GB1477872A - Fabricating photocathode sources - Google Patents

Fabricating photocathode sources

Info

Publication number
GB1477872A
GB1477872A GB2445974A GB2445974A GB1477872A GB 1477872 A GB1477872 A GB 1477872A GB 2445974 A GB2445974 A GB 2445974A GB 2445974 A GB2445974 A GB 2445974A GB 1477872 A GB1477872 A GB 1477872A
Authority
GB
United Kingdom
Prior art keywords
layer
electro
cathodo
photo
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2445974A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of GB1477872A publication Critical patent/GB1477872A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cold Cathode And The Manufacture (AREA)
GB2445974A 1973-06-15 1974-06-03 Fabricating photocathode sources Expired GB1477872A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37055873A 1973-06-15 1973-06-15
US402248A US3895234A (en) 1973-06-15 1973-10-01 Method and apparatus for electron beam alignment with a member

Publications (1)

Publication Number Publication Date
GB1477872A true GB1477872A (en) 1977-06-29

Family

ID=27005005

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2445974A Expired GB1477872A (en) 1973-06-15 1974-06-03 Fabricating photocathode sources

Country Status (6)

Country Link
US (1) US3895234A (enrdf_load_stackoverflow)
JP (1) JPS5811744B2 (enrdf_load_stackoverflow)
CA (1) CA1005173A (enrdf_load_stackoverflow)
DE (1) DE2428225A1 (enrdf_load_stackoverflow)
FR (1) FR2267583B1 (enrdf_load_stackoverflow)
GB (1) GB1477872A (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1520925A (en) * 1975-10-06 1978-08-09 Mullard Ltd Semiconductor device manufacture
GB1557064A (en) * 1976-09-09 1979-12-05 Mullard Ltd Masks suitable for use in electron image projectors
JPS5915977A (ja) * 1982-07-20 1984-01-27 株式会社東芝 表示装置
US4742234A (en) * 1985-09-27 1988-05-03 American Telephone And Telegraph Company, At&T Bell Laboratories Charged-particle-beam lithography
KR930001889B1 (ko) * 1986-10-13 1993-03-19 세이꼬 엡슨 가부시끼가이샤 이온빔 노출마스크
JPH01158731A (ja) * 1987-12-15 1989-06-21 Fujitsu Ltd 光電子転写露光方法およびこれに用いられるマスク
US5224137A (en) * 1991-05-23 1993-06-29 Imatron, Inc. Tuning the scanning electron beam computed tomography scanner
JP4055543B2 (ja) * 2002-02-22 2008-03-05 ソニー株式会社 レジスト材料及び微細加工方法
US7015467B2 (en) * 2002-10-10 2006-03-21 Applied Materials, Inc. Generating electrons with an activated photocathode
US7670514B2 (en) * 2002-10-10 2010-03-02 Sony Corporation Method of producing optical disk-use original and method of producing optical disk
US7446474B2 (en) * 2002-10-10 2008-11-04 Applied Materials, Inc. Hetero-junction electron emitter with Group III nitride and activated alkali halide
US7049616B2 (en) * 2004-05-17 2006-05-23 General Electric Company Methods, apparatus, and software for adjusting the focal spot of an electron beam

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2556455A (en) * 1948-03-02 1951-06-12 Rauland Corp Cathode-ray tube focusing system
US2749449A (en) * 1953-09-28 1956-06-05 Philco Corp Photocell indexing system
US3037123A (en) * 1958-05-02 1962-05-29 Standard Oil Co Electronic arbitrary function generator
GB1065060A (en) * 1963-04-19 1967-04-12 United Aircraft Corp Improvements in and relating to apparatus for working articles with energised beams
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns
US3679497A (en) * 1969-10-24 1972-07-25 Westinghouse Electric Corp Electron beam fabrication system and process for use thereof
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3832560A (en) * 1973-06-13 1974-08-27 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member by detecting cathodoluminescence from oxide layers
US3840749A (en) * 1973-06-19 1974-10-08 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a semiconductor member

Also Published As

Publication number Publication date
JPS5035800A (enrdf_load_stackoverflow) 1975-04-04
FR2267583A1 (enrdf_load_stackoverflow) 1975-11-07
JPS5811744B2 (ja) 1983-03-04
CA1005173A (en) 1977-02-08
FR2267583B1 (enrdf_load_stackoverflow) 1979-10-12
DE2428225A1 (de) 1975-03-20
US3895234A (en) 1975-07-15

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]