GB1300187A - Method for growing crystalline materials - Google Patents
Method for growing crystalline materialsInfo
- Publication number
- GB1300187A GB1300187A GB3061071A GB3061071A GB1300187A GB 1300187 A GB1300187 A GB 1300187A GB 3061071 A GB3061071 A GB 3061071A GB 3061071 A GB3061071 A GB 3061071A GB 1300187 A GB1300187 A GB 1300187A
- Authority
- GB
- United Kingdom
- Prior art keywords
- melts
- substrate
- melt
- regions
- transferred
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000002178 crystalline material Substances 0.000 title 1
- 239000000155 melt Substances 0.000 abstract 7
- 239000000758 substrate Substances 0.000 abstract 7
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 abstract 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 abstract 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052785 arsenic Inorganic materials 0.000 abstract 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000002019 doping agent Substances 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000010587 phase diagram Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
- C30B19/064—Rotating sliding boat system
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
- C30B19/062—Vertical dipping system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02395—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02625—Liquid deposition using melted materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US6452370A | 1970-08-17 | 1970-08-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1300187A true GB1300187A (en) | 1972-12-20 |
Family
ID=22056562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3061071A Expired GB1300187A (en) | 1970-08-17 | 1971-06-30 | Method for growing crystalline materials |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS5134391B1 (enrdf_load_stackoverflow) |
AU (1) | AU459061B2 (enrdf_load_stackoverflow) |
BE (1) | BE771417A (enrdf_load_stackoverflow) |
CA (1) | CA955507A (enrdf_load_stackoverflow) |
CH (1) | CH548791A (enrdf_load_stackoverflow) |
FR (1) | FR2104258A5 (enrdf_load_stackoverflow) |
GB (1) | GB1300187A (enrdf_load_stackoverflow) |
NL (1) | NL175535C (enrdf_load_stackoverflow) |
SE (1) | SE377055B (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61126501U (enrdf_load_stackoverflow) * | 1985-01-26 | 1986-08-08 | ||
JP3139329B2 (ja) * | 1995-07-14 | 2001-02-26 | 株式会社村田製作所 | 液相エピタキシャル成長装置 |
-
1971
- 1971-06-30 GB GB3061071A patent/GB1300187A/en not_active Expired
- 1971-07-30 SE SE978071A patent/SE377055B/xx unknown
- 1971-07-30 FR FR7129448A patent/FR2104258A5/fr not_active Expired
- 1971-08-11 CA CA120,465A patent/CA955507A/en not_active Expired
- 1971-08-16 CH CH1198871A patent/CH548791A/xx not_active IP Right Cessation
- 1971-08-16 JP JP46061715A patent/JPS5134391B1/ja active Pending
- 1971-08-16 NL NL7111290A patent/NL175535C/xx not_active IP Right Cessation
- 1971-08-16 AU AU32409/71A patent/AU459061B2/en not_active Expired
- 1971-08-17 BE BE771417A patent/BE771417A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE2140582A1 (de) | 1972-02-24 |
NL175535B (nl) | 1984-06-18 |
AU459061B2 (en) | 1975-03-13 |
BE771417A (fr) | 1971-12-31 |
NL175535C (nl) | 1984-11-16 |
CA955507A (en) | 1974-10-01 |
NL7111290A (enrdf_load_stackoverflow) | 1972-02-21 |
AU3240971A (en) | 1973-02-22 |
CH548791A (de) | 1974-05-15 |
JPS5134391B1 (enrdf_load_stackoverflow) | 1976-09-25 |
FR2104258A5 (enrdf_load_stackoverflow) | 1972-04-14 |
DE2140582B2 (de) | 1975-06-19 |
SE377055B (enrdf_load_stackoverflow) | 1975-06-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1283793A (en) | Depositing successive epitaxial semiconductive layers from the liquid phase | |
GB1213867A (en) | Method of manufacturing silicon carbide single crystal filaments | |
US3933538A (en) | Method and apparatus for production of liquid phase epitaxial layers of semiconductors | |
GB1414254A (en) | Epitaxial growth of semiconductor material from the liquid phase | |
US3741825A (en) | Method of depositing an epitaxial semiconductor layer from the liquidphase | |
GB1148409A (en) | Improvements in and relating to semiconductor devices | |
GB1282167A (en) | Process for vapour growing thin films | |
GB1520138A (en) | Growing single crystal garnets | |
GB1329041A (en) | Method of manufacturing semiconductor elements by a liquid phase growing method | |
GB1062968A (en) | Process for epitaxial crystal growth | |
GB1300187A (en) | Method for growing crystalline materials | |
GB1151746A (en) | A method for the Deposition of Silica Films | |
GB1134964A (en) | Improvements in or relating to the production of layers of a silicon or germanium nitrogen compound on semiconductor crystals | |
GB1393337A (en) | Method of growing a single crystal film | |
GB1497457A (en) | Semiconductor-liquid phase epitaxial growth method and semiconductor device manufactured using the same | |
GB1160301A (en) | Method of Forming a Crystalline Semiconductor Layer on an Alumina Substrate | |
US3734817A (en) | Treated quartz vessels for use in producing and further processing iii-v semiconductor bodies low in silicon | |
GB1260233A (en) | Improvements in or relating to the epitaxial deposition of crystalline material from the gas phase | |
JPS5272399A (en) | Method and apparatus for growth of single crystals of al2o3 from gas p hase | |
GB1229508A (enrdf_load_stackoverflow) | ||
GB1473485A (en) | Method for growing crystals of iii-v compound semicon ductors | |
GB1482016A (en) | Epitaxial deposition of semiconductor material | |
GB1409340A (en) | Superconducting niobium-gallium alloy | |
US3179541A (en) | Vapor growth with smooth surfaces by introducing cadmium into the semiconductor material | |
GB1273188A (en) | Improvements in or relating to the production of semiconductor arrangements |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |