JPS5193680A - ****te*****shi*** ***ho - Google Patents

****te*****shi*** ***ho

Info

Publication number
JPS5193680A
JPS5193680A JP75376A JP75376A JPS5193680A JP S5193680 A JPS5193680 A JP S5193680A JP 75376 A JP75376 A JP 75376A JP 75376 A JP75376 A JP 75376A JP S5193680 A JPS5193680 A JP S5193680A
Authority
JP
Japan
Prior art keywords
shi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP75376A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5193680A publication Critical patent/JPS5193680A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/39Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using thyristors or the avalanche or negative resistance type, e.g. PNPN, SCR, SCS, UJT
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/7404Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device
    • H01L29/742Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device the device being a field effect transistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Read Only Memory (AREA)
  • Thyristors (AREA)
JP75376A 1975-01-06 1976-01-05 ****te*****shi*** ***ho Pending JPS5193680A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US53866275A 1975-01-06 1975-01-06

Publications (1)

Publication Number Publication Date
JPS5193680A true JPS5193680A (en) 1976-08-17

Family

ID=24147887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP75376A Pending JPS5193680A (en) 1975-01-06 1976-01-05 ****te*****shi*** ***ho

Country Status (5)

Country Link
JP (1) JPS5193680A (en)
DE (1) DE2558626A1 (en)
FR (1) FR2296939A1 (en)
GB (1) GB1480201A (en)
NL (1) NL7600049A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59211271A (en) * 1983-05-17 1984-11-30 Toshiba Corp Semiconductor device
JP2007536737A (en) * 2004-05-06 2007-12-13 マイクロン テクノロジー, インク. Silicon-on-insulator read-write nonvolatile memory with lateral thyristor and trapping layer

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5574168A (en) * 1978-11-28 1980-06-04 Oki Electric Ind Co Ltd Pnpn switch
US4398338A (en) * 1980-12-24 1983-08-16 Fairchild Camera & Instrument Corp. Fabrication of high speed, nonvolatile, electrically erasable memory cell and system utilizing selective masking, deposition and etching techniques
JPS59213167A (en) * 1983-05-19 1984-12-03 Nec Corp Thyristor
EP0225366A1 (en) * 1985-06-07 1987-06-16 Anamartic Limited Electrical data storage elements

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4949581A (en) * 1972-09-16 1974-05-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4949581A (en) * 1972-09-16 1974-05-14

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59211271A (en) * 1983-05-17 1984-11-30 Toshiba Corp Semiconductor device
JP2007536737A (en) * 2004-05-06 2007-12-13 マイクロン テクノロジー, インク. Silicon-on-insulator read-write nonvolatile memory with lateral thyristor and trapping layer
JP4915592B2 (en) * 2004-05-06 2012-04-11 マイクロン テクノロジー, インク. Silicon-on-insulator read-write nonvolatile memory with lateral thyristor and trapping layer

Also Published As

Publication number Publication date
FR2296939A1 (en) 1976-07-30
GB1480201A (en) 1977-07-20
FR2296939B1 (en) 1978-06-30
DE2558626A1 (en) 1976-07-08
NL7600049A (en) 1976-07-08

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