23

Also Published As

Publication number Publication date
IT1030259B (it) 1979-03-30
NL7502561A (nl) 1975-09-08
FR2263535A1 (es) 1975-10-03
DE2508856A1 (de) 1975-09-18
SU565638A3 (ru) 1977-07-15
FR2263535B1 (es) 1980-11-14
JPS5637543B2 (es) 1981-09-01
JPS50120336A (es) 1975-09-20

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee