GB1330932A - Phenolic resin condensation product and light-sensitive compositions containing it - Google Patents

Phenolic resin condensation product and light-sensitive compositions containing it

Info

Publication number
GB1330932A
GB1330932A GB4324871A GB4324871A GB1330932A GB 1330932 A GB1330932 A GB 1330932A GB 4324871 A GB4324871 A GB 4324871A GB 4324871 A GB4324871 A GB 4324871A GB 1330932 A GB1330932 A GB 1330932A
Authority
GB
United Kingdom
Prior art keywords
resin
hcho
light
tetrahydroxy
prepared
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4324871A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of GB1330932A publication Critical patent/GB1330932A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1330932 Phenolic resin KONISHIROKU PHOTO INDUSTRY CO Ltd 16 Sept 1971 [16 Sept 1970] 43248/71 Heading C3R [Also in Division G2] A condensation product is obtained by reacting (i) a sulphonyl chloride of o-benzoquinonediazide or o-naphthoquinonediazide with (ii) a bisphenol-formaldehyde resin selected from the formulae wherein x represents -CH 2 -, -O-, -S-, -SO-, or -SO 2 -, or a methylene group in which one or both hydrogen atoms are substituted by an alkyl or aryl group or a carboxyalkyl group whose carboxyl portion may be esterified or amidated, or a cyclic alkylene group; each of R 1 and R 2 which may be the same or different, represents a hydrogen atom or a C 1-4 alkyl, alkoxy, carboalkoxy, carboxy or hydroxy group, and n is at least 2. The resin can be prepared by condensing HCHO and the bisphenol preferably in a molar ratio of 0À85 to 1À0 mole, using an acid catalyst, e.g. HCl or oxalic acid or an alkaline catalyst, e.g. NaOH or NH 4 OH. In the examples resins are prepared in ethanol solution from HCHO and (1) 4,4<SP>1</SP>-isopropylidenediphenol and (2) 2,2<SP>1</SP>,4,4<SP>1</SP>-tetrahydroxy-6-6<SP>1</SP>- dimethyldiphenylethane; and condensation products are obtained by reacting 1,2-naphthoquinone - 2 - diazide - 4 - (or 5) - sulphonyl chloride with (i) resin (1), (ii) resin 2, (iii) 2,2<SP>1</SP>- 4,41 - tetrahydroxy - diphenylpropane (1,1)- HCHO resin, (iv) 2,2<SP>1</SP>,4,4<SP>1</SP>- tetrahydroxy-6,6<SP>1</SP>- dimethyldiphenylethane HCHO resin, (v) 4,4-<SP>1</SP> bis - (p - hydroxyphenyl) butyric acid-HCHO resin, (vi) 2,2<SP>1</SP>,4,4<SP>1</SP>-tetrahydroxydiphenyl-sulphide-HCHO resin, using dioxane as solvent in the presence of Na 2 CO 3 at a pH below 8. Light-sensitive compositions can be prepared by dissolving the product and optionally an alkaline soluble novolak resin in an organic solvent such as acetone, dioxane or methoxy- or ethoxy-ethanol. A dye such as Methyl Violet may also be added. Uses.-Light-sensitive materials for printing plates.
GB4324871A 1970-09-16 1971-09-16 Phenolic resin condensation product and light-sensitive compositions containing it Expired GB1330932A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8050970A JPS505084B1 (en) 1970-09-16 1970-09-16

Publications (1)

Publication Number Publication Date
GB1330932A true GB1330932A (en) 1973-09-19

Family

ID=13720268

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4324871A Expired GB1330932A (en) 1970-09-16 1971-09-16 Phenolic resin condensation product and light-sensitive compositions containing it

Country Status (3)

Country Link
JP (1) JPS505084B1 (en)
DE (1) DE2146166A1 (en)
GB (1) GB1330932A (en)

Cited By (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981000772A1 (en) * 1979-09-05 1981-03-19 Minnesota Mining & Mfg Single sheet color proofing diazo oxide system
US4306010A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
US4306011A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive composite and photosensitive lithographic printing plate
US4424270A (en) 1981-01-03 1984-01-03 Hoechst Aktiengesellschaft Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester
US4439511A (en) * 1981-07-14 1984-03-27 Hoechst Aktiengesellschaft Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
US4632900A (en) * 1984-03-07 1986-12-30 Ciba-Geigy Corporation Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface
US4681923A (en) * 1985-03-02 1987-07-21 Ciba-Geigy Corporation Modified quinone-diazide group-containing phenolic novolak resins
US4839253A (en) * 1984-12-01 1989-06-13 Ciba-Geigy Corporation Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group
US4873169A (en) * 1986-08-27 1989-10-10 Hoechst Aktiengesellschaft Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate
WO2004035687A1 (en) * 2002-10-15 2004-04-29 Agfa-Gevaert Polymer for heat-sensitive lithographic printing plate precursor
EP1640173A1 (en) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1690685A2 (en) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1705004A1 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1925447A1 (en) 2002-09-17 2008-05-28 FUJIFILM Corporation Image forming material
EP2036721A1 (en) 2000-11-30 2009-03-18 FUJIFILM Corporation Planographic printing plate precursor
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2042305A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042310A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042306A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor and method of producing a copolymer used therein
EP2042308A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
WO2009063824A1 (en) 2007-11-14 2009-05-22 Fujifilm Corporation Method of drying coating film and process for producing lithographic printing plate precursor
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
EP2106907A2 (en) 2008-04-02 2009-10-07 FUJIFILM Corporation Planographic printing plate precursor
EP2161129A2 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Photosensitive lithographic printing plate precursor for infrared laser
EP2236293A2 (en) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithographic printing plate precursor
WO2011037005A1 (en) 2009-09-24 2011-03-31 富士フイルム株式会社 Lithographic printing original plate
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP2641738A2 (en) 2012-03-23 2013-09-25 Fujifilm Corporation Method of producing planographic printing plate and planographic printing plate
EP2644379A1 (en) 2012-03-30 2013-10-02 FUJIFILM Corporation Method of producing a planographic printing plate

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists
DE3935876A1 (en) * 1989-10-27 1991-05-02 Basf Ag RADIATION-SENSITIVE MIXTURE
WO2008114766A1 (en) * 2007-03-12 2008-09-25 Tohto Kasei Co., Ltd. Novel polyvalent hydroxy compound, method for producing the compound, epoxy resin and epoxy resin composition each using the compound, and cured product of the composition
JP7110979B2 (en) * 2016-07-21 2022-08-02 三菱瓦斯化学株式会社 Compound, resin, composition, resist pattern forming method and circuit pattern forming method

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4306010A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
US4306011A (en) * 1979-06-16 1981-12-15 Konishiroku Photo Industry Co., Ltd. Photosensitive composite and photosensitive lithographic printing plate
WO1981000772A1 (en) * 1979-09-05 1981-03-19 Minnesota Mining & Mfg Single sheet color proofing diazo oxide system
US4260673A (en) * 1979-09-05 1981-04-07 Minnesota Mining And Manufacturing Company Single sheet color proofing system
US4424270A (en) 1981-01-03 1984-01-03 Hoechst Aktiengesellschaft Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester
US4555469A (en) * 1981-01-03 1985-11-26 Hoechst Aktiengesellschaft Process of preparing light-sensitive naphthoquinonediazidesulfonic acid ester
US4439511A (en) * 1981-07-14 1984-03-27 Hoechst Aktiengesellschaft Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom
US4632900A (en) * 1984-03-07 1986-12-30 Ciba-Geigy Corporation Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
US4839253A (en) * 1984-12-01 1989-06-13 Ciba-Geigy Corporation Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group
US4681923A (en) * 1985-03-02 1987-07-21 Ciba-Geigy Corporation Modified quinone-diazide group-containing phenolic novolak resins
US4873169A (en) * 1986-08-27 1989-10-10 Hoechst Aktiengesellschaft Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP2036721A1 (en) 2000-11-30 2009-03-18 FUJIFILM Corporation Planographic printing plate precursor
EP1925447A1 (en) 2002-09-17 2008-05-28 FUJIFILM Corporation Image forming material
WO2004035687A1 (en) * 2002-10-15 2004-04-29 Agfa-Gevaert Polymer for heat-sensitive lithographic printing plate precursor
EP1640173A1 (en) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1690685A2 (en) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1705004A1 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2042310A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042308A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042305A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042306A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor and method of producing a copolymer used therein
WO2009063824A1 (en) 2007-11-14 2009-05-22 Fujifilm Corporation Method of drying coating film and process for producing lithographic printing plate precursor
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
EP2106907A2 (en) 2008-04-02 2009-10-07 FUJIFILM Corporation Planographic printing plate precursor
EP2161129A2 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Photosensitive lithographic printing plate precursor for infrared laser
EP2236293A2 (en) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithographic printing plate precursor
WO2011037005A1 (en) 2009-09-24 2011-03-31 富士フイルム株式会社 Lithographic printing original plate
EP2641738A2 (en) 2012-03-23 2013-09-25 Fujifilm Corporation Method of producing planographic printing plate and planographic printing plate
EP2644379A1 (en) 2012-03-30 2013-10-02 FUJIFILM Corporation Method of producing a planographic printing plate

Also Published As

Publication number Publication date
JPS505084B1 (en) 1975-02-28
DE2146166A1 (en) 1972-03-23

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees