GB1458729A - Lapping tool - Google Patents

Lapping tool

Info

Publication number
GB1458729A
GB1458729A GB2951274A GB2951274A GB1458729A GB 1458729 A GB1458729 A GB 1458729A GB 2951274 A GB2951274 A GB 2951274A GB 2951274 A GB2951274 A GB 2951274A GB 1458729 A GB1458729 A GB 1458729A
Authority
GB
United Kingdom
Prior art keywords
lapping
dish
mould
resin
pellets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2951274A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB1458729A publication Critical patent/GB1458729A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
GB2951274A 1973-07-04 1974-07-03 Lapping tool Expired GB1458729A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48075525A JPS5247789B2 (enrdf_load_stackoverflow) 1973-07-04 1973-07-04

Publications (1)

Publication Number Publication Date
GB1458729A true GB1458729A (en) 1976-12-15

Family

ID=13578722

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2951274A Expired GB1458729A (en) 1973-07-04 1974-07-03 Lapping tool

Country Status (4)

Country Link
JP (1) JPS5247789B2 (enrdf_load_stackoverflow)
DE (1) DE2432536A1 (enrdf_load_stackoverflow)
FR (1) FR2235762B1 (enrdf_load_stackoverflow)
GB (1) GB1458729A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006020153A3 (en) * 2004-07-21 2006-04-27 Neopad Technologies Corp Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designs
US7704125B2 (en) 2003-03-24 2010-04-27 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
US8864859B2 (en) 2003-03-25 2014-10-21 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
US9278424B2 (en) 2003-03-25 2016-03-08 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
CN118493159A (zh) * 2024-07-18 2024-08-16 浙江大学 一种弹性磁电柔性抛光工具头及使用方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56151417U (enrdf_load_stackoverflow) * 1980-04-14 1981-11-13
JPS57102617U (enrdf_load_stackoverflow) * 1980-12-15 1982-06-24
JPS58117156A (ja) * 1981-12-09 1983-07-12 松下電工株式会社 吸音板の製造方法
US4989316A (en) * 1987-03-09 1991-02-05 Gerber Scientific Products, Inc. Method and apparatus for making prescription eyeglass lenses
US5210695A (en) * 1990-10-26 1993-05-11 Gerber Optical, Inc. Single block mounting system for surfacing and edging of a lens blank and method therefor
CN107053027B (zh) * 2017-01-06 2019-02-22 浙江工业大学 一种具有梯度分布研磨盘去除函数的计算方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1371638A (fr) * 1963-10-16 1964-09-04 Champion Spark Plug Co Procédé de production avec précision d'une surface de révolution abrasive

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7704125B2 (en) 2003-03-24 2010-04-27 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
US8864859B2 (en) 2003-03-25 2014-10-21 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
US9278424B2 (en) 2003-03-25 2016-03-08 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
WO2006020153A3 (en) * 2004-07-21 2006-04-27 Neopad Technologies Corp Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designs
US7377840B2 (en) 2004-07-21 2008-05-27 Neopad Technologies Corporation Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs
US8287793B2 (en) 2004-07-21 2012-10-16 Nexplanar Corporation Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs
US8932116B2 (en) 2004-07-21 2015-01-13 Nexplanar Corporation Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs
CN118493159A (zh) * 2024-07-18 2024-08-16 浙江大学 一种弹性磁电柔性抛光工具头及使用方法

Also Published As

Publication number Publication date
FR2235762A1 (enrdf_load_stackoverflow) 1975-01-31
JPS5024356A (enrdf_load_stackoverflow) 1975-03-15
DE2432536A1 (de) 1975-01-23
FR2235762B1 (enrdf_load_stackoverflow) 1976-12-24
JPS5247789B2 (enrdf_load_stackoverflow) 1977-12-05

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19940702