GB1324810A - Alignment apparatus - Google Patents

Alignment apparatus

Info

Publication number
GB1324810A
GB1324810A GB5876670A GB5876670A GB1324810A GB 1324810 A GB1324810 A GB 1324810A GB 5876670 A GB5876670 A GB 5876670A GB 5876670 A GB5876670 A GB 5876670A GB 1324810 A GB1324810 A GB 1324810A
Authority
GB
United Kingdom
Prior art keywords
chuck
wafer
mask
calibrator
piston
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5876670A
Other languages
English (en)
Inventor
K H Johannsmeier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kasper Instruments Inc
Original Assignee
Kasper Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kasper Instruments Inc filed Critical Kasper Instruments Inc
Publication of GB1324810A publication Critical patent/GB1324810A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • H10P72/57—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB5876670A 1970-05-11 1970-12-10 Alignment apparatus Expired GB1324810A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3617470A 1970-05-11 1970-05-11

Publications (1)

Publication Number Publication Date
GB1324810A true GB1324810A (en) 1973-07-25

Family

ID=21887058

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5876670A Expired GB1324810A (en) 1970-05-11 1970-12-10 Alignment apparatus

Country Status (6)

Country Link
US (1) US3674368A (enExample)
JP (1) JPS5328748B1 (enExample)
CA (1) CA920797A (enExample)
FR (1) FR2088469B1 (enExample)
GB (1) GB1324810A (enExample)
HK (1) HK69676A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0006787A1 (fr) * 1978-06-23 1980-01-09 Thomson-Csf Système optique de projection muni d'un positionneur de plaque
EP0027195A3 (en) * 1979-10-11 1981-05-06 Optimetrix Corporation Improved shock and vibration isolation system
US4336917A (en) 1979-10-11 1982-06-29 Optimetrix Corporation Shock and vibration isolation system

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435653Y2 (enExample) * 1971-11-08 1979-10-29
US3858978A (en) * 1973-08-10 1975-01-07 Kasper Instruments Chuck for use in out-of-contact optical alignment and exposure apparatus
US4093378A (en) * 1976-11-01 1978-06-06 International Business Machines Corporation Alignment apparatus
US4141640A (en) * 1977-01-26 1979-02-27 Addressograph-Multigraph Corporation Method and apparatus for developing microfilm
USRE30601E (en) * 1978-12-11 1981-05-05 International Business Machines Corporation Alignment apparatus
US4278348A (en) * 1979-11-26 1981-07-14 Quintel Corporation Locking mechanism for use in a chuck for an optical alignment and exposure apparatus
FR2478937A1 (fr) * 1980-03-21 1981-09-25 Cit Alcatel Dispositif de mise en place de plaquettes portant des circuits electroniques sous un appareil de traitement ou de controle
EP0258794A3 (en) * 1986-09-05 1990-01-24 Svg Lithography Systems, Inc. Air gauge diffuser
JP6683575B2 (ja) * 2016-09-01 2020-04-22 東京エレクトロン株式会社 プラズマ処理装置
NL2017773B1 (en) * 2016-11-11 2018-05-24 Suss Microtec Lithography Gmbh Positioning device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD80779A1 (enExample) * 1969-05-05 1971-03-20

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0006787A1 (fr) * 1978-06-23 1980-01-09 Thomson-Csf Système optique de projection muni d'un positionneur de plaque
FR2429447A1 (fr) * 1978-06-23 1980-01-18 Thomson Csf Systeme optique de projection muni d'un positionneur de plaque
EP0027195A3 (en) * 1979-10-11 1981-05-06 Optimetrix Corporation Improved shock and vibration isolation system
US4336917A (en) 1979-10-11 1982-06-29 Optimetrix Corporation Shock and vibration isolation system

Also Published As

Publication number Publication date
CA920797A (en) 1973-02-13
FR2088469B1 (enExample) 1974-04-12
US3674368A (en) 1972-07-04
JPS5328748B1 (enExample) 1978-08-16
FR2088469A1 (enExample) 1972-01-07
DE2046686B2 (de) 1975-08-21
HK69676A (en) 1976-11-12
DE2046686A1 (de) 1971-11-18

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Legal Events

Date Code Title Description
429A Application made for amendment of specification (sect. 29/1949)
429H Application (made) for amendment of specification now open to opposition (sect. 29/1949)
429D Case decided by the comptroller ** specification amended (sect. 29/1949)
SPA Amended specification published
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee