JPS5036203A - - Google Patents

Info

Publication number
JPS5036203A
JPS5036203A JP8533273A JP8533273A JPS5036203A JP S5036203 A JPS5036203 A JP S5036203A JP 8533273 A JP8533273 A JP 8533273A JP 8533273 A JP8533273 A JP 8533273A JP S5036203 A JPS5036203 A JP S5036203A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8533273A
Other languages
Japanese (ja)
Other versions
JPS5619619B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8533273A priority Critical patent/JPS5619619B2/ja
Priority to GB3323774A priority patent/GB1442934A/en
Publication of JPS5036203A publication Critical patent/JPS5036203A/ja
Priority to US05/689,874 priority patent/US4105450A/en
Publication of JPS5619619B2 publication Critical patent/JPS5619619B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP8533273A 1973-07-27 1973-07-27 Expired JPS5619619B2 (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8533273A JPS5619619B2 (enrdf_load_stackoverflow) 1973-07-27 1973-07-27
GB3323774A GB1442934A (en) 1973-07-27 1974-07-26 Light-sensitive naphtho-quinone diazide composition
US05/689,874 US4105450A (en) 1973-07-27 1976-05-25 Spectrally sensitized positive light-sensitive o-quinone diazide containing composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8533273A JPS5619619B2 (enrdf_load_stackoverflow) 1973-07-27 1973-07-27

Publications (2)

Publication Number Publication Date
JPS5036203A true JPS5036203A (enrdf_load_stackoverflow) 1975-04-05
JPS5619619B2 JPS5619619B2 (enrdf_load_stackoverflow) 1981-05-08

Family

ID=13855667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8533273A Expired JPS5619619B2 (enrdf_load_stackoverflow) 1973-07-27 1973-07-27

Country Status (2)

Country Link
JP (1) JPS5619619B2 (enrdf_load_stackoverflow)
GB (1) GB1442934A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
EP0737895A1 (en) * 1995-04-10 1996-10-16 Shipley Company LLC Photoresist with photoactive compound mixtures
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
EP0737895A1 (en) * 1995-04-10 1996-10-16 Shipley Company LLC Photoresist with photoactive compound mixtures
US5723254A (en) * 1995-04-10 1998-03-03 Shipley Company, L.L.C. Photoresist with photoactive compound mixtures
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法

Also Published As

Publication number Publication date
GB1442934A (en) 1976-07-14
JPS5619619B2 (enrdf_load_stackoverflow) 1981-05-08

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