FR2094914A5 - - Google Patents
Info
- Publication number
- FR2094914A5 FR2094914A5 FR7104522A FR7104522A FR2094914A5 FR 2094914 A5 FR2094914 A5 FR 2094914A5 FR 7104522 A FR7104522 A FR 7104522A FR 7104522 A FR7104522 A FR 7104522A FR 2094914 A5 FR2094914 A5 FR 2094914A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- H10P72/57—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US2425770A | 1970-03-31 | 1970-03-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2094914A5 true FR2094914A5 (enExample) | 1972-02-04 |
Family
ID=21819658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7104522A Expired FR2094914A5 (enExample) | 1970-03-31 | 1971-02-02 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3645622A (enExample) |
| JP (1) | JPS5123310B1 (enExample) |
| CA (1) | CA936627A (enExample) |
| FR (1) | FR2094914A5 (enExample) |
| GB (1) | GB1325822A (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3940211A (en) * | 1971-03-22 | 1976-02-24 | Kasper Instruments, Inc. | Step-and-repeat projection alignment and exposure system |
| JPS5435653Y2 (enExample) * | 1971-11-08 | 1979-10-29 | ||
| US3937579A (en) * | 1972-11-20 | 1976-02-10 | Karl Suss Kg | Process for the double-sided exposure of a semiconductor or substrate plates, especially wafers, as well as apparatus for the purpose of parallel and rotational alignment of such a plate |
| US3963346A (en) * | 1975-04-28 | 1976-06-15 | Veb Pentacon Dresden | Microfilm cameras |
| US4007987A (en) * | 1976-01-12 | 1977-02-15 | Tamarack Scientific Co. Inc. | Vacuum contact printing system and process for electronic circuit photomask replication |
| JPS5447581A (en) * | 1977-09-22 | 1979-04-14 | Hitachi Ltd | Mask aligner |
| US4189230A (en) * | 1977-10-26 | 1980-02-19 | Fujitsu Limited | Wafer holder with spring-loaded wafer-holding means |
| CH636740A5 (fr) * | 1980-05-19 | 1983-06-15 | Far Fab Assortiments Reunies | Dispositif pour l'alignement d'une piece et d'un substrat. |
| JPS58173727A (ja) * | 1982-04-05 | 1983-10-12 | Canon Inc | 密着焼付けにおける密着方法 |
| JPS59154023A (ja) * | 1983-02-22 | 1984-09-03 | Nippon Kogaku Kk <Nikon> | 板状体の姿勢制御装置 |
| GB8425577D0 (en) * | 1984-10-10 | 1984-11-14 | Flintheath Ltd | Fuel control system |
| US5296916A (en) * | 1991-04-18 | 1994-03-22 | International Business Machines Corp. | Mask alignment system for components with extremely sensitive surfaces |
| KR100208739B1 (ko) * | 1993-07-08 | 1999-07-15 | 다나카 아키히로 | 작업편과 마스크의 간극설정방법 및 간극설정기구 |
| EP0722122B1 (en) * | 1995-01-10 | 1998-09-16 | Ushiodenki Kabushiki Kaisha | Process and device for adjusting the distance between a workpiece and a mask |
| JP2001332480A (ja) * | 2000-05-24 | 2001-11-30 | Canon Inc | 原版チャック、該原版チャックを備えた露光装置および半導体デバイス製造方法 |
| US20050194475A1 (en) * | 2004-03-04 | 2005-09-08 | Han-Ki Kim | Inductively coupled plasma chemical vapor deposition apparatus |
| WO2009039208A1 (en) * | 2007-09-17 | 2009-03-26 | Twof, Inc. | Supramolecular nanostamping printing device |
| US8633441B2 (en) * | 2009-09-02 | 2014-01-21 | Asm Assembly Automation Ltd | Die bonding process incorporating infrared vision system |
| CN104331116B (zh) * | 2014-10-30 | 2015-12-02 | 中国科学院光电技术研究所 | 一种掩模与基底六自由度对准装置 |
| US20190255758A1 (en) * | 2018-02-21 | 2019-08-22 | Himax Technologies Limited | Molding apparatus and method |
| CN110323169B (zh) * | 2018-03-28 | 2021-12-21 | 奇景光电股份有限公司 | 成型装置与方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3192844A (en) * | 1963-03-05 | 1965-07-06 | Kulicke And Soffa Mfg Company | Mask alignment fixture |
| US3280715A (en) * | 1964-06-11 | 1966-10-25 | United Aircraft Corp | Micropattern aligning device |
| US3475097A (en) * | 1966-04-11 | 1969-10-28 | Motorola Inc | Mask alignment tool |
| US3499714A (en) * | 1966-10-13 | 1970-03-10 | Electroglas Inc | Mask alignment apparatus |
| US3521955A (en) * | 1968-03-13 | 1970-07-28 | Kulicke & Soffa Ind Inc | Chuck assembly and mask holder for an improved mask alignment machine |
-
1970
- 1970-03-31 US US24257A patent/US3645622A/en not_active Expired - Lifetime
-
1971
- 1971-02-02 FR FR7104522A patent/FR2094914A5/fr not_active Expired
- 1971-02-24 JP JP46008692A patent/JPS5123310B1/ja active Pending
- 1971-03-11 CA CA107422A patent/CA936627A/en not_active Expired
- 1971-04-19 GB GB2374571*A patent/GB1325822A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5123310B1 (enExample) | 1976-07-15 |
| GB1325822A (en) | 1973-08-08 |
| US3645622A (en) | 1972-02-29 |
| CA936627A (en) | 1973-11-06 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |