NL7103378A - - Google Patents

Info

Publication number
NL7103378A
NL7103378A NL7103378A NL7103378A NL7103378A NL 7103378 A NL7103378 A NL 7103378A NL 7103378 A NL7103378 A NL 7103378A NL 7103378 A NL7103378 A NL 7103378A NL 7103378 A NL7103378 A NL 7103378A
Authority
NL
Netherlands
Application number
NL7103378A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7103378A priority Critical patent/NL7103378A/xx
Priority to DE19722208389 priority patent/DE2208389A1/de
Priority to GB1130872A priority patent/GB1323984A/en
Priority to FR7208630A priority patent/FR2130166A1/fr
Publication of NL7103378A publication Critical patent/NL7103378A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/0163Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
NL7103378A 1971-03-13 1971-03-13 NL7103378A (enExample)

Priority Applications (4)

Application Number Priority Date Filing Date Title
NL7103378A NL7103378A (enExample) 1971-03-13 1971-03-13
DE19722208389 DE2208389A1 (de) 1971-03-13 1972-02-23 Verfahren zur Herstellung einer nega tiv arbeitenden lichtempfindlichen Masse
GB1130872A GB1323984A (en) 1971-03-13 1972-03-10 Photosensitive composition
FR7208630A FR2130166A1 (enExample) 1971-03-13 1972-03-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103378A NL7103378A (enExample) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
NL7103378A true NL7103378A (enExample) 1972-09-15

Family

ID=19812676

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7103378A NL7103378A (enExample) 1971-03-13 1971-03-13

Country Status (4)

Country Link
DE (1) DE2208389A1 (enExample)
FR (1) FR2130166A1 (enExample)
GB (1) GB1323984A (enExample)
NL (1) NL7103378A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11202100517VA (en) 2018-09-05 2021-02-25 Merck Patent Gmbh Positive working photosensitive material

Also Published As

Publication number Publication date
DE2208389A1 (de) 1972-09-21
FR2130166A1 (enExample) 1972-11-03
GB1323984A (en) 1973-07-18

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