GB1480201A - Four zone semiconductor device - Google Patents
Four zone semiconductor deviceInfo
- Publication number
- GB1480201A GB1480201A GB5081575A GB5081575A GB1480201A GB 1480201 A GB1480201 A GB 1480201A GB 5081575 A GB5081575 A GB 5081575A GB 5081575 A GB5081575 A GB 5081575A GB 1480201 A GB1480201 A GB 1480201A
- Authority
- GB
- United Kingdom
- Prior art keywords
- zone
- storage means
- charge storage
- control electrode
- memory device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 3
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 239000003989 dielectric material Substances 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/39—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using thyristors or the avalanche or negative resistance type, e.g. PNPN, SCR, SCS, UJT
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/7404—Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device
- H01L29/742—Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device the device being a field effect transistor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Non-Volatile Memory (AREA)
- Read Only Memory (AREA)
- Thyristors (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
1480201 Semi-conductor memory device NCR CORP 11 Dec 1975 [6 Jan 1975] 50815/75 Heading H1K A programmable memory device consists of a PNPN semi-conductor zone structure with electrodes on its end zones and a charge storage means bridging one of the inner zones and separated from said zone and an overlying control electrode by dielectric material. The charge storage means may be constituted by a floating layer of aluminium embedded in aluminium oxide, or disposed between a thin silicon dioxide layer adjacent the zone and a thicker silicon nitride layer separating it from the control electrode, or by the interface between layers of silicon dioxide and silicon nitride. The mode of operation of a random access matrix memory array incorporating such devices is described. Specifications 1,055,682 and 1,367,325 are referred to.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US53866275A | 1975-01-06 | 1975-01-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1480201A true GB1480201A (en) | 1977-07-20 |
Family
ID=24147887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5081575A Expired GB1480201A (en) | 1975-01-06 | 1975-12-11 | Four zone semiconductor device |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5193680A (en) |
DE (1) | DE2558626A1 (en) |
FR (1) | FR2296939A1 (en) |
GB (1) | GB1480201A (en) |
NL (1) | NL7600049A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5574168A (en) * | 1978-11-28 | 1980-06-04 | Oki Electric Ind Co Ltd | Pnpn switch |
US4398338A (en) * | 1980-12-24 | 1983-08-16 | Fairchild Camera & Instrument Corp. | Fabrication of high speed, nonvolatile, electrically erasable memory cell and system utilizing selective masking, deposition and etching techniques |
JPS59211271A (en) * | 1983-05-17 | 1984-11-30 | Toshiba Corp | Semiconductor device |
JPS59213167A (en) * | 1983-05-19 | 1984-12-03 | Nec Corp | Thyristor |
WO1986007487A1 (en) * | 1985-06-07 | 1986-12-18 | Anamartic Limited | Electrical data storage elements |
US7224002B2 (en) * | 2004-05-06 | 2007-05-29 | Micron Technology, Inc. | Silicon on insulator read-write non-volatile memory comprising lateral thyristor and trapping layer |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4949581A (en) * | 1972-09-16 | 1974-05-14 |
-
1975
- 1975-12-11 GB GB5081575A patent/GB1480201A/en not_active Expired
- 1975-12-24 DE DE19752558626 patent/DE2558626A1/en active Pending
-
1976
- 1976-01-05 NL NL7600049A patent/NL7600049A/en unknown
- 1976-01-05 JP JP75376A patent/JPS5193680A/en active Pending
- 1976-01-05 FR FR7600060A patent/FR2296939A1/en active Granted
Also Published As
Publication number | Publication date |
---|---|
NL7600049A (en) | 1976-07-08 |
FR2296939B1 (en) | 1978-06-30 |
JPS5193680A (en) | 1976-08-17 |
FR2296939A1 (en) | 1976-07-30 |
DE2558626A1 (en) | 1976-07-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |