GB1329888A - Phenolic resin compositions containing it - Google Patents

Phenolic resin compositions containing it

Info

Publication number
GB1329888A
GB1329888A GB4331271A GB4331271A GB1329888A GB 1329888 A GB1329888 A GB 1329888A GB 4331271 A GB4331271 A GB 4331271A GB 4331271 A GB4331271 A GB 4331271A GB 1329888 A GB1329888 A GB 1329888A
Authority
GB
United Kingdom
Prior art keywords
diazide
sulphonyl chloride
hcho
benzoquinone
sept
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4331271A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of GB1329888A publication Critical patent/GB1329888A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB4331271A 1970-09-16 1971-09-16 Phenolic resin compositions containing it Expired GB1329888A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8050570A JPS505083B1 (de) 1970-09-16 1970-09-16

Publications (1)

Publication Number Publication Date
GB1329888A true GB1329888A (en) 1973-09-12

Family

ID=13720154

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4331271A Expired GB1329888A (en) 1970-09-16 1971-09-16 Phenolic resin compositions containing it

Country Status (3)

Country Link
JP (1) JPS505083B1 (de)
DE (1) DE2146167A1 (de)
GB (1) GB1329888A (de)

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3009873A1 (de) * 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
US4306010A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
US4306011A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive composite and photosensitive lithographic printing plate
US4407926A (en) 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
EP0168065A1 (de) * 1984-05-18 1986-01-15 Rütgerswerke Aktiengesellschaft Strahlungshärtendes Bindemittel und Verfahren zur Herstellung flächiger Gebilde
US4632900A (en) * 1984-03-07 1986-12-30 Ciba-Geigy Corporation Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
US4681923A (en) * 1985-03-02 1987-07-21 Ciba-Geigy Corporation Modified quinone-diazide group-containing phenolic novolak resins
US4839253A (en) * 1984-12-01 1989-06-13 Ciba-Geigy Corporation Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group
EP0565006A2 (de) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung einer vorsensibilisierten Platte
EP0713143A2 (de) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Flachdruckplatte
EP0780730A2 (de) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positiv arbeitende lichtempfindliche Druckplatte
EP1640173A1 (de) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer.
EP1690685A2 (de) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer
EP1705004A1 (de) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer
EP1925447A1 (de) 2002-09-17 2008-05-28 FUJIFILM Corporation Bildaufzeichnungsmaterial
EP2036721A1 (de) 2000-11-30 2009-03-18 FUJIFILM Corporation Flachdruckplattenvorläufer
EP2042306A2 (de) 2007-09-28 2009-04-01 FUJIFILM Corporation Planografischer Druckplatten-Vorläufer und Verfahren zur Herstellung eines Copolymers, das darin verwendet wird
EP2042340A2 (de) 2007-09-27 2009-04-01 Fujifilm Corporation Mittel zum Schutz der Oberfläche einer lithografischen Druckplatte und Plattenherstellungsverfahren für Lithografiedruckplatten
EP2042308A2 (de) 2007-09-27 2009-04-01 FUJIFILM Corporation Flachdruckplattenvorläufer
EP2042310A2 (de) 2007-09-27 2009-04-01 FUJIFILM Corporation Flachdruckplattenvorläufer
EP2042305A2 (de) 2007-09-28 2009-04-01 FUJIFILM Corporation Flachdruckplattenvorläufer
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
EP2105690A2 (de) 2008-03-26 2009-09-30 Fujifilm Corporation Verfahren und Vorrichtung zum Trocknen
EP2106907A2 (de) 2008-04-02 2009-10-07 FUJIFILM Corporation Flachdruckplattenvorläufer
EP2161129A2 (de) 2008-09-09 2010-03-10 Fujifilm Corporation Lichtempfindliche Lithografiedruckplattenvorläufer für Infrarotlaser
EP2236293A2 (de) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithografiedruckplattenvorläufer
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
EP2381312A2 (de) 2000-08-25 2011-10-26 Fujifilm Corporation Alkalin-Flüssigkeitsenwickler für eine Flachdruckplatte und Verfahren zum Herstellen einer Flachdruckplatte
EP2641738A2 (de) 2012-03-23 2013-09-25 Fujifilm Corporation Verfahren zur Herstellung einer Flachdruckplatte sowie Flachdruckplatte
EP2644379A1 (de) 2012-03-30 2013-10-02 FUJIFILM Corporation Verfahren zur Herstellung einer Flachdruckplatte

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635854B2 (de) * 1973-08-03 1981-08-20
JPS5723253B2 (de) * 1974-03-25 1982-05-18
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
EP0070624B1 (de) * 1981-06-22 1986-11-20 Philip A. Hunt Chemical Corporation Novolak-Harz und eine dieses enthaltende positive "Photoresist"-Mischung
JPS5988734A (ja) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd 感光性組成物

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3009873A1 (de) * 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
US4306010A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
US4306011A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive composite and photosensitive lithographic printing plate
US4407926A (en) 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
US4632900A (en) * 1984-03-07 1986-12-30 Ciba-Geigy Corporation Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface
EP0168065A1 (de) * 1984-05-18 1986-01-15 Rütgerswerke Aktiengesellschaft Strahlungshärtendes Bindemittel und Verfahren zur Herstellung flächiger Gebilde
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
US4839253A (en) * 1984-12-01 1989-06-13 Ciba-Geigy Corporation Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group
US4681923A (en) * 1985-03-02 1987-07-21 Ciba-Geigy Corporation Modified quinone-diazide group-containing phenolic novolak resins
EP0565006A2 (de) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung einer vorsensibilisierten Platte
EP0713143A2 (de) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Flachdruckplatte
EP0780730A2 (de) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positiv arbeitende lichtempfindliche Druckplatte
EP2381312A2 (de) 2000-08-25 2011-10-26 Fujifilm Corporation Alkalin-Flüssigkeitsenwickler für eine Flachdruckplatte und Verfahren zum Herstellen einer Flachdruckplatte
EP2036721A1 (de) 2000-11-30 2009-03-18 FUJIFILM Corporation Flachdruckplattenvorläufer
EP1925447A1 (de) 2002-09-17 2008-05-28 FUJIFILM Corporation Bildaufzeichnungsmaterial
EP1640173A1 (de) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer.
EP1690685A2 (de) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer
EP1705004A1 (de) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer
EP2042340A2 (de) 2007-09-27 2009-04-01 Fujifilm Corporation Mittel zum Schutz der Oberfläche einer lithografischen Druckplatte und Plattenherstellungsverfahren für Lithografiedruckplatten
EP2042308A2 (de) 2007-09-27 2009-04-01 FUJIFILM Corporation Flachdruckplattenvorläufer
EP2042310A2 (de) 2007-09-27 2009-04-01 FUJIFILM Corporation Flachdruckplattenvorläufer
EP2042306A2 (de) 2007-09-28 2009-04-01 FUJIFILM Corporation Planografischer Druckplatten-Vorläufer und Verfahren zur Herstellung eines Copolymers, das darin verwendet wird
EP2042305A2 (de) 2007-09-28 2009-04-01 FUJIFILM Corporation Flachdruckplattenvorläufer
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
EP2105690A2 (de) 2008-03-26 2009-09-30 Fujifilm Corporation Verfahren und Vorrichtung zum Trocknen
EP2106907A2 (de) 2008-04-02 2009-10-07 FUJIFILM Corporation Flachdruckplattenvorläufer
EP2161129A2 (de) 2008-09-09 2010-03-10 Fujifilm Corporation Lichtempfindliche Lithografiedruckplattenvorläufer für Infrarotlaser
EP2236293A2 (de) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithografiedruckplattenvorläufer
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
EP2641738A2 (de) 2012-03-23 2013-09-25 Fujifilm Corporation Verfahren zur Herstellung einer Flachdruckplatte sowie Flachdruckplatte
EP2644379A1 (de) 2012-03-30 2013-10-02 FUJIFILM Corporation Verfahren zur Herstellung einer Flachdruckplatte

Also Published As

Publication number Publication date
JPS505083B1 (de) 1975-02-28
DE2146167A1 (de) 1972-03-23

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees