GB1415426A - Method of antistatic treatment for photosensitive silver halide materials - Google Patents
Method of antistatic treatment for photosensitive silver halide materialsInfo
- Publication number
- GB1415426A GB1415426A GB5321073A GB5321073A GB1415426A GB 1415426 A GB1415426 A GB 1415426A GB 5321073 A GB5321073 A GB 5321073A GB 5321073 A GB5321073 A GB 5321073A GB 1415426 A GB1415426 A GB 1415426A
- Authority
- GB
- United Kingdom
- Prior art keywords
- condensate
- phenol
- glycidol
- formaldehyde
- terminally
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 silver halide Chemical class 0.000 title abstract 3
- 239000000463 material Substances 0.000 title 1
- 229910052709 silver Inorganic materials 0.000 title 1
- 239000004332 silver Substances 0.000 title 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 abstract 4
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 abstract 2
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical class O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 abstract 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical group OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical group 0.000 abstract 1
- 125000004970 halomethyl group Chemical group 0.000 abstract 1
- 229910000039 hydrogen halide Inorganic materials 0.000 abstract 1
- 239000012433 hydrogen halide Substances 0.000 abstract 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 150000002989 phenols Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/08—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols from phenol-aldehyde condensates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/04—Epoxynovolacs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
- G03C1/895—Polyalkylene oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47115641A JPS523293B2 (cg-RX-API-DMAC10.html) | 1972-11-20 | 1972-11-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1415426A true GB1415426A (en) | 1975-11-26 |
Family
ID=14667656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5321073A Expired GB1415426A (en) | 1972-11-20 | 1973-11-16 | Method of antistatic treatment for photosensitive silver halide materials |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3951662A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS523293B2 (cg-RX-API-DMAC10.html) |
| BR (1) | BR7309083D0 (cg-RX-API-DMAC10.html) |
| DE (1) | DE2357408A1 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1415426A (cg-RX-API-DMAC10.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4200465A (en) * | 1974-11-12 | 1980-04-29 | Konishiroku Photo Industry Co., Ltd. | Antistatic light-sensitive silver halide photographic element |
| US4073776A (en) * | 1975-01-28 | 1978-02-14 | Schenectady Chemicals, Inc. | Tackifiers for elastomers |
| JPS5459926A (en) * | 1977-10-21 | 1979-05-15 | Konishiroku Photo Ind Co Ltd | Photographic material having antistatic layer |
| US4529790A (en) * | 1983-08-12 | 1985-07-16 | Sumitomo Chemical Company, Limited | Epoxy resin composition |
| US5330823A (en) * | 1993-03-19 | 1994-07-19 | Xerox Corporation | Transparent recording sheets |
| JP2566535B2 (ja) * | 1994-05-09 | 1996-12-25 | 孝一郎 中間 | パターヘッド方向決め装置つきパターおよびパターの振り規正装置 |
| US6872501B2 (en) * | 2001-05-11 | 2005-03-29 | Eastman Kodak Company | Antistat of onium salt and polyether polymer |
| JP4841750B2 (ja) * | 2001-05-28 | 2011-12-21 | 株式会社Ａｄｅｋａ | 帯電防止剤、帯電防止剤組成物、帯電防止剤含浸物及び樹脂組成物 |
| JP5237692B2 (ja) * | 2008-05-21 | 2013-07-17 | 昭和電工株式会社 | モノマー、ポリマー、感光性樹脂組成物及びレジストパターンの形成方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3551152A (en) * | 1968-06-17 | 1970-12-29 | Gaf Corp | Antistatic photographic film |
| JPS494853B1 (cg-RX-API-DMAC10.html) * | 1969-03-14 | 1974-02-04 | ||
| JPS519610B1 (cg-RX-API-DMAC10.html) * | 1971-07-15 | 1976-03-29 |
-
1972
- 1972-11-20 JP JP47115641A patent/JPS523293B2/ja not_active Expired
-
1973
- 1973-11-15 US US05/416,184 patent/US3951662A/en not_active Expired - Lifetime
- 1973-11-16 DE DE2357408A patent/DE2357408A1/de active Pending
- 1973-11-16 GB GB5321073A patent/GB1415426A/en not_active Expired
- 1973-11-20 BR BR9083/73A patent/BR7309083D0/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE2357408A1 (de) | 1974-05-30 |
| JPS523293B2 (cg-RX-API-DMAC10.html) | 1977-01-27 |
| JPS4974929A (cg-RX-API-DMAC10.html) | 1974-07-19 |
| US3951662A (en) | 1976-04-20 |
| BR7309083D0 (pt) | 1974-09-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |