GB1326889A - Fading resistants for colour photographic images - Google Patents
Fading resistants for colour photographic imagesInfo
- Publication number
- GB1326889A GB1326889A GB1812671A GB1812671A GB1326889A GB 1326889 A GB1326889 A GB 1326889A GB 1812671 A GB1812671 A GB 1812671A GB 1812671 A GB1812671 A GB 1812671A GB 1326889 A GB1326889 A GB 1326889A
- Authority
- GB
- United Kingdom
- Prior art keywords
- group
- formula
- aliphatic
- alkyl
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005562 fading Methods 0.000 title abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 5
- 125000001931 aliphatic group Chemical group 0.000 abstract 4
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- -1 oxyl radical Chemical class 0.000 abstract 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 3
- 150000003053 piperidines Chemical class 0.000 abstract 2
- 125000002252 acyl group Chemical group 0.000 abstract 1
- 125000002723 alicyclic group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000004429 atom Chemical group 0.000 abstract 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract 1
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/02—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements
- C07D295/027—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements containing only one hetero ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D211/40—Oxygen atoms
- C07D211/44—Oxygen atoms attached in position 4
- C07D211/46—Oxygen atoms attached in position 4 having a hydrogen atom as the second substituent in position 4
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/68—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D211/72—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, directly attached to ring carbon atoms
- C07D211/74—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/92—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with a hetero atom directly attached to the ring nitrogen atom
- C07D211/94—Oxygen atom, e.g. piperidine N-oxide
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/92—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with a hetero atom directly attached to the ring nitrogen atom
- C07D211/96—Sulfur atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/22—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with hetero atoms directly attached to ring nitrogen atoms
- C07D295/24—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/22—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with hetero atoms directly attached to ring nitrogen atoms
- C07D295/26—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
- C07D471/10—Spiro-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/576—Six-membered rings
- C07F9/59—Hydrogenated pyridine rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3432—Six-membered rings
- C08K5/3435—Piperidines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Hydrogenated Pyridines (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP45047023A JPS4920974B1 (es) | 1970-06-01 | 1970-06-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1326889A true GB1326889A (en) | 1973-08-15 |
Family
ID=12763568
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1812671A Expired GB1326889A (en) | 1970-06-01 | 1971-05-28 | Fading resistants for colour photographic images |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS4920974B1 (es) |
| CA (1) | CA936164A (es) |
| DE (1) | DE2126954A1 (es) |
| GB (1) | GB1326889A (es) |
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3998640A (en) * | 1973-06-05 | 1976-12-21 | Eastman Kodak Company | Photographic elements containing N-oxide oxidants |
| US4088488A (en) | 1973-06-05 | 1978-05-09 | Eastman Kodak Company | Photographic elements containing nitroxyl radical oxidants |
| US4124387A (en) | 1977-07-11 | 1978-11-07 | Eastman Kodak Company | Positive images in photothermographic materials containing nitroxyl compounds |
| US4177186A (en) * | 1975-05-28 | 1979-12-04 | Ciba-Geigy Corporation | Stabilization of light-sensitive polymers |
| US4369321A (en) | 1979-12-21 | 1983-01-18 | Chimosa Chimica Organica S.P.A. | Piperidine derivatives which are stabilizers for synthetic polymers |
| US4465757A (en) * | 1982-09-21 | 1984-08-14 | Ciba-Geigy A.G. | Recording material for color photography |
| US4465765A (en) * | 1982-08-18 | 1984-08-14 | Ciba-Geigy A.G. | Colorphotographic recording material |
| US4496649A (en) * | 1982-12-16 | 1985-01-29 | Ciba-Geigy Ag | Color-photographic recording material |
| US4584265A (en) * | 1982-11-18 | 1986-04-22 | Ciba-Geigy Ag | Color-photographic recording material |
| GB2180274A (en) * | 1985-09-09 | 1987-03-25 | Fuji Photo Film Co Ltd | Desensitizer compositions |
| EP0256537A2 (en) | 1986-08-15 | 1988-02-24 | Fuji Photo Film Co., Ltd. | Color print and a method for producing the same |
| GB2225015A (en) * | 1988-11-21 | 1990-05-23 | Commissariat Energie Atomique | Heterocyclic nitroxides |
| US5028519A (en) * | 1988-12-06 | 1991-07-02 | Fuji Photo Film Co., Ltd. | Silver halide color photosensitive material |
| GB2276620A (en) * | 1993-03-11 | 1994-10-05 | Ciba Geigy Ag | Hindered 4-silyloxy-piperidine compounds for use as light stabilisers |
| US5492804A (en) | 1994-06-30 | 1996-02-20 | Minnesota Mining And Manufacturing Company | Chromogenic leuco redox-dye-releasing compounds for photothermographic elements |
| US5492805A (en) | 1994-06-30 | 1996-02-20 | Minnesota Mining And Manufacturing Company | Blocked leuco dyes for photothermographic elements |
| US5492803A (en) | 1995-01-06 | 1996-02-20 | Minnesota Mining And Manufacturing Company | Hydrazide redox-dye-releasing compounds for photothermographic elements |
| EP0800113A2 (en) | 1996-04-05 | 1997-10-08 | Fuji Photo Film Co., Ltd. | Silver halide color photographic light-sensitive material |
| US5928857A (en) | 1994-11-16 | 1999-07-27 | Minnesota Mining And Manufacturing Company | Photothermographic element with improved adherence between layers |
| US6117624A (en) | 1993-06-04 | 2000-09-12 | Eastman Kodak Company | Infrared sensitized, photothermographic article |
| US6171707B1 (en) | 1994-01-18 | 2001-01-09 | 3M Innovative Properties Company | Polymeric film base having a coating layer of organic solvent based polymer with a fluorinated antistatic agent |
| WO2009136624A1 (ja) | 2008-05-09 | 2009-11-12 | 富士フイルム株式会社 | 紫外線吸収剤組成物 |
| TWI573789B (zh) * | 2011-04-21 | 2017-03-11 | 馬克專利公司 | 化合物及液晶介質 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1399240A (en) * | 1972-10-21 | 1975-06-25 | Ciba Geigy Ag | Substituted piperidinol derivatives and their use as stabilizers |
| JPS5471475U (es) * | 1977-10-31 | 1979-05-21 | ||
| DE2838364A1 (de) * | 1978-09-02 | 1980-03-13 | Hoechst Ag | Polyalkylpiperidindiole und verfahren zu ihrer herstellung |
| EP0114028B1 (de) * | 1982-12-16 | 1988-08-03 | Ciba-Geigy Ag | Farbphotographisches Aufzeichnungsmaterial |
| JPS6267536A (ja) * | 1985-09-19 | 1987-03-27 | Konishiroku Photo Ind Co Ltd | 写真要素 |
| FR2707990B1 (fr) * | 1993-07-20 | 1995-10-20 | Centre Nat Rech Scient | Nouvelles nitrones utilisables pour le piégeage des radicaux libres. |
| JP2010077228A (ja) | 2008-09-25 | 2010-04-08 | Fujifilm Corp | インク組成物、インクジェット記録方法、及び、印刷物 |
| DE102016005083A1 (de) | 2015-05-13 | 2016-11-17 | Merck Patent Gmbh | Flüssigkristallines Medium |
| RU2745265C2 (ru) * | 2019-09-12 | 2021-03-22 | Общество С Ограниченной Ответственностью "Валента - Интеллект" | Новые составы 2-(имидазол-4-ил)-этанамида пентандиовой-1,5 кислоты для лечения и профилактики вирусных заболеваний |
-
1970
- 1970-06-01 JP JP45047023A patent/JPS4920974B1/ja active Pending
-
1971
- 1971-05-28 GB GB1812671A patent/GB1326889A/en not_active Expired
- 1971-05-29 DE DE19712126954 patent/DE2126954A1/de active Pending
- 1971-05-31 CA CA114580A patent/CA936164A/en not_active Expired
Cited By (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3998640A (en) * | 1973-06-05 | 1976-12-21 | Eastman Kodak Company | Photographic elements containing N-oxide oxidants |
| US4088488A (en) | 1973-06-05 | 1978-05-09 | Eastman Kodak Company | Photographic elements containing nitroxyl radical oxidants |
| US4177186A (en) * | 1975-05-28 | 1979-12-04 | Ciba-Geigy Corporation | Stabilization of light-sensitive polymers |
| US4124387A (en) | 1977-07-11 | 1978-11-07 | Eastman Kodak Company | Positive images in photothermographic materials containing nitroxyl compounds |
| US4369321A (en) | 1979-12-21 | 1983-01-18 | Chimosa Chimica Organica S.P.A. | Piperidine derivatives which are stabilizers for synthetic polymers |
| US4465765A (en) * | 1982-08-18 | 1984-08-14 | Ciba-Geigy A.G. | Colorphotographic recording material |
| US4465757A (en) * | 1982-09-21 | 1984-08-14 | Ciba-Geigy A.G. | Recording material for color photography |
| US4584265A (en) * | 1982-11-18 | 1986-04-22 | Ciba-Geigy Ag | Color-photographic recording material |
| US4496649A (en) * | 1982-12-16 | 1985-01-29 | Ciba-Geigy Ag | Color-photographic recording material |
| GB2180274A (en) * | 1985-09-09 | 1987-03-25 | Fuji Photo Film Co Ltd | Desensitizer compositions |
| US4840927A (en) * | 1985-09-09 | 1989-06-20 | Fuji Photo Film Co., Ltd. | Desensitizer composition |
| GB2180274B (en) * | 1985-09-09 | 1989-08-16 | Fuji Photo Film Co Ltd | Densensitizer compositions for a color developer sheet |
| EP0256537A2 (en) | 1986-08-15 | 1988-02-24 | Fuji Photo Film Co., Ltd. | Color print and a method for producing the same |
| GB2225015A (en) * | 1988-11-21 | 1990-05-23 | Commissariat Energie Atomique | Heterocyclic nitroxides |
| GB2225015B (en) * | 1988-11-21 | 1992-07-15 | Commissariat Energie Atomique | Nitroxide radical,its production process and its use in magnetometry |
| US5028519A (en) * | 1988-12-06 | 1991-07-02 | Fuji Photo Film Co., Ltd. | Silver halide color photosensitive material |
| GB2276620A (en) * | 1993-03-11 | 1994-10-05 | Ciba Geigy Ag | Hindered 4-silyloxy-piperidine compounds for use as light stabilisers |
| GB2276620B (en) * | 1993-03-11 | 1996-11-13 | Ciba Geigy Ag | Novel polymethylpiperdine compounds containing silane groups and suitable for use as stabilizers for organic materials |
| US5463058A (en) * | 1993-03-11 | 1995-10-31 | Ciba-Geigy Corporation | Siloxane derivatives of 2,2,6,6-tetramethylpiperidine compounds as stabilizers |
| US6117624A (en) | 1993-06-04 | 2000-09-12 | Eastman Kodak Company | Infrared sensitized, photothermographic article |
| US6171707B1 (en) | 1994-01-18 | 2001-01-09 | 3M Innovative Properties Company | Polymeric film base having a coating layer of organic solvent based polymer with a fluorinated antistatic agent |
| US5696289A (en) | 1994-06-30 | 1997-12-09 | Minnesota Mining And Manufacturing Company | Blocked leuco dyes for photothermographic elements |
| US5705676A (en) | 1994-06-30 | 1998-01-06 | Minnesota Mining And Manufacturing Company | Chromogenic leuco redox-dye-releasing compounds for photothermographic elements |
| US5492805A (en) | 1994-06-30 | 1996-02-20 | Minnesota Mining And Manufacturing Company | Blocked leuco dyes for photothermographic elements |
| US5492804A (en) | 1994-06-30 | 1996-02-20 | Minnesota Mining And Manufacturing Company | Chromogenic leuco redox-dye-releasing compounds for photothermographic elements |
| US5928857A (en) | 1994-11-16 | 1999-07-27 | Minnesota Mining And Manufacturing Company | Photothermographic element with improved adherence between layers |
| US5492803A (en) | 1995-01-06 | 1996-02-20 | Minnesota Mining And Manufacturing Company | Hydrazide redox-dye-releasing compounds for photothermographic elements |
| EP0800113A2 (en) | 1996-04-05 | 1997-10-08 | Fuji Photo Film Co., Ltd. | Silver halide color photographic light-sensitive material |
| WO2009136624A1 (ja) | 2008-05-09 | 2009-11-12 | 富士フイルム株式会社 | 紫外線吸収剤組成物 |
| TWI573789B (zh) * | 2011-04-21 | 2017-03-11 | 馬克專利公司 | 化合物及液晶介質 |
| EP2514800B2 (de) † | 2011-04-21 | 2018-03-07 | Merck Patent GmbH | Verbindungen und flüssigkristallines Medium |
| US9920248B2 (en) | 2011-04-21 | 2018-03-20 | Merck Patent Gmbh | Compounds and liquid-crystalline medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4920974B1 (es) | 1974-05-29 |
| DE2126954A1 (de) | 1971-12-16 |
| CA936164A (en) | 1973-10-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |