GB1442934A - Light-sensitive naphtho-quinone diazide composition - Google Patents
Light-sensitive naphtho-quinone diazide compositionInfo
- Publication number
- GB1442934A GB1442934A GB3323774A GB3323774A GB1442934A GB 1442934 A GB1442934 A GB 1442934A GB 3323774 A GB3323774 A GB 3323774A GB 3323774 A GB3323774 A GB 3323774A GB 1442934 A GB1442934 A GB 1442934A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cyclohexyl
- july
- cycloalkyl
- ethyl
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229930192627 Naphthoquinone Natural products 0.000 title 1
- 150000002791 naphthoquinones Chemical class 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 239000011230 binding agent Substances 0.000 abstract 2
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- UGWULZWUXSCWPX-UHFFFAOYSA-N 2-sulfanylideneimidazolidin-4-one Chemical compound O=C1CNC(=S)N1 UGWULZWUXSCWPX-UHFFFAOYSA-N 0.000 abstract 1
- 239000005711 Benzoic acid Substances 0.000 abstract 1
- 229920001800 Shellac Polymers 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- 229920006243 acrylic copolymer Polymers 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 abstract 1
- 229940091173 hydantoin Drugs 0.000 abstract 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 abstract 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 abstract 1
- 229940113147 shellac Drugs 0.000 abstract 1
- 235000013874 shellac Nutrition 0.000 abstract 1
- 239000004208 shellac Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8533273A JPS5619619B2 (enrdf_load_stackoverflow) | 1973-07-27 | 1973-07-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1442934A true GB1442934A (en) | 1976-07-14 |
Family
ID=13855667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3323774A Expired GB1442934A (en) | 1973-07-27 | 1974-07-26 | Light-sensitive naphtho-quinone diazide composition |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5619619B2 (enrdf_load_stackoverflow) |
| GB (1) | GB1442934A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2500645A1 (fr) * | 1981-02-20 | 1982-08-27 | Polychrome Corp | Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element |
| US4431725A (en) * | 1978-12-28 | 1984-02-14 | Hiromichi Tachikawa | Light-sensitive material and image forming processes using the same |
| US5145763A (en) * | 1990-06-29 | 1992-09-08 | Ocg Microelectronic Materials, Inc. | Positive photoresist composition |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61219951A (ja) * | 1985-03-27 | 1986-09-30 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性組成物 |
| DE69604114T2 (de) * | 1995-04-10 | 2000-03-02 | Shipley Co., L.L.C. | Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist |
| WO2008078622A1 (ja) * | 2006-12-27 | 2008-07-03 | Konica Minolta Medical & Graphic, Inc. | ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法 |
-
1973
- 1973-07-27 JP JP8533273A patent/JPS5619619B2/ja not_active Expired
-
1974
- 1974-07-26 GB GB3323774A patent/GB1442934A/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4431725A (en) * | 1978-12-28 | 1984-02-14 | Hiromichi Tachikawa | Light-sensitive material and image forming processes using the same |
| FR2500645A1 (fr) * | 1981-02-20 | 1982-08-27 | Polychrome Corp | Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element |
| US5145763A (en) * | 1990-06-29 | 1992-09-08 | Ocg Microelectronic Materials, Inc. | Positive photoresist composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5619619B2 (enrdf_load_stackoverflow) | 1981-05-08 |
| JPS5036203A (enrdf_load_stackoverflow) | 1975-04-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |