GB1336615A - Method of making metal patterns - Google Patents
Method of making metal patternsInfo
- Publication number
- GB1336615A GB1336615A GB1546871A GB1546871A GB1336615A GB 1336615 A GB1336615 A GB 1336615A GB 1546871 A GB1546871 A GB 1546871A GB 1546871 A GB1546871 A GB 1546871A GB 1336615 A GB1336615 A GB 1336615A
- Authority
- GB
- United Kingdom
- Prior art keywords
- grid
- master pattern
- conducting film
- metal
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J19/00—Details of vacuum tubes of the types covered by group H01J21/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2893/00—Discharge tubes and lamps
- H01J2893/0001—Electrodes and electrode systems suitable for discharge tubes or lamps
- H01J2893/0012—Constructional arrangements
- H01J2893/0019—Chemical composition and manufacture
- H01J2893/0022—Manufacture
Landscapes
- Electroplating Methods And Accessories (AREA)
- ing And Chemical Polishing (AREA)
- Chemically Coating (AREA)
Abstract
1336615 Depositing a metal grid R C A CORPORATION 18 May 1971 [18 May 1970] 15468/71 Heading C7B A method of making a metal grid e.g. for an electron tube comprises forming a conducting film on an insulating substrate, selectively removing portions of the film e.g. by etching to form a master pattern, electro-depositing metal on the master pattern to form a grid, and stripping the deposited metal grid from the master pattern. The conducting film material is selected from Cr, Ta, W, SnO 2 , In 2 O 3 and the plating metal is one of Ni, Cu, Ag, Au and Pt. The insulating substrate may be glass or sapphire. The conducting film may be Cr 0À1 micron thick and be produced on the substrate by evaporation and cleaned in Caro's acid prior to applying a photo-resist. A grid pattern may be produced optically and the photo-resist developed exposing squares of the conducting film. These may then be removed by sputter etching or by chemically etching with a ceric sulphate, nitric acid mixture. The master pattern so produced may be plated for 80 sec at 70 Amp/ft<SP>2</SP>. The grid may be successively washed in dionized water, methanol and acetone and then peeled off the master pattern using tweezers. For plating Ni the electrolyte may be nickel chloride, nickel sulphonate, boric acid and naphthalene disulphonic acid, the acidity being adjusted to pH 3À2-4À2 by the addition of sulphonic acid.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US3795670A | 1970-05-18 | 1970-05-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1336615A true GB1336615A (en) | 1973-11-07 |
Family
ID=21897270
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1546871A Expired GB1336615A (en) | 1970-05-18 | 1971-05-18 | Method of making metal patterns |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS523890B1 (en) |
| CA (1) | CA947223A (en) |
| DE (1) | DE2124678C3 (en) |
| FR (1) | FR2091683A5 (en) |
| GB (1) | GB1336615A (en) |
| NL (1) | NL7106742A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114283994A (en) * | 2021-11-23 | 2022-04-05 | 华中科技大学 | Embedded metal grid flexible electrode film and preparation method and application thereof |
-
1971
- 1971-05-14 CA CA113084A patent/CA947223A/en not_active Expired
- 1971-05-17 FR FR7117737A patent/FR2091683A5/fr not_active Expired
- 1971-05-17 NL NL7106742A patent/NL7106742A/xx active Search and Examination
- 1971-05-17 JP JP3462371A patent/JPS523890B1/ja active Pending
- 1971-05-18 GB GB1546871A patent/GB1336615A/en not_active Expired
- 1971-05-18 DE DE19712124678 patent/DE2124678C3/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114283994A (en) * | 2021-11-23 | 2022-04-05 | 华中科技大学 | Embedded metal grid flexible electrode film and preparation method and application thereof |
| CN114283994B (en) * | 2021-11-23 | 2023-05-09 | 华中科技大学 | Embedded metal grid flexible electrode film and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2124678A1 (en) | 1971-12-02 |
| DE2124678B2 (en) | 1977-09-15 |
| JPS523890B1 (en) | 1977-01-31 |
| CA947223A (en) | 1974-05-14 |
| DE2124678C3 (en) | 1978-05-18 |
| FR2091683A5 (en) | 1972-01-14 |
| NL7106742A (en) | 1971-11-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |