JPS5040007B1 - - Google Patents

Info

Publication number
JPS5040007B1
JPS5040007B1 JP1231171A JP1231171A JPS5040007B1 JP S5040007 B1 JPS5040007 B1 JP S5040007B1 JP 1231171 A JP1231171 A JP 1231171A JP 1231171 A JP1231171 A JP 1231171A JP S5040007 B1 JPS5040007 B1 JP S5040007B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1231171A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1231171A priority Critical patent/JPS5040007B1/ja
Priority to FR7207955A priority patent/FR2128716B1/fr
Priority to GB1087872A priority patent/GB1363214A/en
Priority to DE19722211242 priority patent/DE2211242A1/de
Publication of JPS5040007B1 publication Critical patent/JPS5040007B1/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C205/00Compounds containing nitro groups bound to a carbon skeleton
    • C07C205/49Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
    • C07C205/56Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups bound to carbon atoms of six-membered aromatic rings and carboxyl groups bound to acyclic carbon atoms of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP1231171A 1971-03-08 1971-03-08 Pending JPS5040007B1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1231171A JPS5040007B1 (ja) 1971-03-08 1971-03-08
FR7207955A FR2128716B1 (ja) 1971-03-08 1972-03-08
GB1087872A GB1363214A (en) 1971-03-08 1972-03-08 Light-sensitive elements and imageforming method using the elements
DE19722211242 DE2211242A1 (de) 1971-03-08 1972-03-08 Verfahren zur Bildherstellung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1231171A JPS5040007B1 (ja) 1971-03-08 1971-03-08

Publications (1)

Publication Number Publication Date
JPS5040007B1 true JPS5040007B1 (ja) 1975-12-20

Family

ID=11801758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1231171A Pending JPS5040007B1 (ja) 1971-03-08 1971-03-08

Country Status (4)

Country Link
JP (1) JPS5040007B1 (ja)
DE (1) DE2211242A1 (ja)
FR (1) FR2128716B1 (ja)
GB (1) GB1363214A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2933871A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB989201A (en) * 1961-12-18 1965-04-14 Robertson Co H H Ethylenically unsaturated hydroxy esters
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
US3445545A (en) * 1966-12-12 1969-05-20 Nat Starch Chem Corp Ethylenically unsaturated derivatives of cinnamic acid and light resistant polymers prepared therefrom

Also Published As

Publication number Publication date
FR2128716A1 (ja) 1972-10-20
FR2128716B1 (ja) 1976-03-05
GB1363214A (en) 1974-08-14
DE2211242A1 (de) 1972-09-14

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