GB1449157A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
GB1449157A
GB1449157A GB4203373A GB4203373A GB1449157A GB 1449157 A GB1449157 A GB 1449157A GB 4203373 A GB4203373 A GB 4203373A GB 4203373 A GB4203373 A GB 4203373A GB 1449157 A GB1449157 A GB 1449157A
Authority
GB
United Kingdom
Prior art keywords
substituted
cinnamate
radical
solvent
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4203373A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Publication of GB1449157A publication Critical patent/GB1449157A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
GB4203373A 1972-09-06 1973-09-06 Photosensitive composition Expired GB1449157A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8932672A JPS515936B2 (enExample) 1972-09-06 1972-09-06

Publications (1)

Publication Number Publication Date
GB1449157A true GB1449157A (en) 1976-09-15

Family

ID=13967532

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4203373A Expired GB1449157A (en) 1972-09-06 1973-09-06 Photosensitive composition

Country Status (7)

Country Link
JP (1) JPS515936B2 (enExample)
CA (1) CA993253A (enExample)
DE (1) DE2345095A1 (enExample)
FR (1) FR2198171A1 (enExample)
GB (1) GB1449157A (enExample)
IT (1) IT995284B (enExample)
NL (1) NL7311904A (enExample)

Also Published As

Publication number Publication date
JPS4946428A (enExample) 1974-05-04
FR2198171A1 (enExample) 1974-03-29
JPS515936B2 (enExample) 1976-02-24
CA993253A (en) 1976-07-20
IT995284B (it) 1975-11-10
DE2345095A1 (de) 1974-03-14
NL7311904A (enExample) 1974-03-08

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee