CA1005173A - Method and apparatus for electron beam alignment with a member - Google Patents
Method and apparatus for electron beam alignment with a memberInfo
- Publication number
- CA1005173A CA1005173A CA201,937A CA201937A CA1005173A CA 1005173 A CA1005173 A CA 1005173A CA 201937 A CA201937 A CA 201937A CA 1005173 A CA1005173 A CA 1005173A
- Authority
- CA
- Canada
- Prior art keywords
- electron beam
- beam alignment
- alignment
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Cold Cathode And The Manufacture (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37055873A | 1973-06-15 | 1973-06-15 | |
| US402248A US3895234A (en) | 1973-06-15 | 1973-10-01 | Method and apparatus for electron beam alignment with a member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1005173A true CA1005173A (en) | 1977-02-08 |
Family
ID=27005005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA201,937A Expired CA1005173A (en) | 1973-06-15 | 1974-06-07 | Method and apparatus for electron beam alignment with a member |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3895234A (enrdf_load_stackoverflow) |
| JP (1) | JPS5811744B2 (enrdf_load_stackoverflow) |
| CA (1) | CA1005173A (enrdf_load_stackoverflow) |
| DE (1) | DE2428225A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2267583B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1477872A (enrdf_load_stackoverflow) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1520925A (en) * | 1975-10-06 | 1978-08-09 | Mullard Ltd | Semiconductor device manufacture |
| GB1557064A (en) * | 1976-09-09 | 1979-12-05 | Mullard Ltd | Masks suitable for use in electron image projectors |
| JPS5915977A (ja) * | 1982-07-20 | 1984-01-27 | 株式会社東芝 | 表示装置 |
| US4742234A (en) * | 1985-09-27 | 1988-05-03 | American Telephone And Telegraph Company, At&T Bell Laboratories | Charged-particle-beam lithography |
| KR930001889B1 (ko) * | 1986-10-13 | 1993-03-19 | 세이꼬 엡슨 가부시끼가이샤 | 이온빔 노출마스크 |
| JPH01158731A (ja) * | 1987-12-15 | 1989-06-21 | Fujitsu Ltd | 光電子転写露光方法およびこれに用いられるマスク |
| US5224137A (en) * | 1991-05-23 | 1993-06-29 | Imatron, Inc. | Tuning the scanning electron beam computed tomography scanner |
| JP4055543B2 (ja) * | 2002-02-22 | 2008-03-05 | ソニー株式会社 | レジスト材料及び微細加工方法 |
| US7015467B2 (en) * | 2002-10-10 | 2006-03-21 | Applied Materials, Inc. | Generating electrons with an activated photocathode |
| US7670514B2 (en) * | 2002-10-10 | 2010-03-02 | Sony Corporation | Method of producing optical disk-use original and method of producing optical disk |
| US7446474B2 (en) * | 2002-10-10 | 2008-11-04 | Applied Materials, Inc. | Hetero-junction electron emitter with Group III nitride and activated alkali halide |
| US7049616B2 (en) * | 2004-05-17 | 2006-05-23 | General Electric Company | Methods, apparatus, and software for adjusting the focal spot of an electron beam |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2556455A (en) * | 1948-03-02 | 1951-06-12 | Rauland Corp | Cathode-ray tube focusing system |
| US2749449A (en) * | 1953-09-28 | 1956-06-05 | Philco Corp | Photocell indexing system |
| US3037123A (en) * | 1958-05-02 | 1962-05-29 | Standard Oil Co | Electronic arbitrary function generator |
| GB1065060A (en) * | 1963-04-19 | 1967-04-12 | United Aircraft Corp | Improvements in and relating to apparatus for working articles with energised beams |
| US3491236A (en) * | 1967-09-28 | 1970-01-20 | Gen Electric | Electron beam fabrication of microelectronic circuit patterns |
| US3679497A (en) * | 1969-10-24 | 1972-07-25 | Westinghouse Electric Corp | Electron beam fabrication system and process for use thereof |
| US3710101A (en) * | 1970-10-06 | 1973-01-09 | Westinghouse Electric Corp | Apparatus and method for alignment of members to electron beams |
| US3745358A (en) * | 1971-05-10 | 1973-07-10 | Radiant Energy Systems | Alignment method and apparatus for electron projection systems |
| US3832560A (en) * | 1973-06-13 | 1974-08-27 | Westinghouse Electric Corp | Method and apparatus for electron beam alignment with a member by detecting cathodoluminescence from oxide layers |
| US3840749A (en) * | 1973-06-19 | 1974-10-08 | Westinghouse Electric Corp | Method and apparatus for electron beam alignment with a semiconductor member |
-
1973
- 1973-10-01 US US402248A patent/US3895234A/en not_active Expired - Lifetime
-
1974
- 1974-06-03 GB GB2445974A patent/GB1477872A/en not_active Expired
- 1974-06-07 CA CA201,937A patent/CA1005173A/en not_active Expired
- 1974-06-11 DE DE19742428225 patent/DE2428225A1/de not_active Withdrawn
- 1974-06-14 FR FR7420768A patent/FR2267583B1/fr not_active Expired
- 1974-06-14 JP JP49067255A patent/JPS5811744B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5035800A (enrdf_load_stackoverflow) | 1975-04-04 |
| FR2267583A1 (enrdf_load_stackoverflow) | 1975-11-07 |
| GB1477872A (en) | 1977-06-29 |
| JPS5811744B2 (ja) | 1983-03-04 |
| FR2267583B1 (enrdf_load_stackoverflow) | 1979-10-12 |
| DE2428225A1 (de) | 1975-03-20 |
| US3895234A (en) | 1975-07-15 |
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