GB1424252A - Electrolytic method for making thin film tungsten-thorium alloy - Google Patents
Electrolytic method for making thin film tungsten-thorium alloyInfo
- Publication number
- GB1424252A GB1424252A GB4743973A GB4743973A GB1424252A GB 1424252 A GB1424252 A GB 1424252A GB 4743973 A GB4743973 A GB 4743973A GB 4743973 A GB4743973 A GB 4743973A GB 1424252 A GB1424252 A GB 1424252A
- Authority
- GB
- United Kingdom
- Prior art keywords
- alloy
- electro
- plating
- posts
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
1424252 Electro-plating tungsten-thorium alloy INTERNATIONAL BUSINESS MACHINES CORP 11 Oct 1973 [23 Feb 1973] 47439/73 Heading C7B [Also in Divisions G5 and H1] A thin-film alloy of W-Th is electro-plated on a substrate of which at least part is conductive from a heated aqueous solution containing WO 3 and Na 3 PO 4 , to which is gradually added aqueous Th(SO 4 ) 2 during plating. The basic substrate may be temporary, semitemporary or permanent. As described, a Cu layer 6 on Al 2 O 3 base 4, through which project electro-deposited Au pins 5 with their other ends flush with the Cu surface, is coated with a photo-resist to leave conductive paths 6' connecting pairs of posts 5. The W-Th alloy is deposited on 6' and the Cu etched away leaving the alloy supported on the posts in a form useful as part of a rectangular array of similar films in an incandescent filament character display device. Alternatively the entire Cu layer may be W-Th plated, a resist applied as before and the unwanted Cu and Th-W alloy etched, the latter with NaOH-K 3 Fe(CN) 6 . Plating conditions specified are a temperature of 80C, a c.d. of 160 mA/cm<SP>2</SP> for 10-30 mins, with addition of 20 drops/min of 10% w/w Th(SO 4 ) 2 solution. The alloy may be annealed to the single crystal state.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US335199A US3859176A (en) | 1973-02-23 | 1973-02-23 | Method for making thin film tungsten-thorium alloy |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1424252A true GB1424252A (en) | 1976-02-11 |
Family
ID=23310700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4743973A Expired GB1424252A (en) | 1973-02-23 | 1973-10-11 | Electrolytic method for making thin film tungsten-thorium alloy |
Country Status (7)
Country | Link |
---|---|
US (1) | US3859176A (en) |
JP (1) | JPS49115937A (en) |
CA (1) | CA1037414A (en) |
DE (1) | DE2356958A1 (en) |
FR (1) | FR2190944B1 (en) |
GB (1) | GB1424252A (en) |
IT (1) | IT993936B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2117957A (en) * | 1982-02-22 | 1983-10-19 | British Aerospace | Testing of infra-red sensitive equipment |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4218744A (en) * | 1978-08-08 | 1980-08-19 | Avicon Development Group | Fuel flow consumption monitoring system |
US4432839A (en) * | 1981-06-18 | 1984-02-21 | Diamond Shamrock Corporation | Method for making metallided foils |
US6200453B1 (en) * | 1997-10-20 | 2001-03-13 | Rajev R. Agarrwal | Monolith electroplating process |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2160322A (en) * | 1934-09-18 | 1939-05-30 | Tungsten Electrodeposit Corp | Electrodeposition of tungsten alloys |
US2160321A (en) * | 1936-02-06 | 1939-05-30 | Tungsten Electrodeposit Corp | Electrodeposition of tungsten alloys |
US3322653A (en) * | 1958-03-17 | 1967-05-30 | Rca Corp | Method of making a two sided storage electrode |
-
1973
- 1973-02-23 US US335199A patent/US3859176A/en not_active Expired - Lifetime
- 1973-09-25 IT IT29337/73A patent/IT993936B/en active
- 1973-10-11 GB GB4743973A patent/GB1424252A/en not_active Expired
- 1973-10-15 FR FR7338165A patent/FR2190944B1/fr not_active Expired
- 1973-10-18 JP JP48116449A patent/JPS49115937A/ja active Pending
- 1973-10-26 CA CA184,353A patent/CA1037414A/en not_active Expired
- 1973-11-15 DE DE2356958A patent/DE2356958A1/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2117957A (en) * | 1982-02-22 | 1983-10-19 | British Aerospace | Testing of infra-red sensitive equipment |
Also Published As
Publication number | Publication date |
---|---|
CA1037414A (en) | 1978-08-29 |
FR2190944B1 (en) | 1976-06-18 |
DE2356958A1 (en) | 1974-08-29 |
US3859176A (en) | 1975-01-07 |
JPS49115937A (en) | 1974-11-06 |
IT993936B (en) | 1975-09-30 |
FR2190944A1 (en) | 1974-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |