GB1356210A - Photomask - Google Patents

Photomask

Info

Publication number
GB1356210A
GB1356210A GB5402572A GB5402572A GB1356210A GB 1356210 A GB1356210 A GB 1356210A GB 5402572 A GB5402572 A GB 5402572A GB 5402572 A GB5402572 A GB 5402572A GB 1356210 A GB1356210 A GB 1356210A
Authority
GB
United Kingdom
Prior art keywords
torr
sec
pressure
substrate temperature
photomasks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5402572A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1356210A publication Critical patent/GB1356210A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/20—Patched hole or depression
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/22—Nonparticulate element embedded or inlaid in substrate and visible
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)
GB5402572A 1971-12-27 1972-11-22 Photomask Expired GB1356210A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US212258A US3895147A (en) 1971-12-27 1971-12-27 Fabrication mask using divalent rare earth element

Publications (1)

Publication Number Publication Date
GB1356210A true GB1356210A (en) 1974-06-12

Family

ID=22790258

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5402572A Expired GB1356210A (en) 1971-12-27 1972-11-22 Photomask

Country Status (5)

Country Link
US (1) US3895147A (enExample)
JP (1) JPS5443873B2 (enExample)
DE (1) DE2261119A1 (enExample)
FR (1) FR2165973B1 (enExample)
GB (1) GB1356210A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4049347A (en) * 1976-03-24 1977-09-20 General Electric Company Scratch-resistant mask for photolithographic processing
US4390273A (en) * 1981-02-17 1983-06-28 Censor Patent-Und Versuchsanstalt Projection mask as well as a method and apparatus for the embedding thereof and projection printing system
US5481400A (en) * 1993-11-09 1996-01-02 Hughes Aircraft Company Survivable window grids
JP4084712B2 (ja) * 2003-06-23 2008-04-30 松下電器産業株式会社 パターン形成方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3110102A (en) * 1958-10-31 1963-11-12 North American Aviation Inc Method of fusion joining employing stop-off material
US3418036A (en) * 1964-11-16 1968-12-24 Ibm Magneto-optical rotation device with europium chalcogenide magneto-optical elements
US3567308A (en) * 1966-12-22 1971-03-02 Ibm Rare-earth chalcogenide magneto-optical elements with protective layers
US3508982A (en) * 1967-01-03 1970-04-28 Itt Method of making an ultra-violet selective template
US3488286A (en) * 1968-08-01 1970-01-06 Ibm Method of producing high curie temperature euo single crystals
US3607679A (en) * 1969-05-05 1971-09-21 Bell Telephone Labor Inc Method for the fabrication of discrete rc structure
US3591465A (en) * 1969-09-15 1971-07-06 Us Navy Selective silicon groove etching using a tantalum oxide mask formed at room temperatures
US3681227A (en) * 1970-06-29 1972-08-01 Corning Glass Works Microcircuit mask and method
US3661436A (en) * 1970-06-30 1972-05-09 Ibm Transparent fabrication masks utilizing masking material selected from the group consisting of spinels, perovskites, garnets, fluorides and oxy-fluorides

Also Published As

Publication number Publication date
FR2165973B1 (enExample) 1977-08-05
DE2261119A1 (de) 1973-07-12
US3895147A (en) 1975-07-15
FR2165973A1 (enExample) 1973-08-10
JPS4877769A (enExample) 1973-10-19
JPS5443873B2 (enExample) 1979-12-22

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee