GB1420526A - Method of manufacturing gas-tight tubes or reservoirs - Google Patents

Method of manufacturing gas-tight tubes or reservoirs

Info

Publication number
GB1420526A
GB1420526A GB3080973A GB3080973A GB1420526A GB 1420526 A GB1420526 A GB 1420526A GB 3080973 A GB3080973 A GB 3080973A GB 3080973 A GB3080973 A GB 3080973A GB 1420526 A GB1420526 A GB 1420526A
Authority
GB
United Kingdom
Prior art keywords
reservoir
tube
silicon
pyrolytic
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3080973A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of GB1420526A publication Critical patent/GB1420526A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
GB3080973A 1972-07-01 1973-06-28 Method of manufacturing gas-tight tubes or reservoirs Expired GB1420526A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7209294A NL7209294A (US20080293856A1-20081127-C00139.png) 1972-07-01 1972-07-01

Publications (1)

Publication Number Publication Date
GB1420526A true GB1420526A (en) 1976-01-07

Family

ID=19816451

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3080973A Expired GB1420526A (en) 1972-07-01 1973-06-28 Method of manufacturing gas-tight tubes or reservoirs

Country Status (10)

Country Link
JP (1) JPS4943880A (US20080293856A1-20081127-C00139.png)
AU (1) AU5740573A (US20080293856A1-20081127-C00139.png)
BE (1) BE801747A (US20080293856A1-20081127-C00139.png)
BR (1) BR7304772D0 (US20080293856A1-20081127-C00139.png)
DE (1) DE2330720C3 (US20080293856A1-20081127-C00139.png)
FR (1) FR2190946B1 (US20080293856A1-20081127-C00139.png)
GB (1) GB1420526A (US20080293856A1-20081127-C00139.png)
IT (1) IT990832B (US20080293856A1-20081127-C00139.png)
NL (1) NL7209294A (US20080293856A1-20081127-C00139.png)
SE (1) SE384537B (US20080293856A1-20081127-C00139.png)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0024305B1 (de) * 1979-08-16 1985-05-02 International Business Machines Corporation Verfahren zum Aufbringen von SiO2-Filmen mittels chemischen Niederschlagens aus der Dampfphase
DE3441056A1 (de) * 1984-11-09 1986-05-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200015A (en) * 1962-09-10 1965-08-10 United Aircraft Corp Process for coating high temperature alloys
FR1524841A (fr) * 1966-06-01 1968-05-10 Siemens Ag Procédé pour la préparation de nitrure de silicium attaquable chimiquement sous forme de couches minces
US3637423A (en) * 1969-02-10 1972-01-25 Westinghouse Electric Corp Pyrolytic deposition of silicon nitride films
DE1957952A1 (de) * 1969-11-18 1971-05-27 Siemens Ag Siliciumnitridbeschichtung an Quarzwaenden fuer Diffusions- und Oxydationsreaktoren

Also Published As

Publication number Publication date
NL7209294A (US20080293856A1-20081127-C00139.png) 1974-01-03
FR2190946A1 (US20080293856A1-20081127-C00139.png) 1974-02-01
DE2330720A1 (de) 1974-01-10
BR7304772D0 (pt) 1974-08-15
IT990832B (it) 1975-07-10
JPS4943880A (US20080293856A1-20081127-C00139.png) 1974-04-25
DE2330720B2 (de) 1978-05-24
AU5740573A (en) 1975-01-09
BE801747A (fr) 1974-01-02
FR2190946B1 (US20080293856A1-20081127-C00139.png) 1977-05-13
SE384537B (sv) 1976-05-10
DE2330720C3 (de) 1979-01-18

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee