GB1323984A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- GB1323984A GB1323984A GB1130872A GB1130872A GB1323984A GB 1323984 A GB1323984 A GB 1323984A GB 1130872 A GB1130872 A GB 1130872A GB 1130872 A GB1130872 A GB 1130872A GB 1323984 A GB1323984 A GB 1323984A
- Authority
- GB
- United Kingdom
- Prior art keywords
- group
- photo
- phenolic
- march
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 abstract 1
- NFDXQGNDWIPXQL-UHFFFAOYSA-N 1-cyclooctyldiazocane Chemical compound C1CCCCCCC1N1NCCCCCC1 NFDXQGNDWIPXQL-UHFFFAOYSA-N 0.000 abstract 1
- 239000012670 alkaline solution Substances 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000012973 diazabicyclooctane Substances 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000012442 inert solvent Substances 0.000 abstract 1
- 150000002576 ketones Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 abstract 1
- 125000002560 nitrile group Chemical group 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 150000007530 organic bases Chemical class 0.000 abstract 1
- 150000007965 phenolic acids Chemical class 0.000 abstract 1
- 235000009048 phenolic acids Nutrition 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7103378A NL7103378A (enExample) | 1971-03-13 | 1971-03-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1323984A true GB1323984A (en) | 1973-07-18 |
Family
ID=19812676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1130872A Expired GB1323984A (en) | 1971-03-13 | 1972-03-10 | Photosensitive composition |
Country Status (4)
| Country | Link |
|---|---|
| DE (1) | DE2208389A1 (enExample) |
| FR (1) | FR2130166A1 (enExample) |
| GB (1) | GB1323984A (enExample) |
| NL (1) | NL7103378A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12393115B2 (en) | 2018-09-05 | 2025-08-19 | Merck Patent Gmbh | Positive working photosensitive material |
-
1971
- 1971-03-13 NL NL7103378A patent/NL7103378A/xx unknown
-
1972
- 1972-02-23 DE DE19722208389 patent/DE2208389A1/de active Pending
- 1972-03-10 GB GB1130872A patent/GB1323984A/en not_active Expired
- 1972-03-13 FR FR7208630A patent/FR2130166A1/fr not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12393115B2 (en) | 2018-09-05 | 2025-08-19 | Merck Patent Gmbh | Positive working photosensitive material |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2130166A1 (enExample) | 1972-11-03 |
| DE2208389A1 (de) | 1972-09-21 |
| NL7103378A (enExample) | 1972-09-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4904555A (en) | Photosensitive composition for making repeatably tonable layers | |
| JPS5280022A (en) | Light solubilizable composition | |
| EP0323427A3 (en) | Light-sensitive compositions with phenol resins and quinone diarides | |
| JPS61277679A (ja) | β―ケトエステルまたはβ―アミドの環状アセタールまたは環状ケタール | |
| JPS5720734A (en) | Heat developing photosensitive material | |
| JPS5321923A (en) | Photopolymerizable composition | |
| US4482489A (en) | Light-sensitive diazonium trifluoromethane sulfonates | |
| KR860008476A (ko) | 심부 자외선 석판인쇄 내식막 조성물 및 그의 이용법 | |
| ES483328A1 (es) | Un procedimiento para revelar planchas para la impresion fotosensibles expuestas fotograficamente | |
| JPS54135525A (en) | Photosensitive material | |
| US2324060A (en) | Photographic copying paper | |
| KR850001443A (ko) | 광 저항성 조성물 | |
| AU542387B2 (en) | Naphthoquinone diazide sulfonic ester | |
| GB1323984A (en) | Photosensitive composition | |
| KR860003532A (ko) | 포토레지스터 현상액 | |
| US3887379A (en) | Photoresist azide sensitizer composition | |
| KR940009754A (ko) | 화학적으로 강화된 네가티브 포토레지스트 | |
| GB1325974A (en) | Photosensitive compositions | |
| US3377167A (en) | Fixing agents for photosensitive compositions containing leucotriphenyl methane derivatives; leuco xanthene compounds or leuco anthracene compounds | |
| JPS5579436A (en) | Sliver halide photographic material | |
| US3578455A (en) | Increased speed in r-c-x3/color former light sensitive system by alkali treatment | |
| KR840004822A (ko) | 칼라 음극선관용 감광막 조성물 및 흡광매트릭스 형성방법 | |
| EP0226741A3 (en) | Process for producing a positive photoresist | |
| JPS55164825A (en) | Polymer positive image forming method | |
| SU603940A1 (ru) | Светочувствительна композици |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| CSNS | Application of which complete specification have been accepted and published, but patent is not sealed |