GB1363214A - Light-sensitive elements and imageforming method using the elements - Google Patents

Light-sensitive elements and imageforming method using the elements

Info

Publication number
GB1363214A
GB1363214A GB1087872A GB1087872A GB1363214A GB 1363214 A GB1363214 A GB 1363214A GB 1087872 A GB1087872 A GB 1087872A GB 1087872 A GB1087872 A GB 1087872A GB 1363214 A GB1363214 A GB 1363214A
Authority
GB
United Kingdom
Prior art keywords
elements
beta
imageforming
light
furyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1087872A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB1363214A publication Critical patent/GB1363214A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C205/00Compounds containing nitro groups bound to a carbon skeleton
    • C07C205/49Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
    • C07C205/56Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups bound to carbon atoms of six-membered aromatic rings and carboxyl groups bound to acyclic carbon atoms of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
GB1087872A 1971-03-08 1972-03-08 Light-sensitive elements and imageforming method using the elements Expired GB1363214A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46012311A JPS5040007B1 (enrdf_load_stackoverflow) 1971-03-08 1971-03-08

Publications (1)

Publication Number Publication Date
GB1363214A true GB1363214A (en) 1974-08-14

Family

ID=11801758

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1087872A Expired GB1363214A (en) 1971-03-08 1972-03-08 Light-sensitive elements and imageforming method using the elements

Country Status (4)

Country Link
JP (1) JPS5040007B1 (enrdf_load_stackoverflow)
DE (1) DE2211242A1 (enrdf_load_stackoverflow)
FR (1) FR2128716B1 (enrdf_load_stackoverflow)
GB (1) GB1363214A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2933871A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB989201A (en) * 1961-12-18 1965-04-14 Robertson Co H H Ethylenically unsaturated hydroxy esters
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
US3445545A (en) * 1966-12-12 1969-05-20 Nat Starch Chem Corp Ethylenically unsaturated derivatives of cinnamic acid and light resistant polymers prepared therefrom

Also Published As

Publication number Publication date
FR2128716B1 (enrdf_load_stackoverflow) 1976-03-05
DE2211242A1 (de) 1972-09-14
FR2128716A1 (enrdf_load_stackoverflow) 1972-10-20
JPS5040007B1 (enrdf_load_stackoverflow) 1975-12-20

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee