JPS5328748B1 - - Google Patents
Info
- Publication number
- JPS5328748B1 JPS5328748B1 JP8372970A JP8372970A JPS5328748B1 JP S5328748 B1 JPS5328748 B1 JP S5328748B1 JP 8372970 A JP8372970 A JP 8372970A JP 8372970 A JP8372970 A JP 8372970A JP S5328748 B1 JPS5328748 B1 JP S5328748B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
- H10P72/57—Mask-wafer alignment
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US3617470A | 1970-05-11 | 1970-05-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5328748B1 true JPS5328748B1 (enExample) | 1978-08-16 |
Family
ID=21887058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8372970A Pending JPS5328748B1 (enExample) | 1970-05-11 | 1970-09-24 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3674368A (enExample) |
| JP (1) | JPS5328748B1 (enExample) |
| CA (1) | CA920797A (enExample) |
| FR (1) | FR2088469B1 (enExample) |
| GB (1) | GB1324810A (enExample) |
| HK (1) | HK69676A (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5435653Y2 (enExample) * | 1971-11-08 | 1979-10-29 | ||
| US3858978A (en) * | 1973-08-10 | 1975-01-07 | Kasper Instruments | Chuck for use in out-of-contact optical alignment and exposure apparatus |
| US4093378A (en) * | 1976-11-01 | 1978-06-06 | International Business Machines Corporation | Alignment apparatus |
| US4141640A (en) * | 1977-01-26 | 1979-02-27 | Addressograph-Multigraph Corporation | Method and apparatus for developing microfilm |
| FR2429447A1 (fr) * | 1978-06-23 | 1980-01-18 | Thomson Csf | Systeme optique de projection muni d'un positionneur de plaque |
| USRE30601E (en) * | 1978-12-11 | 1981-05-05 | International Business Machines Corporation | Alignment apparatus |
| EP0103188B1 (en) * | 1979-10-11 | 1986-12-03 | Eaton-Optimetrix Inc. | Improved shock and vibration isolation system |
| US4336917A (en) | 1979-10-11 | 1982-06-29 | Optimetrix Corporation | Shock and vibration isolation system |
| US4278348A (en) * | 1979-11-26 | 1981-07-14 | Quintel Corporation | Locking mechanism for use in a chuck for an optical alignment and exposure apparatus |
| FR2478937A1 (fr) * | 1980-03-21 | 1981-09-25 | Cit Alcatel | Dispositif de mise en place de plaquettes portant des circuits electroniques sous un appareil de traitement ou de controle |
| EP0258794A3 (en) * | 1986-09-05 | 1990-01-24 | Svg Lithography Systems, Inc. | Air gauge diffuser |
| JP6683575B2 (ja) * | 2016-09-01 | 2020-04-22 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| NL2017773B1 (en) * | 2016-11-11 | 2018-05-24 | Suss Microtec Lithography Gmbh | Positioning device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD80779A1 (enExample) * | 1969-05-05 | 1971-03-20 |
-
1970
- 1970-05-11 US US36174A patent/US3674368A/en not_active Expired - Lifetime
- 1970-09-24 JP JP8372970A patent/JPS5328748B1/ja active Pending
- 1970-12-09 CA CA100175A patent/CA920797A/en not_active Expired
- 1970-12-10 GB GB5876670A patent/GB1324810A/en not_active Expired
-
1971
- 1971-04-19 FR FR7113726A patent/FR2088469B1/fr not_active Expired
-
1976
- 1976-11-04 HK HK696/76*UA patent/HK69676A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FR2088469A1 (enExample) | 1972-01-07 |
| HK69676A (en) | 1976-11-12 |
| DE2046686B2 (de) | 1975-08-21 |
| DE2046686A1 (de) | 1971-11-18 |
| GB1324810A (en) | 1973-07-25 |
| US3674368A (en) | 1972-07-04 |
| CA920797A (en) | 1973-02-13 |
| FR2088469B1 (enExample) | 1974-04-12 |