GB1325822A - Alignment apparatus - Google Patents

Alignment apparatus

Info

Publication number
GB1325822A
GB1325822A GB2374571*A GB2374571A GB1325822A GB 1325822 A GB1325822 A GB 1325822A GB 2374571 A GB2374571 A GB 2374571A GB 1325822 A GB1325822 A GB 1325822A
Authority
GB
United Kingdom
Prior art keywords
wafer
mask
piston
socket
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2374571*A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1325822A publication Critical patent/GB1325822A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H10P72/57—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB2374571*A 1970-03-31 1971-04-19 Alignment apparatus Expired GB1325822A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2425770A 1970-03-31 1970-03-31

Publications (1)

Publication Number Publication Date
GB1325822A true GB1325822A (en) 1973-08-08

Family

ID=21819658

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2374571*A Expired GB1325822A (en) 1970-03-31 1971-04-19 Alignment apparatus

Country Status (5)

Country Link
US (1) US3645622A (enExample)
JP (1) JPS5123310B1 (enExample)
CA (1) CA936627A (enExample)
FR (1) FR2094914A5 (enExample)
GB (1) GB1325822A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4641625A (en) * 1984-10-10 1987-02-10 Industrial Trade Exchange, Inc. Fuel control system
CN104331116A (zh) * 2014-10-30 2015-02-04 中国科学院光电技术研究所 一种掩模与基底六自由度对准装置
US20190255758A1 (en) * 2018-02-21 2019-08-22 Himax Technologies Limited Molding apparatus and method
CN110323169A (zh) * 2018-03-28 2019-10-11 奇景光电股份有限公司 成型装置与方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3940211A (en) * 1971-03-22 1976-02-24 Kasper Instruments, Inc. Step-and-repeat projection alignment and exposure system
JPS5435653Y2 (enExample) * 1971-11-08 1979-10-29
US3937579A (en) * 1972-11-20 1976-02-10 Karl Suss Kg Process for the double-sided exposure of a semiconductor or substrate plates, especially wafers, as well as apparatus for the purpose of parallel and rotational alignment of such a plate
US3963346A (en) * 1975-04-28 1976-06-15 Veb Pentacon Dresden Microfilm cameras
US4007987A (en) * 1976-01-12 1977-02-15 Tamarack Scientific Co. Inc. Vacuum contact printing system and process for electronic circuit photomask replication
JPS5447581A (en) * 1977-09-22 1979-04-14 Hitachi Ltd Mask aligner
US4189230A (en) * 1977-10-26 1980-02-19 Fujitsu Limited Wafer holder with spring-loaded wafer-holding means
CH636740A5 (fr) * 1980-05-19 1983-06-15 Far Fab Assortiments Reunies Dispositif pour l'alignement d'une piece et d'un substrat.
JPS58173727A (ja) * 1982-04-05 1983-10-12 Canon Inc 密着焼付けにおける密着方法
JPS59154023A (ja) * 1983-02-22 1984-09-03 Nippon Kogaku Kk <Nikon> 板状体の姿勢制御装置
US5296916A (en) * 1991-04-18 1994-03-22 International Business Machines Corp. Mask alignment system for components with extremely sensitive surfaces
KR100208739B1 (ko) * 1993-07-08 1999-07-15 다나카 아키히로 작업편과 마스크의 간극설정방법 및 간극설정기구
EP0722122B1 (en) * 1995-01-10 1998-09-16 Ushiodenki Kabushiki Kaisha Process and device for adjusting the distance between a workpiece and a mask
JP2001332480A (ja) * 2000-05-24 2001-11-30 Canon Inc 原版チャック、該原版チャックを備えた露光装置および半導体デバイス製造方法
US20050194475A1 (en) * 2004-03-04 2005-09-08 Han-Ki Kim Inductively coupled plasma chemical vapor deposition apparatus
WO2009039208A1 (en) * 2007-09-17 2009-03-26 Twof, Inc. Supramolecular nanostamping printing device
US8633441B2 (en) * 2009-09-02 2014-01-21 Asm Assembly Automation Ltd Die bonding process incorporating infrared vision system

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3192844A (en) * 1963-03-05 1965-07-06 Kulicke And Soffa Mfg Company Mask alignment fixture
US3280715A (en) * 1964-06-11 1966-10-25 United Aircraft Corp Micropattern aligning device
US3475097A (en) * 1966-04-11 1969-10-28 Motorola Inc Mask alignment tool
US3499714A (en) * 1966-10-13 1970-03-10 Electroglas Inc Mask alignment apparatus
US3521955A (en) * 1968-03-13 1970-07-28 Kulicke & Soffa Ind Inc Chuck assembly and mask holder for an improved mask alignment machine

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4641625A (en) * 1984-10-10 1987-02-10 Industrial Trade Exchange, Inc. Fuel control system
CN104331116A (zh) * 2014-10-30 2015-02-04 中国科学院光电技术研究所 一种掩模与基底六自由度对准装置
CN104331116B (zh) * 2014-10-30 2015-12-02 中国科学院光电技术研究所 一种掩模与基底六自由度对准装置
US20190255758A1 (en) * 2018-02-21 2019-08-22 Himax Technologies Limited Molding apparatus and method
CN110323169A (zh) * 2018-03-28 2019-10-11 奇景光电股份有限公司 成型装置与方法
CN110323169B (zh) * 2018-03-28 2021-12-21 奇景光电股份有限公司 成型装置与方法

Also Published As

Publication number Publication date
JPS5123310B1 (enExample) 1976-07-15
US3645622A (en) 1972-02-29
FR2094914A5 (enExample) 1972-02-04
CA936627A (en) 1973-11-06

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee