GB1467645A - Photoinitiator systems - Google Patents
Photoinitiator systemsInfo
- Publication number
- GB1467645A GB1467645A GB316474A GB316474A GB1467645A GB 1467645 A GB1467645 A GB 1467645A GB 316474 A GB316474 A GB 316474A GB 316474 A GB316474 A GB 316474A GB 1467645 A GB1467645 A GB 1467645A
- Authority
- GB
- United Kingdom
- Prior art keywords
- bonded
- composition
- hexachloroparaxylene
- pentachlorobenzene
- cellophane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 polypropylene Polymers 0.000 abstract 4
- 239000000853 adhesive Substances 0.000 abstract 3
- 230000001070 adhesive effect Effects 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 3
- OTEKOJQFKOIXMU-UHFFFAOYSA-N 1,4-bis(trichloromethyl)benzene Chemical group ClC(Cl)(Cl)C1=CC=C(C(Cl)(Cl)Cl)C=C1 OTEKOJQFKOIXMU-UHFFFAOYSA-N 0.000 abstract 2
- 229920000298 Cellophane Polymers 0.000 abstract 2
- 239000004743 Polypropylene Substances 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 2
- 239000004411 aluminium Substances 0.000 abstract 2
- 229910052782 aluminium Inorganic materials 0.000 abstract 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 abstract 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 2
- 239000012965 benzophenone Substances 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 239000012188 paraffin wax Substances 0.000 abstract 2
- CEOCDNVZRAIOQZ-UHFFFAOYSA-N pentachlorobenzene Chemical compound ClC1=CC(Cl)=C(Cl)C(Cl)=C1Cl CEOCDNVZRAIOQZ-UHFFFAOYSA-N 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 229920001155 polypropylene Polymers 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 abstract 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- 229920002799 BoPET Polymers 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 239000005041 Mylar™ Substances 0.000 abstract 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 abstract 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 125000002877 alkyl aryl group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 229910052787 antimony Inorganic materials 0.000 abstract 1
- 229910052785 arsenic Inorganic materials 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 229910052797 bismuth Inorganic materials 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229910052802 copper Chemical group 0.000 abstract 1
- 239000010949 copper Chemical group 0.000 abstract 1
- ORICWOYODJGJMY-UHFFFAOYSA-N dibutyl(phenyl)phosphane Chemical compound CCCCP(CCCC)C1=CC=CC=C1 ORICWOYODJGJMY-UHFFFAOYSA-N 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000004744 fabric Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 239000011888 foil Substances 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 150000002894 organic compounds Chemical class 0.000 abstract 1
- 239000000123 paper Substances 0.000 abstract 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 235000021286 stilbenes Nutrition 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 150000005846 sugar alcohols Polymers 0.000 abstract 1
- MTWZZHCSSCNQBI-UHFFFAOYSA-N tributylbismuthane Chemical compound CCCC[Bi](CCCC)CCCC MTWZZHCSSCNQBI-UHFFFAOYSA-N 0.000 abstract 1
- QMMSODCNPHJWSN-UHFFFAOYSA-N trioctylarsane Chemical compound CCCCCCCC[As](CCCCCCCC)CCCCCCCC QMMSODCNPHJWSN-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32844273A | 1973-01-31 | 1973-01-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1467645A true GB1467645A (en) | 1977-03-16 |
Family
ID=23280998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB316474A Expired GB1467645A (en) | 1973-01-31 | 1974-01-23 | Photoinitiator systems |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS49110781A (cg-RX-API-DMAC7.html) |
| CA (1) | CA1042139A (cg-RX-API-DMAC7.html) |
| DE (1) | DE2404156A1 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2216304A1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1467645A (cg-RX-API-DMAC7.html) |
| IT (1) | IT1006207B (cg-RX-API-DMAC7.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4289844A (en) | 1979-06-18 | 1981-09-15 | Eastman Kodak Company | Photopolymerizable compositions featuring novel co-initiators |
| US4366228A (en) | 1980-09-05 | 1982-12-28 | Eastman Kodak Company | Photopolymerizable compositions featuring novel co-initiators |
| US4505793A (en) * | 1981-07-20 | 1985-03-19 | Fuji Photo Film Co., Ltd. | Photopolymerizable compositions |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4057431A (en) * | 1975-09-29 | 1977-11-08 | The Goodyear Tire & Rubber Company | Ethylenically polyurethane unsaturated composition |
| US4054719A (en) * | 1976-11-23 | 1977-10-18 | American Cyanamid Company | Phenacyl ester photosensitizers for radiation-curable coatings |
| DE2759164A1 (de) * | 1977-12-31 | 1979-07-12 | Basf Ag | Photopolymerisierbare ueberzugs- und aufzeichnungsmaterialien, enthaltend einen photoinitiator und eine organische halogenverbindung |
| DE3069349D1 (en) * | 1979-06-18 | 1984-11-08 | Eastman Kodak Co | Co-initiator compositions for photopolymerization containing 3-acyl-substituted coumarins, photopolymerizable composition and photographic element |
| DE3007077A1 (de) * | 1980-02-26 | 1981-09-03 | Bayer Ag, 5090 Leverkusen | Polyazofarbstoffe und deren konzentrierte waessrige loesungen sowie verfahren zu ihrer herstellung und ihre verwendung zum faerben cellulosehaltiger materialien und leder |
| EP0128320A1 (en) * | 1983-06-08 | 1984-12-19 | Stauffer Chemical Company | Amine promotion of benzoin ether photoinitiators |
| EP0128321A1 (en) * | 1983-06-08 | 1984-12-19 | Stauffer Chemical Company | Amine promotion of glyoxylate photoinitiators |
| NL8403706A (nl) * | 1984-12-06 | 1986-07-01 | Dsm Resins Bv | Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. |
| US5217760A (en) * | 1990-07-20 | 1993-06-08 | Loctite Corporation | Free radically curable formulations employing dithiolate catalysts |
-
1974
- 1974-01-23 GB GB316474A patent/GB1467645A/en not_active Expired
- 1974-01-29 DE DE2404156A patent/DE2404156A1/de active Pending
- 1974-01-30 FR FR7403044A patent/FR2216304A1/fr not_active Withdrawn
- 1974-01-30 CA CA191,375A patent/CA1042139A/en not_active Expired
- 1974-01-31 IT IT20001/74A patent/IT1006207B/it active
- 1974-01-31 JP JP49013242A patent/JPS49110781A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4289844A (en) | 1979-06-18 | 1981-09-15 | Eastman Kodak Company | Photopolymerizable compositions featuring novel co-initiators |
| US4366228A (en) | 1980-09-05 | 1982-12-28 | Eastman Kodak Company | Photopolymerizable compositions featuring novel co-initiators |
| US4505793A (en) * | 1981-07-20 | 1985-03-19 | Fuji Photo Film Co., Ltd. | Photopolymerizable compositions |
Also Published As
| Publication number | Publication date |
|---|---|
| IT1006207B (it) | 1976-09-30 |
| CA1042139A (en) | 1978-11-07 |
| DE2404156A1 (de) | 1974-08-01 |
| FR2216304A1 (cg-RX-API-DMAC7.html) | 1974-08-30 |
| JPS49110781A (cg-RX-API-DMAC7.html) | 1974-10-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |