JPS5435653Y2 - - Google Patents

Info

Publication number
JPS5435653Y2
JPS5435653Y2 JP1971103255U JP10325571U JPS5435653Y2 JP S5435653 Y2 JPS5435653 Y2 JP S5435653Y2 JP 1971103255 U JP1971103255 U JP 1971103255U JP 10325571 U JP10325571 U JP 10325571U JP S5435653 Y2 JPS5435653 Y2 JP S5435653Y2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1971103255U
Other languages
Japanese (ja)
Other versions
JPS4858066U (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1971103255U priority Critical patent/JPS5435653Y2/ja
Priority to US00304211A priority patent/US3830592A/en
Priority to DE2254665A priority patent/DE2254665B2/de
Publication of JPS4858066U publication Critical patent/JPS4858066U/ja
Application granted granted Critical
Publication of JPS5435653Y2 publication Critical patent/JPS5435653Y2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1971103255U 1971-11-08 1971-11-08 Expired JPS5435653Y2 (enExample)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1971103255U JPS5435653Y2 (enExample) 1971-11-08 1971-11-08
US00304211A US3830592A (en) 1971-11-08 1972-11-06 Semiconductor wafer positioning device
DE2254665A DE2254665B2 (en) 1971-11-08 1972-11-08 Alignment rig for projection photolithography - includes self centering subject table plus fine alignment controls

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1971103255U JPS5435653Y2 (enExample) 1971-11-08 1971-11-08

Publications (2)

Publication Number Publication Date
JPS4858066U JPS4858066U (enExample) 1973-07-24
JPS5435653Y2 true JPS5435653Y2 (enExample) 1979-10-29

Family

ID=14349320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1971103255U Expired JPS5435653Y2 (enExample) 1971-11-08 1971-11-08

Country Status (2)

Country Link
US (1) US3830592A (enExample)
JP (1) JPS5435653Y2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5566584A (en) * 1995-08-31 1996-10-22 Beta Squared, Inc. Flexure support for a fixture positioning device
WO1999041022A1 (en) * 1998-02-14 1999-08-19 Strasbaugh Accurate positioning of a wafer
US6364386B1 (en) 1999-10-27 2002-04-02 Agilent Technologies, Inc. Apparatus and method for handling an integrated circuit

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3521953A (en) * 1968-03-13 1970-07-28 Kulicke & Soffa Ind Inc Adjustable separation wafer clamp
US3645622A (en) * 1970-03-31 1972-02-29 Ibm Method and apparatus for aligning a photomask
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
US3705769A (en) * 1970-11-12 1972-12-12 Johannsmeier Karl Heinz Optical alignment and contact printing system with improved chuck assembly

Also Published As

Publication number Publication date
JPS4858066U (enExample) 1973-07-24
US3830592A (en) 1974-08-20

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