GB1310126A - Process of applying photoresist to substrates - Google Patents

Process of applying photoresist to substrates

Info

Publication number
GB1310126A
GB1310126A GB2247970A GB2247970A GB1310126A GB 1310126 A GB1310126 A GB 1310126A GB 2247970 A GB2247970 A GB 2247970A GB 2247970 A GB2247970 A GB 2247970A GB 1310126 A GB1310126 A GB 1310126A
Authority
GB
United Kingdom
Prior art keywords
bars
frame
tension
wicks
wick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2247970A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of GB1310126A publication Critical patent/GB1310126A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
GB2247970A 1969-05-08 1970-05-08 Process of applying photoresist to substrates Expired GB1310126A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US82305269A 1969-05-08 1969-05-08
DE19702022849 DE2022849A1 (de) 1969-05-08 1970-05-11 Verfahren zum Aufbringen einer lichtempfindlichen Schicht auf eine Unterlage sowie lichtempfindlicher Schichtkoerper zur Verwendung in diesem Verfahren

Publications (1)

Publication Number Publication Date
GB1310126A true GB1310126A (en) 1973-03-14

Family

ID=25759108

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2247970A Expired GB1310126A (en) 1969-05-08 1970-05-08 Process of applying photoresist to substrates

Country Status (4)

Country Link
JP (1) JPS4935448B1 (enExample)
DE (1) DE2022849A1 (enExample)
FR (1) FR2047506A5 (enExample)
GB (1) GB1310126A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0028366A1 (en) * 1979-11-02 1981-05-13 E.I. Du Pont De Nemours And Company Process for heating thin surface layers
EP0099426B1 (en) * 1982-07-19 1987-05-13 Asahi Kasei Kogyo Kabushiki Kaisha A process for coating a liquid photopolymerizable composition and a process for producing a printed circuit board thereby

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR8103187A (pt) * 1980-05-27 1982-02-09 Du Pont Processo para laminar uma camada fotossensivel de absorcao
US4698294A (en) * 1986-09-12 1987-10-06 E. I. Du Pont De Nemours And Company Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0028366A1 (en) * 1979-11-02 1981-05-13 E.I. Du Pont De Nemours And Company Process for heating thin surface layers
EP0099426B1 (en) * 1982-07-19 1987-05-13 Asahi Kasei Kogyo Kabushiki Kaisha A process for coating a liquid photopolymerizable composition and a process for producing a printed circuit board thereby

Also Published As

Publication number Publication date
FR2047506A5 (enExample) 1971-03-12
DE2022849A1 (de) 1971-11-25
JPS4935448B1 (enExample) 1974-09-21

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees