FR2130166A1 - - Google Patents

Info

Publication number
FR2130166A1
FR2130166A1 FR7208630A FR7208630A FR2130166A1 FR 2130166 A1 FR2130166 A1 FR 2130166A1 FR 7208630 A FR7208630 A FR 7208630A FR 7208630 A FR7208630 A FR 7208630A FR 2130166 A1 FR2130166 A1 FR 2130166A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7208630A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2130166A1 publication Critical patent/FR2130166A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
FR7208630A 1971-03-13 1972-03-13 Withdrawn FR2130166A1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103378A NL7103378A (enExample) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
FR2130166A1 true FR2130166A1 (enExample) 1972-11-03

Family

ID=19812676

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7208630A Withdrawn FR2130166A1 (enExample) 1971-03-13 1972-03-13

Country Status (4)

Country Link
DE (1) DE2208389A1 (enExample)
FR (1) FR2130166A1 (enExample)
GB (1) GB1323984A (enExample)
NL (1) NL7103378A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11202100517VA (en) 2018-09-05 2021-02-25 Merck Patent Gmbh Positive working photosensitive material

Also Published As

Publication number Publication date
DE2208389A1 (de) 1972-09-21
GB1323984A (en) 1973-07-18
NL7103378A (enExample) 1972-09-15

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Legal Events

Date Code Title Description
ST Notification of lapse