JPS5435653Y2 - - Google Patents
Info
- Publication number
- JPS5435653Y2 JPS5435653Y2 JP1971103255U JP10325571U JPS5435653Y2 JP S5435653 Y2 JPS5435653 Y2 JP S5435653Y2 JP 1971103255 U JP1971103255 U JP 1971103255U JP 10325571 U JP10325571 U JP 10325571U JP S5435653 Y2 JPS5435653 Y2 JP S5435653Y2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1971103255U JPS5435653Y2 (ja) | 1971-11-08 | 1971-11-08 | |
US00304211A US3830592A (en) | 1971-11-08 | 1972-11-06 | Semiconductor wafer positioning device |
DE19722254665 DE2254665B2 (en) | 1971-11-08 | 1972-11-08 | Alignment rig for projection photolithography - includes self centering subject table plus fine alignment controls |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1971103255U JPS5435653Y2 (ja) | 1971-11-08 | 1971-11-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4858066U JPS4858066U (ja) | 1973-07-24 |
JPS5435653Y2 true JPS5435653Y2 (ja) | 1979-10-29 |
Family
ID=14349320
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1971103255U Expired JPS5435653Y2 (ja) | 1971-11-08 | 1971-11-08 |
Country Status (2)
Country | Link |
---|---|
US (1) | US3830592A (ja) |
JP (1) | JPS5435653Y2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5566584A (en) * | 1995-08-31 | 1996-10-22 | Beta Squared, Inc. | Flexure support for a fixture positioning device |
DE69908591T2 (de) * | 1998-02-14 | 2004-04-29 | Lam Research Corp., Fremont | Vorrichtung zum Laden von Halbleiterscheiben |
US6364386B1 (en) * | 1999-10-27 | 2002-04-02 | Agilent Technologies, Inc. | Apparatus and method for handling an integrated circuit |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3521953A (en) * | 1968-03-13 | 1970-07-28 | Kulicke & Soffa Ind Inc | Adjustable separation wafer clamp |
US3645622A (en) * | 1970-03-31 | 1972-02-29 | Ibm | Method and apparatus for aligning a photomask |
US3674368A (en) * | 1970-05-11 | 1972-07-04 | Johannsmeier Karl Heinz | Out of contact optical alignment and exposure apparatus |
US3705769A (en) * | 1970-11-12 | 1972-12-12 | Johannsmeier Karl Heinz | Optical alignment and contact printing system with improved chuck assembly |
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1971
- 1971-11-08 JP JP1971103255U patent/JPS5435653Y2/ja not_active Expired
-
1972
- 1972-11-06 US US00304211A patent/US3830592A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US3830592A (en) | 1974-08-20 |
JPS4858066U (ja) | 1973-07-24 |