GB1351513A - Reflecting mirror type electron microscope - Google Patents
Reflecting mirror type electron microscopeInfo
- Publication number
- GB1351513A GB1351513A GB2129171A GB2129171A GB1351513A GB 1351513 A GB1351513 A GB 1351513A GB 2129171 A GB2129171 A GB 2129171A GB 2129171 A GB2129171 A GB 2129171A GB 1351513 A GB1351513 A GB 1351513A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrons
- reflected
- specimen
- semi
- detector means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 230000000694 effects Effects 0.000 abstract 1
- 238000005286 illumination Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 230000001360 synchronised effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/29—Reflection microscopes
- H01J37/292—Reflection microscopes using scanning ray
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2444—Electron Multiplier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
- H01J2237/24465—Sectored detectors, e.g. quadrants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1081370A JPS4831685B1 (ja) | 1970-02-07 | 1970-02-07 | |
JP2677770A JPS498449B1 (ja) | 1970-03-30 | 1970-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1351513A true GB1351513A (en) | 1974-05-01 |
Family
ID=26346152
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2129171A Expired GB1351513A (en) | 1970-02-07 | 1971-04-19 | Reflecting mirror type electron microscope |
Country Status (4)
Country | Link |
---|---|
US (1) | US3714425A (ja) |
DE (1) | DE2105455A1 (ja) |
GB (1) | GB1351513A (ja) |
NL (1) | NL7100609A (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1447983A (en) * | 1973-01-10 | 1976-09-02 | Nat Res Dev | Detector for electron microscopes |
FR2220871B1 (ja) * | 1973-07-27 | 1978-01-20 | Jeol Ltd | |
JPS5243058B2 (ja) * | 1974-04-22 | 1977-10-28 | ||
US4376249A (en) * | 1980-11-06 | 1983-03-08 | International Business Machines Corporation | Variable axis electron beam projection system |
DE3888712D1 (de) * | 1987-02-02 | 1994-05-05 | Integrated Circuit Testing | Detektorobjectiv für Rastermikroskope. |
JP2927627B2 (ja) * | 1992-10-20 | 1999-07-28 | 株式会社日立製作所 | 走査電子顕微鏡 |
EP0769799B1 (en) * | 1995-10-19 | 2010-02-17 | Hitachi, Ltd. | Scanning electron microscope |
DE19543652C1 (de) * | 1995-11-23 | 1997-01-09 | Focus Gmbh | Reflexionselektronenmikroskop |
AU8746998A (en) | 1997-08-19 | 1999-03-08 | Nikon Corporation | Object observation device and object observation method |
JP3534582B2 (ja) * | 1997-10-02 | 2004-06-07 | 株式会社日立製作所 | パターン欠陥検査方法および検査装置 |
JP4093662B2 (ja) * | 1999-01-04 | 2008-06-04 | 株式会社日立製作所 | 走査形電子顕微鏡 |
US6633034B1 (en) * | 2000-05-04 | 2003-10-14 | Applied Materials, Inc. | Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors |
DE60111496T2 (de) * | 2001-04-24 | 2005-12-15 | Advantest Corp. | Rasterteilchenspiegelmikroskop |
JP3996774B2 (ja) * | 2002-01-09 | 2007-10-24 | 株式会社日立ハイテクノロジーズ | パターン欠陥検査方法及びパターン欠陥検査装置 |
DE60323909D1 (de) * | 2002-08-13 | 2008-11-20 | Zeiss Carl Nts Gmbh | Teilchenoptischer Apparat und seine Verwendung als elektronenmikroskopisches System |
US7138629B2 (en) | 2003-04-22 | 2006-11-21 | Ebara Corporation | Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
JP2004363085A (ja) * | 2003-05-09 | 2004-12-24 | Ebara Corp | 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2464419A (en) * | 1947-12-26 | 1949-03-15 | Rca Corp | Method of and apparatus for selectively achieving electronic darkfield and bright field illumation |
US2901627A (en) * | 1953-02-19 | 1959-08-25 | Leitz Ernst Gmbh | Method of and apparatus for the electronic magnification of objects |
FR1306719A (fr) * | 1961-09-07 | 1962-10-19 | Csf | Détection et mesure de faisceaux de particules d'énergie élevée |
NL285495A (ja) * | 1961-11-18 | |||
GB1058037A (en) * | 1964-11-03 | 1967-02-08 | Jeol Ltd | Electron beam apparatus |
US3614311A (en) * | 1968-02-28 | 1971-10-19 | Hitachi Ltd | Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device |
-
1971
- 1971-01-18 NL NL7100609A patent/NL7100609A/xx unknown
- 1971-02-05 US US00112878A patent/US3714425A/en not_active Expired - Lifetime
- 1971-02-05 DE DE19712105455 patent/DE2105455A1/de active Pending
- 1971-04-19 GB GB2129171A patent/GB1351513A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US3714425A (en) | 1973-01-30 |
NL7100609A (ja) | 1971-08-10 |
DE2105455A1 (de) | 1971-08-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |